Particle monitoring system, particle monitoring method, and monitoring device

1 . A particle monitoring system comprising:

a plasma processing apparatus including a chamber and a stage disposed in the chamber;

a monitoring device including a plate-shaped base substrate, and a plurality of imaging devices having optical axes facing upward on the base substrate, and being disposed apart from each other;

a transport device configured to transport the monitoring device onto the stage;

a light emitting device for irradiating light from a side surface of the chamber to irradiate an inside of the chamber with light; and

a control device for discriminating the particle in the images captured by the plurality of imaging devices of the monitoring device when placed on the stage.

2 . The particle monitoring system according to claim 1 ,

wherein the light emitting device is a laser oscillator for emitting laser light as the light.

3 . The particle monitoring system according to claim 1 ,

wherein the control device counts the particle in the images captured by the plurality of imaging devices.

4 . The particle monitoring system according to claim 1 ,

wherein the control device acquires a position of the particle in the images captured by the plurality of imaging devices.

5 . The particle monitoring system according to claim 1 ,

wherein the control device acquires a size of the particle in the images captured by the plurality of imaging devices.

6 . The particle monitoring system according to claim 1 ,

wherein an imaging range of each of the plurality of imaging devices in the plasma processing apparatus does not include an overlapping region.

7 . A particle monitoring method of measuring a particle in a plasma processing apparatus by using a monitoring device,

in which the monitoring device includes

a plate-shaped base substrate, and

a plurality of imaging devices having optical axes facing upward on the base substrate, and being disposed apart from each other, and

the method comprising:

placing the monitoring device on a stage in a chamber of the plasma processing apparatus;

irradiating an inside of the chamber of the plasma processing apparatus with light;

imaging scattered light from the particle irradiated with the light by the plurality of imaging devices; and

discriminating the particle in an image captured by the plurality of imaging devices.

8 . The particle monitoring method according to claim 7 ,

wherein the irradiating with the light, laser light is emitted as the light.

9 . The particle monitoring method according to claim 7 ,

wherein the imaging by the plurality of imaging devices is executed in a state where a gas is supplied into the chamber.

10 . The particle monitoring method according to claim 7 ,

wherein the imaging by the plurality of imaging devices is executed in a state where a plasma is generated in the chamber.

11 . A particle monitoring system comprising:

a plasma processing apparatus including a chamber and a stage disposed in the chamber; and

a monitoring device for measuring a particle in a plasma processing apparatus, the monitoring device being in the chamber and comprising:

a plate-shaped base substrate having a shape of a wafer and including a notch on an edge thereof for rotational alignment;

a plurality of imaging devices having optical axes facing upward on the base substrate, and being disposed apart from each other to capture images including scattered light from the particle irradiated with light incident from a side surface of a chamber of the plasma processing apparatus; and

a control device for discriminating the particle in the images captured by the plurality of imaging devices.

12 . The particle monitoring method according to claim 7 ,

wherein the irradiating includes irradiating light from a side surface of the chamber to irradiate an inside of the chamber with light.