IP Library › Granted Patent US 10,707,167
Granted Patent B2
US 10,707,167 · App. 15/826,939 · Granted Jul 7, 2020

Contacts to semiconductor substrate and methods of forming same

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Quick Facts
Patent No.
US 10,707,167
App. No.
15/826,939
Filed
Nov 30, 2017
Granted
Jul 7, 2020
Kind
B2
Art Unit
2897
USPC
257/757
Abstract

An aspect of the invention includes a method for forming a contact in a dielectric layer over a semiconductor substrate. The method may comprise: forming a contact opening in a dielectric layer over the semiconductor substrate to expose an upper portion of the semiconductor substrate; depositing a first liner layer to conformally coat the contact opening; causing a portion of the first liner layer to diffuse into the upper portion of the semiconductor substrate to form a first intermix region at the upper portion of the semiconductor substrate; depositing a refractory metal layer over the first intermix region; and depositing a metal in the contact opening thereby forming the contact.

Claims (12)

1. A semiconductor structure including a contact to a semiconductor substrate, the contact comprising:

a contact opening in a dielectric layer over the semiconductor substrate;

a first liner layer substantially coating a sidewall of the contact opening;

a refractory metal layer substantially coating the first liner layer in the contact opening;

a metal substantially filling the contact opening; and

an intermix region at an upper surface of the semiconductor substrate in the contact opening, the intermix region having a composition including a material used in the first liner layer, a material used in the refractory metal layer, and a material used in the semiconductor substrate;

wherein the refractory metal layer includes a multi-layer having at least a first refractory metal material and a second refractory metal material, the first refractory metal material substantially separating the first liner layer and the second refractory metal material, the second refractory metal material substantially separating the first refractory metal material and the metal.

2. The contact of claim 1 , wherein the intermix region includes a titanium-based silicide.

3. The contact of claim 1 , wherein the first liner layer includes titanium (Ti) and the refractory metal layer includes titanium nitride (TiN).

4. The contact of claim 1 , wherein the first liner layer includes nickel platinum (NiPt), the first refractory metal material includes titanium (Ti) and the second refractory metal material includes titanium nitride (TiN).

5. The contact of claim 1 , wherein the metal includes tungsten (W).

6. The contact of claim 1 , wherein the intermix region has a thickness of approximately 3 nanometers to approximately 5 nanometers.