Composite film manufacturing method and organic/inorganic hybrid film manufacturing method

1 . A method for producing a composite film to form a laminate in combination with a base material for on-site use, comprising:

providing a sputtering device comprising a sputtering chamber and a target (A) that is an inorganic substance solid in a standard state (a temperature of 25° C. and a pressure of 100 KPa) and a gas inlet, the sputtering device being without another target that is a solid organic substance;

mounting the target (A) on a target installation jig of the sputtering device;

reducing a pressure inside the sputtering chamber of the sputtering device to a first pressure;

introducing a mixed gas comprising a sputtering gas and a gas (B) containing an organic compound, the organic compound being supplied as a component constituting the composite film, into the sputtering chamber of the sputtering device such that the sputtering chamber reaches a second pressure that is equal to or greater than the first pressure,

wherein the introducing of the mixed gas comprises introducing gas streams of both the gases while merging and mixing the gas streams or preparing the mixed gases in advance and introducing the mixed gas; and

then supplying electric power to the target (A) and sputtering the target (A) to form the composite film containing the inorganic substance from the target (A) and the organic compound from the gas (B) contained in the mixed gas on a surface of the base material so as to obtain the laminate combined with the base material for on-site use,

wherein the target (A) has a band gap in a range of 2.6 to 3.7 eV,

wherein the composite film is uniform in both film thickness and composition, and

wherein the base material comprises a resin.

2 . The method according to claim 1 , wherein the sputtering device is a roll-to-roll sputtering device.

3 . The method according to claim 1 , wherein a mixing ratio in the mixed gas (volume of the sputtering gas/volume of the gas (B)) is in a range of 60/40 to 99.999/0.001.

4 . The method according to claim 1 , wherein the gas (B) contains one or more compounds selected from the group consisting of a compound that has a structure in which one or two or more hydrogen atoms of a saturated hydrocarbon are substituted with a fluorine atom and is gaseous in a standard state, and a compound that has a structure in which one or two or more hydrogen atoms of an unsaturated hydrocarbon are substituted with a fluorine atom and is gaseous in a standard state.

5 . The method according to claim 1 , wherein the target (A) contains cerium oxide.

6 . The method according to claim 1 , wherein:

the sputtering device is a roll-to-roll sputtering device;

a mixing ratio in the mixed gas (volume of the sputtering gas/volume of the gas (B)) is in a range of 60/40 to 99.999/0.001; and

the gas (B) contains one or more compounds selected from the group consisting of a compound that has a structure in which one or two or more hydrogen atoms of a saturated hydrocarbon are substituted with a fluorine atom and is gaseous in a standard state, and a compound that has a structure in which one or two or more hydrogen atoms of an unsaturated hydrocarbon are substituted with a fluorine atom and is gaseous in a standard state; and

the target (A) contains cerium oxide.

7 . The method according to claim 1 , wherein:

the sputtering device is a roll-to-roll sputtering device;

a mixing ratio in the mixed gas (volume of the sputtering gas/volume of the gas (B)) is in a range of 60/40 to 99.999/0.001; and

the gas (B) contains one or more compounds selected from the group consisting of a compound that has a structure in which one or two or more hydrogen atoms of a saturated hydrocarbon are substituted with a fluorine atom and is gaseous in a standard state, and a compound that has a structure in which one or two or more hydrogen atoms of an unsaturated hydrocarbon are substituted with a fluorine atom and is gaseous in a standard state.

8 . The method of claim 1 , wherein:

the sputtering device is a roll-to-roll sputtering device; and

a mixing ratio in the mixed gas (volume of the sputtering gas/volume of the gas (B)) is in a range of 60/40 to 99.999/0.001.

9 . The method of claim 1 , wherein:

the sputtering device is a roll-to-roll sputtering device; and

the gas (B) contains one or more compounds selected from the group consisting of a compound that has a structure in which one or two or more hydrogen atoms of a saturated hydrocarbon are substituted with a fluorine atom and is gaseous in a standard state, and a compound that has a structure in which one or two or more hydrogen atoms of an unsaturated hydrocarbon are substituted with a fluorine atom and is gaseous in a standard state.

10 . The method of claim 1 , wherein:

the sputtering device is a roll-to-roll sputtering device; and

the target (A) contains cerium oxide.

11 . The method of claim 1 , wherein:

the sputtering device is a roll-to-roll sputtering device;

a mixing ratio in the mixed gas (volume of the sputtering gas/volume of the gas (B)) is in a range of 60/40 to 99.999/0.001; and

the target (A) contains cerium oxide.

12 . The method of claim 1 , wherein

a mixing ratio in the mixed gas (volume of the sputtering gas/volume of the gas (B)) is in a range of 60/40 to 99.999/0.001; and

the gas (B) contains one or more compounds selected from the group consisting of a compound that has a structure in which one or two or more hydrogen atoms of a saturated hydrocarbon are substituted with a fluorine atom and is gaseous in a standard state, and a compound that has a structure in which one or two or more hydrogen atoms of an unsaturated hydrocarbon are substituted with a fluorine atom and is gaseous in a standard state.

13 . The method of claim 1 , wherein:

a mixing ratio in the mixed gas (volume of the sputtering gas/volume of the gas (B)) is in a range of 60/40 to 99.999/0.001; and

the target (A) contains cerium oxide.

14 . The method of claim 1 , wherein:

the gas (B) contains one or more compounds selected from the group consisting of a compound that has a structure in which one or two or more hydrogen atoms of a saturated hydrocarbon are substituted with a fluorine atom and is gaseous in a standard state, and a compound that has a structure in which one or two or more hydrogen atoms of an unsaturated hydrocarbon are substituted with a fluorine atom and is gaseous in a standard state; and

the target (A) contains cerium oxide.

15 . The method of claim 1 , wherein:

a mixing ratio in the mixed gas (volume of the sputtering gas/volume of the gas (B)) is in a range of 60/40 to 99.999/0.001; and

the gas (B) contains one or more compounds selected from the group consisting of a compound that has a structure in which one or two or more hydrogen atoms of a saturated hydrocarbon are substituted with a fluorine atom and is gaseous in a standard state, and a compound that has a structure in which one or two or more hydrogen atoms of an unsaturated hydrocarbon are substituted with a fluorine atom and is gaseous in a standard state; and

the target (A) contains cerium oxide.

16 . The method of claim 1 , wherein the introduction of the mixed gas is conducted by introducing gas streams of both the gases while merging and mixing the gas streams.

17 . The method of claim 1 , wherein the introduction of the mixed gas is conducted by preparing the mixed gases in advance and introducing the mixed gas.

18 . The method of claim 1 , wherein the base material is a resin film, a resin sheet, or a resin plate.