IP Library Granted Patent US 12663584
Granted Patent B2
US 12663584 · App. 18/623,146 · Granted Jun 23, 2026

Structures including a photonic device and an undercut

Inventors: Yarong Lin (Flushing, NY); Thomas Houghton (Marlboro, NY); Teck Jung Tang (Ballston Lake, NY); Mini Modh Ghosal (Maharashtra, IN); Arunraj Prakash (Karnataka, IN)
Assignee: GlobalFoundries U.S. Inc.
G02B6/1228G02B6/136
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Quick Facts
Patent No.
US 12663584
App. No.
18/623,146
Granted
Jun 23, 2026
Kind
B2
Abstract

Structures including a photonic device, such as a spot-size converter, and an undercut, and related methods. The structure comprises a photonic device, a semiconductor substrate, and a dielectric layer disposed between the photonic device and the semiconductor substrate. The dielectric layer includes a plurality of D-shaped openings that are laterally offset from the photonic device, and each of the plurality of D-shaped openings has a first sidewall portion that is curved and a second sidewall portion that is substantially planar.

Claims (27)

1 . A structure comprising:

a photonic device;

a semiconductor substrate; and

a dielectric layer disposed between the photonic device and the semiconductor substrate, the dielectric layer including a first plurality of D-shaped openings that are laterally offset from the photonic device, and each of the first plurality of D-shaped openings having a first sidewall portion that is curved and a second sidewall portion that is substantially planar.

2 . The structure of claim 1 wherein the semiconductor substrate includes a cavity beneath the photonic device, and the first plurality of D-shaped openings intersect the cavity in the semiconductor substrate.

3 . The structure of claim 1 wherein the dielectric layer includes a second plurality of D-shaped openings that are laterally offset from the photonic device, each of the second plurality of D-shaped openings has a first sidewall portion that is curved and a second sidewall portion that is substantially planar, and the photonic device is laterally disposed between the first plurality of D-shaped openings and the second plurality of D-shaped openings.

4 . The structure of claim 3 wherein the semiconductor substrate includes a cavity beneath the photonic device, and the first plurality of D-shaped openings and the second plurality of D-shaped openings intersect the cavity in the semiconductor substrate.

5 . The structure of claim 3 wherein the first plurality of D-shaped openings are arranged in a first row, and the second plurality of D-shaped openings are arranged in a second row.

6 . The structure of claim 3 wherein the photonic device is disposed between a first outer edge of a keep-out lane and a second outer edge of a keep-out line, the second sidewall portion of each of the first plurality of D-shaped openings coincides with the first outer edge of the keep-out lane, and the second sidewall portion of each of the second plurality of D-shaped openings coincides with the second outer edge of the keep-out lane.

7 . The structure of claim 1 wherein the semiconductor substrate includes a cavity beneath the photonic device, and the first plurality of D-shaped openings intersect the cavity in the semiconductor substrate.

8 . The structure of claim 1 wherein the photonic device is a spot-size converter.

9 . The structure of claim 1 wherein each of the first plurality of D-shaped openings has a cross-sectional profile that is a disk segment.

10 . The structure of claim 9 wherein each of the first plurality of D-shaped openings has a height, the first sidewall portion of each of the first plurality of D-shaped openings is an arc of the disk segment projected over the height, and the second sidewall portion of each of the first plurality of D-shaped openings is a chord of the disk segment projected over the height.

11 . The structure of claim 10 wherein the arc has an arc length that is greater than 180°.

12 . The structure of claim 1 wherein each of the first plurality of D-shaped openings has a cross-sectional profile that is an elliptical segment.

13 . The structure of claim 1 wherein the second sidewall portion of each of the first plurality of D-shaped openings is closer to the photonic device than the first sidewall portion.

14 . The structure of claim 1 wherein the first plurality of D-shaped openings are arranged in a row.

15 . The structure of claim 14 wherein the photonic device includes a waveguide core having a section with a longitudinal axis, and the row is aligned parallel to the longitudinal axis.

16 . The structure of claim 15 wherein the second sidewall portion of each of the first plurality of D-shaped openings is spaced from the longitudinal axis of the section of the waveguide core.

17 . The structure of claim 14 wherein the photonic device includes a waveguide core having a section with a longitudinal axis, and the row is tilted at an angle relative to the longitudinal axis.

18 . A method comprising:

forming a photonic device, wherein a dielectric layer is disposed between the photonic device and a semiconductor substrate; and

forming a first plurality of D-shaped openings in the dielectric layer that are laterally offset from the photonic device, wherein each of the first plurality of D-shaped openings has a first sidewall portion that is curved and a second sidewall portion that is substantially planar.

19 . The method of claim 18 further comprising:

forming a second plurality of openings in the dielectric layer, wherein the second plurality of openings are round and have a diameter greater than or equal to 10 micrometers.

20 . The method of claim 19 further comprising:

forming a groove in the semiconductor substrate at a location of the second plurality of openings.