Semiconductor packages and related methods
Methods of forming semiconductor packages include providing a first insulator layer coupled with a first metallic layer. A recess is formed in the first metallic layer and a semiconductor die is mechanically coupled therein. The die is mechanically coupled with a second metallic layer and the second metallic layer is coupled with a second insulator layer. The die and layers are at least partially encapsulated to form the semiconductor package. The first and/or second metallic layers may be insulator-metal substrates, metal-insulator-metal (MIM) substrates, or may be formed of lead frames. In implementations the package does not include a spacer between the die and the first metallic layer and does not include a spacer between the die and the second metallic layer. In implementations the first insulator layer and the second insulator layer are exposed through the encapsulant or are mechanically coupled with metallic layers exposed through the encapsulant.
1. A semiconductor package, comprising:
a first insulator layer coupled with a first metallic layer, the first metallic layer comprising a recess therein;
a semiconductor die mechanically coupled at least partially within the recess, a perimeter of the semiconductor die located entirely within a perimeter of the recess;
a second metallic layer coupled with a second insulator layer, the second metallic layer mechanically coupled with the semiconductor die; and
an encapsulant at least partially encapsulating the first insulator layer, the first metallic layer, the semiconductor die, the second insulator layer, and the second metallic layer;
wherein the first insulator layer and the second insulator layer are exposed through the encapsulant.
2. The semiconductor package of claim 1 , wherein the semiconductor die is mechanically coupled within the recess using one of a first soldered metal or a first sintered metal, and wherein the semiconductor die is mechanically coupled with the second metallic layer using one of a second soldered metal or a second sintered metal.
3. The semiconductor package of claim 1 , wherein the semiconductor die is directly coupled to the first metallic layer through one of a first soldered metal or a first sintered metal, and wherein the semiconductor die is directly coupled to the second metallic layer through one of a second soldered metal or a second sintered metal.
4. The semiconductor package of claim 1 , wherein a lead frame comprises the first metallic layer.
5. The semiconductor package of claim 4 , wherein the lead frame is mechanically attached to the first insulator layer using a silicone elastomer.
6. The semiconductor package of claim 1 , wherein a lead frame comprises the second metallic layer.
7. The semiconductor package of claim 1 , wherein the second metallic layer comprises two metallic sections electrically isolated from one another prior to coupling the semiconductor die with the second metallic layer.
8. A semiconductor package, comprising:
a first insulator layer coupled with a first metallic layer, the first metallic layer comprising a recess therein;
a semiconductor die mechanically coupled at least partially within the recess, a perimeter of the semiconductor die located entirely within a perimeter of the recess;
a second metallic layer coupled with a second insulator layer, the second metallic layer mechanically coupled with the semiconductor die; and
an encapsulant at least partially encapsulating the first insulator layer, the first metallic layer, the semiconductor die, the second insulator layer, and the second metallic layer;
wherein the semiconductor die is directly coupled to the first metallic layer through one of a first soldered metal or a first sintered metal, and wherein the semiconductor die is directly coupled to the second metallic layer through one of a second soldered metal or a second sintered metal;
wherein a lead frame comprises the first metallic layer;
wherein the lead frame is mechanically attached to the first insulator layer using a silicone elastomer; and
wherein the semiconductor die is between the first metallic layer and the second metallic layer.
9. The semiconductor package of claim 8 , wherein a lead frame comprises the second metallic layer.
10. The semiconductor package of claim 8 , wherein the second metallic layer comprises two metallic sections electrically isolated from one another prior to coupling the semiconductor die with the second metallic layer.