Washout processor and washing method
A washout processor and a washing method suppress brush marks and development unevenness. The processor includes a unit that performs development by simultaneously performing circular movement and linear reciprocation of a developing brush on the flexographic printing plate precursor. The circular movement and the linear reciprocation of the developing brush satisfy at least one of conditions (a) or (b). Condition (a) when a stop time when switching between directions of the linear reciprocation of the developing brush is t seconds and a rotation speed of the circular movement of the developing brush is R times per second, t<R is satisfied. Condition (b) when the number of times of linear reciprocation per unit time in the linear reciprocation of the developing brush is f times per second and the rotation speed of the circular movement of the developing brush is R times per second, f<R is satisfied.
1 . A washout processor that develops an imagewise exposed flexographic printing plate precursor using a washing solution with a developing brush, the washout processor comprising:
a development unit that performs development using the washing solution by simultaneously performing circular movement and linear reciprocation of the developing brush on the imagewise exposed flexographic printing plate precursor,
wherein the circular movement and the linear reciprocation of the developing brush by the development unit satisfy, of the following conditions (a) to (c), at least conditions (a) and (b) or conditions (b) and (c),
condition (a) in a case where a stop time in a case of switching between directions of the linear reciprocation of the developing brush is t seconds and a rotation speed of the circular movement of the developing brush is R times per second, t<R,
condition (b) in a case where the number of times of linear reciprocation per unit time in the linear reciprocation of the developing brush is f times per second and the rotation speed of the circular movement of the developing brush is R times per second, f<R,
condition (c) in a case where a moving distance in the linear reciprocation of the developing brush is d millimeters and a radius of the circular movement of the developing brush is r millimeters, d≥r.
2 . The washout processor according to claim 1 ,
wherein development is performed while the washing solution is supplied from above the developing brush.
3 . The washout processor according to claim 1 ,
wherein the developing brush has a substrate and a bristle, and
a material for the substrate is a thermoplastic resin, and the thermoplastic resin has a tensile modulus of 25,000 kg/cm 2 or more and an elongation rate of 10% or more measured according to ASTM International D638.
4 . The washout processor according to claim 3 ,
wherein the thermoplastic resin is vinyl chloride or a polyacetal resin.
5 . The washout processor according to claim 3 ,
wherein a material for the bristle of the developing brush is nylon 6,12.