IP Library Granted Patent US 12663398
Granted Patent B2
US 12663398 · App. 18/489,293 · Granted Jun 23, 2026

Gas sensor

Inventors: Yusuke Watanabe (Nagoya, JP); Yohei Goro (Nagoya, JP)
Assignee: NGK INSULATORS, LTD.
G01N27/409G01N27/301G01N27/4067G01N27/41G01N27/419G01N33/0037
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Quick Facts
Patent No.
US 12663398
App. No.
18/489,293
Granted
Jun 23, 2026
Kind
B2
Abstract

A gas sensor includes: an element body which is internally provided with a measurement-object gas flow portion; a first pump cell including a first inner electrode disposed in the measurement-object gas flow portion; a second pump cell including a second inner electrode disposed in the measurement-object gas flow portion; a heater; a first impedance measurer configured to measure a first impedance by applying a voltage to the first inner electrode; a second impedance measurer configured to measure a second impedance by applying a voltage to the second inner electrode; and a control apparatus configured to perform a heater control process of controlling the heater so that the first impedance reaches a target value, and a correction process of correcting, based on the second impedance, a second pump current which flows through the second pump cell or a value derived based on the second pump current.

Claims (29)

1 . A gas sensor that detects a specific gas concentration which is a concentration of a specific gas in a measurement-object gas, the gas sensor comprising:

an element body which includes an oxygen-ion-conductive solid electrolyte layer, and is internally provided with a measurement-object gas flow portion that introduces the measurement-object gas and causes the measurement-object gas to flow;

a first pump cell including a first inner electrode disposed in the measurement-object gas flow portion, the first pump cell being configured to perform pumping of oxygen;

a second pump cell including a second inner electrode disposed in the measurement-object gas flow portion, the second pump cell being configured to perform pumping of oxygen;

a heater configured to heat the element body;

a first impedance measurer configured to measure a first impedance by applying a voltage to the first inner electrode;

a second impedance measurer configured to measure a second impedance by applying a voltage to the second inner electrode;

a control apparatus configured to perform a heater control process of controlling the heater so that the first impedance reaches a target value, and a correction process of correcting, based on the second impedance, a second pump current which flows through the second pump cell or a value derived based on the second pump current;

a reference electrode disposed inside the element body to come into contact with a reference gas which serves as a reference for detecting the specific gas concentration; and

an adjustment pump cell including the first pump cell, the adjustment pump cell being configured to adjust an oxygen concentration in an oxygen concentration adjustment chamber of the measurement-object gas flow portion,

wherein the first inner electrode is disposed in the oxygen concentration adjustment chamber,

the second inner electrode is an inner measurement electrode disposed in a measurement chamber provided downstream of the oxygen concentration adjustment chamber of the measurement-object gas flow portion,

the second pump cell is a measurement pump cell that pumps out oxygen originating from the specific gas from the measurement chamber,

the control apparatus performs an adjustment pump control process of controlling the adjustment pump cell so that the oxygen concentration in the oxygen concentration adjustment chamber reaches a target concentration, an oxygen concentration detection process of detecting an oxygen concentration in the measurement-object gas based on a first pump current which is caused to flow through the first pump cell by the adjustment pump control process, a measurement pump control process of feedback controlling a control voltage to be applied to the measurement pump cell so that a voltage across the reference electrode and the inner measurement electrode reaches a target value, and a specific gas concentration detection process of detecting the specific gas concentration in the measurement-object gas based on a measurement pump current that is the second pump current caused to flow through the measurement pump cell by the measurement pump control process, and

in the correction process, the control apparatus corrects, based on the second impedance, the measurement pump current in the specific gas concentration detection process or the specific gas concentration.

2 . The gas sensor according to claim 1 ,

wherein the oxygen concentration adjustment chamber includes a first internal cavity in which the first inner electrode is disposed, and a second internal cavity provided downstream of the first internal cavity and upstream of the measurement chamber of the measurement-object gas flow portion,

the adjustment pump cell includes a main pump cell which is the first pump cell, and an auxiliary pump cell having an auxiliary pump electrode disposed in the second internal cavity and being configured to perform pumping of oxygen, and

the adjustment pump control process includes a main pump control process of controlling the main pump cell to adjust an oxygen concentration in the first internal cavity, and an auxiliary pump control process of controlling the auxiliary pump cell to adjust an oxygen concentration in the second internal cavity.

3 . A gas sensor that detects a specific gas concentration which is a concentration of a specific gas in a measurement-object gas, the gas sensor comprising:

an element body which includes an oxygen-ion-conductive solid electrolyte layer, and is internally provided with a measurement-object gas flow portion that introduces the measurement-object gas and causes the measurement-object gas to flow;

a first pump cell including a first inner electrode disposed in the measurement-object gas flow portion, the first pump cell being configured to perform pumping of oxygen;

a second pump cell including a second inner electrode disposed in the measurement-object gas flow portion, the second pump cell being configured to perform pumping of oxygen;

a heater configured to heat the element body;

a first impedance measurer configured to measure a first impedance by applying a voltage to the first inner electrode;

a second impedance measurer configured to measure a second impedance by applying a voltage to the second inner electrode;

a control apparatus configured to perform a heater control process of controlling the heater so that the first impedance reaches a target value, and a correction process of correcting, based on the second impedance, a second pump current which flows through the second pump cell or a value derived based on the second pump current;

wherein the first impedance measurer measures the first impedance by applying the voltage with a frequency of 1 kHz or higher to the first inner electrode, and

the second impedance measurer measures the second impedance by applying the voltage with a frequency of 1 kHz or higher to the second inner electrode.