Patent Assignment
Reel/Frame 059967/0721
Assignment of Assignor's Interest
Recorded: 2022-05-20
Pages: 4
Assignees
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
18 ZHANGJIANG ROAD, PUDONG NEW AREA, SHANGHAI, 201203, CHINA
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
NO.18, WEN CHANG RD., ECONOMIC-TECHNOLOGICAL , DEVELOPMENT AREA, DAXING DISTRICT, BEIJING, 100716, CHINA
Covered Property
(1)
Method of Etching a Semiconductor Device by Etching Initial Mask Structures at a Region Having an Extension Direction Different from the Extension Direction of the Initial Mask Structures