Method for dish reflector illumination via sub-reflector assembly with dielectric radiator portion

1. An apparatus comprising:

a unitary dielectric block having a waveguide transition portion located at a first end of the unitary dielectric block, a sub-reflector support portion located at a second end of the unitary dielectric block that is opposite from the first end, and a radiator portion between the waveguide transition portion and the sub-reflector support portion;

a waveguide coupled to a dish reflector of a reflector antenna and aligned with a longitudinal axis of the unitary dielectric block;

wherein the waveguide transition portion is dimensioned to couple to a distal end of the waveguide,

wherein the waveguide transition portion has a first portion with a first diameter and a second portion located nearer to the radiator portion than the first portion and having a second diameter greater than the first diameter, and

wherein the waveguide transition portion comprises a shoulder perpendicular to the longitudinal axis and having a third diameter that is greater than the first and second diameters.

2. The apparatus of claim 1 , further comprising a sub-reflector attached to the sub-reflector support portion.

3. The apparatus of claim 2 , wherein the sub-reflector has a peripheral reference surface that is normal to a longitudinal axis of the unitary dielectric block.

4. The apparatus of claim 2 , wherein the sub-reflector comprises a radiofrequency (RF) reflective coating applied to the sub-reflector support portion.

5. The apparatus of claim 2 , wherein the sub-reflector comprises a metallic disk seated upon the sub-reflector support portion.

6. The apparatus of claim 2 , wherein the sub-reflector is provided with a proximal surface which transitions to a distal surface, and wherein the distal surface is provided with a lower angle with respect to the longitudinal axis of the unitary dielectric block than the proximal surface.

7. The apparatus of claim 1 , wherein the unitary dielectric block is inserted into the waveguide up to a shoulder of the waveguide transition portion.

8. The apparatus of claim 1 , wherein a diameter of the sub-reflector support portion is at least 2.5 wavelengths of a desired operating frequency.

9. The apparatus of claim 1 , wherein the dish reflector has a ratio of reflector focal length to reflector diameter that is less than or equal to 0.25.

10. A method comprising:

providing a dish reflector;

providing a unitary dielectric block having a waveguide transition portion located at a first end of the unitary dielectric block, a sub-reflector support portion located at a second end of the unitary dielectric block that is opposite from the first end, and a radiator portion between the waveguide transition portion and the sub-reflector support portion;

coupling a waveguide to the dish reflector;

aligning a longitudinal axis of the unitary dielectric block with the waveguide;

wherein the waveguide transition portion is dimensioned to couple to a distal end of the waveguide,

wherein the waveguide transition portion has a first portion with a first diameter and a second portion located nearer to the radiator portion than the first portion and having a second diameter greater than the first diameter, and

wherein the waveguide transition portion comprises a shoulder perpendicular to the longitudinal axis and having a third diameter that is greater than the first and second diameters.

11. The method of claim 10 , wherein the dish reflector has a ratio of reflector focal length to reflector diameter that is less than or equal to 0.25.

12. The method of claim 11 , wherein providing the unitary dielectric block comprises selecting dimensions of the waveguide transition portion, radiator portion, and sub-reflector support portion such that radiation in an E plane and radiation in an H plane is reduced in a region spanning from 10 to 45 degrees of azimuth.

13. The method of claim 10 , wherein the sub-reflector support portion is provided with a proximal surface which transitions to a distal surface, and wherein the distal surface is provided with a lower angle with respect to the longitudinal axis of the unitary dielectric block than the proximal surface.

14. The method of claim 10 , further comprising:

passing an RF signal through the waveguide and the unitary dielectric block to reflect from a sub-reflector coupled to the sub-reflector support portion through the unitary dielectric block and at least partially through the radiator portion to the dish reflector, wherein the RF signal comprises a frequency of at least 6.525 gigahertz.

15. A method comprising:

selecting dimensions for a unitary dielectric block having a waveguide transition portion located at a first end of the unitary dielectric block, a sub-reflector support portion located at a second end of the unitary dielectric block that is opposite from the first end, and a radiator portion between the waveguide transition portion and the sub-reflector support portion, wherein the dimensions are selected based on a desired operating frequency; and

manufacturing the unitary dielectric block based on the selected dimensions;

wherein the waveguide transition portion is dimensioned to couple with a distal end of a waveguide coupled to a dish reflector,

wherein the waveguide transition portion has a first portion with a first diameter and a second portion located nearer to the radiator portion than the first portion and having a second diameter greater than the first diameter, and

wherein the waveguide transition portion comprises a shoulder perpendicular to a longitudinal axis of the unitary dielectric block and having a third diameter that is greater than the first and second diameters.

16. The method of claim 15 , wherein the manufacturing comprises machining the unitary dielectric block, and wherein a periphery of a distal surface of the unitary dielectric block that is normal to the longitudinal axis of the unitary dielectric block is dimensioned such that the periphery provides a ready manufacturing reference surface.

17. The method of claim 15 , wherein the manufacturing comprises injection molding.