IP Library Granted Patent US 12661865
Granted Patent B2
US 12661865 · App. 18/224,730 · Granted Jun 23, 2026

Electromagnetic wave absorber and electromagnetic wave absorber-attached molded article

Inventors: Kazuto Yamagata (Osaka, JP); Hironobu Machinaga (Osaka, JP); Eri Ueda (Osaka, JP); Hiroichi Ukei (Osaka, JP); Takehiro Ui (Osaka, JP)
Assignee: NITTO DENKO CORPORATION
B32B7/025B32B15/082B32B27/308B32B27/36C23C14/086C23C14/35H05K9/0088B32B15/20B32B27/08B32B2250/03B32B2255/10B32B2255/205B32B2307/202B32B2307/204B32B2307/212
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Quick Facts
Patent No.
US 12661865
App. No.
18/224,730
Granted
Jun 23, 2026
Kind
B2
Abstract

An electromagnetic wave absorber ( 1 ) includes a dielectric layer ( 10 ), a resistive layer ( 20 ), and an electrically conductive layer ( 30 ). The resistive layer ( 20 ) is disposed on one principal surface of the dielectric layer ( 10 ). The electrically conductive layer ( 30 ) is disposed on the other principal surface of the dielectric layer ( 10 ) and has a sheet resistance lower than a sheet resistance of the resistive layer ( 20 ). The resistive layer ( 20 ) has a sheet resistance of 200 to 600Ω/□. When the resistive layer ( 20 ) is subjected to an immersion treatment in which the resistive layer ( 20 ) is immersed in a 5 weight % aqueous solution of NaOH for 5 minutes, an absolute value of a difference between a sheet resistance of the resistive layer ( 20 ) before the immersion treatment and a sheet resistance of the resistive layer ( 20 ) after the immersion treatment is less than 100Ω/□.

Claims (18)

1 . An electromagnetic wave absorber, comprising:

a dielectric layer;

a resistive layer that is disposed on one principal surface of the dielectric layer; and

an electrically conductive layer that is disposed on the other principal surface of the dielectric layer and has a sheet resistance lower than a sheet resistance of the resistive layer, wherein

the resistive layer has a sheet resistance of 200 to 600Ω/□,

when the resistive layer is subjected to an immersion treatment in which the resistive layer is immersed in a 5 weight % aqueous solution of NaOH for 5 minutes, an absolute value of a difference between a sheet resistance of the resistive layer before the immersion treatment and a sheet resistance of the resistive layer after the immersion treatment is less than 100Ω/□, and

when the resistive layer comprises indium oxide and tin oxide and has a polycrystalline structure, the resistive layer includes 7.5 weight % or more of tin oxide and a dopant that comprises at least one element selected from the group consisting of magnesium and titanium, and the resistive layer has a specific resistance of −5×10 −4 Ω·cm or more.

2 . The electromagnetic wave absorber according to claim 1 , wherein the resistive layer comprises at least one of tin oxide, titanium oxide, and indium oxide as a main component.

3 . The electromagnetic wave absorber according to claim 2 , wherein the resistive layer further comprises the dopant that comprises at least one element other than a metal element included in the main component.

4 . The electromagnetic wave absorber according to claim 1 , wherein the resistive layer has a specific resistance of 7.2×10 −4 Ω·cm or more.

5 . The electromagnetic wave absorber according to claim 4 , wherein the resistive layer has a specific resistance of 50×10 −4 Ω·cm or less.

6 . The electromagnetic wave absorber according to claim 1 , wherein the resistive layer has a thickness of 15 to 500 nm.

7 . The electromagnetic wave absorber according to claim 1 , wherein the resistive layer is laminated on a polymer film at an opposite surface to a surface at which the resistive layer is in contact with the dielectric layer.

8 . The electromagnetic wave absorber according to claim 1 , wherein the dielectric layer has a relative permittivity of 1 to 10.

9 . The electromagnetic wave absorber according to claim 1 , wherein the dielectric layer is made of a polymeric material.

10 . The electromagnetic wave absorber according to claim 1 , wherein the electrically conductive layer has a sheet resistance of 0.001 to 30Ω/□.

11 . The electromagnetic wave absorber according to claim 1 , wherein the electrically conductive layer is made of at least one of aluminum, an aluminum alloy, aluminum nitride, copper, a copper alloy, copper nitride, and indium tin oxide.

12 . The electromagnetic wave absorber according to claim 1 , wherein when the resistive layer comprises indium tin oxide, the indium tin oxide has a polycrystalline structure that includes less than 13 weight % of tin oxide.