IP Library Granted Patent US 12661893
Granted Patent B2
US 12661893 · App. 18/498,227 · Granted Jun 23, 2026

Laminated substrate, liquid ejection head, and method of manufacturing laminated substrate

Inventor: Atsunori Terasaki (Kanagawa, JP)
Assignee: Canon Kabushiki Kaisha
B41J2/1623B41J2/1609B41J2/14209B41J2202/03B41J2202/22
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Quick Facts
Patent No.
US 12661893
App. No.
18/498,227
Granted
Jun 23, 2026
Kind
B2
Abstract

An object is to provide a laminated substrate, a liquid ejection head, and a method of manufacturing a laminated substrate which are capable of preventing a decrease in the yield of a manufacturing process due to the substrate getting broken and an organic resin material sticking out. To that end, a structure including an eave portion having an overhang with a predetermined length is provided on a predetermined surface of a first substrate so as to form a space between the structure and the predetermined surface, and a resin is filled in the space.

Claims (38)

1 . A laminated substrate comprising:

a first substrate having a predetermined surface;

a structure including an eave portion having an overhang with a predetermined length provided on the predetermined surface so as to form a space between the structure and the predetermined surface;

a resin provided on a side of the structure opposite to the first substrate; and

a second substrate bonded to the first substrate by the resin via the structure,

wherein the resin is filled in at least part of the space.

2 . The laminated substrate according to claim 1 , wherein the resin is an organic resin material.

3 . The laminated substrate according to claim 1 , wherein part of the eave portion of the structure is out of a region between the first substrate and the second substrate.

4 . The laminated substrate according to claim 1 , wherein the eave portion of the structure has such a pectinate shape that comb teeth are formed on a tip side.

5 . The laminated substrate according to claim 1 , wherein the structure is provided in a plurality on the predetermined surface of the first substrate.

6 . A laminated substrate comprising:

a first substrate having a predetermined surface;

a structure provided on the predetermined surface;

a resin provided on a side of the structure opposite to the first substrate; and

a second substrate bonded to the first substrate by the resin via the structure,

wherein the structure includes a holding portion to hold the resin with a capillary force,

wherein the resin is filled in at least part of the holding portion.

7 . A liquid ejection head comprising:

a first substrate on which part of a channel is formed, the first substrate having a predetermined surface;

a structure including an eave portion having an overhang with a predetermined length provided on the predetermined surface so as to form a space between the structure and the predetermined surface;

a resin provided on a side of the structure opposite to the first substrate; and

a second substrate bonded to the first substrate by the resin via the structure, wherein the resin is filled in at least part of the space.

8 . A method of manufacturing a laminated substrate comprising:

preparing a first substrate having a predetermined surface;

providing a structure including an eave portion having an overhang with a predetermined length on the predetermined surface so as to form a space between the structure and the predetermined surface;

providing a resin on a side of the structure opposite to the first substrate; and

bonding the first substrate and a second substrate by the resin via the structure,

wherein the step of providing the resin comprises filling the resin in at least part of the space.

9 . The method according to claim 8 , further comprising:

forming a film of a second material on a front surface of the first substrate; and

patterning the film of the second material,

wherein the providing of the structure includes:

forming a film of a first material to be the structure on the front surface of the first substrate and a front surface of the film of the second material;

patterning the film of the first material;

etching the film of the first material; and

removing the film of the second material.

10 . The method according to claim 9 , wherein the first material is any one of SiC, SiOC, SiCN, SiOCN, TiO, TaO, HfO, or ZrO.

11 . The method according to claim 9 , wherein the second material is any one of TiW, W, Cr, Al, or SiO.