Process chamber and process kits for advanced packaging
Process kits for processing chambers and processing chambers having a lower shield and lower shield ring are described. The lower shield has a ring-shaped body with an inner wall and an outer wall, a top wall and a bottom wall with an outer ledge wall extends outwardly from a lower portion of the outer wall to an outer ledge outer wall. The lower shield ring has a ramped lower inner wall with a top face spaced a distance from the bottom face of the upper inner wall so that the distance decreases from the lower inner wall to an inside surface of the outer wall. At least one upper opening extends through the top portion of the lower shield ring and at least one opening extends through the lower portion of the lower shield ring. Upper shields configured to cooperatively interact with the lower shield and lower shield ring are also described.
1 . A process kit for a processing chamber, the process kit comprising:
a lower shield having a ring-shaped body with an inner wall and an outer wall defining a lower shield wall thickness, the inner wall including a bottom wall, a top wall with an inner ledge having an inner ledge top face, the bottom wall and the inner ledge top face defining a lower shield height, an outer ledge wall extending outwardly forming a lower portion of the outer wall to an outer ledge outer wall, the outer ledge outer wall having a stepped top surface having an outer ledge upper top face and forming an outer ledge lower top face extending from the outer ledge outer wall to an outer ledge intermediate outer wall; and
a lower shield ring having a ring-shaped body with an outer wall and a upper inner wall defining a lower shield ring wall thickness, a top face and a bottom face of the upper inner wall defining a thickness of the upper inner wall, a ramped lower inner wall having a top face and a bottom face, the top face of the ramped lower inner wall spaced a distance from the bottom face of the upper inner wall so that the distance decreases from a lower inner wall to an inside surface of the outer wall of the lower shield ring, at least one upper opening extending from the top face of the lower shield ring to the upper inner wall bottom face, and at least one lower opening extending from the top face of the ramped lower inner wall to the bottom face of the ramped lower inner wall, wherein when the ramped lower inner wall of the lower shield ring is in contact with the outer ledge intermediate outer wall of the lower shield, wherein there is an overlap of the lower shield and the lower shield ring, wherein the lower shield height is such that there is horizontal separation extending between the upper inner wall of the lower shield ring at the top face and the top wall of the lower shield defining a gap between the outer wall of the lower shield and the upper inner wall of the lower shield ring, the gap extending to the outer ledge upper top face, and there is a ratio of the overlap of the lower shield and the lower shield ring to the gap between the outer wall of the lower shield and the upper inner wall of the lower shield ring in a range of 5:1 to 10:1.
2 . The process kit of claim 1 , wherein the inner ledge extends a distance inwardly from an upper portion of the inner wall of the lower shield to an inner ledge face, forming an inner ledge top face and an inner ledge bottom face defining a thickness of the inner ledge.
3 . The process kit of claim 2 , further comprising a plurality of recesses in the inner ledge top face with a hole extending through the thickness of the inner ledge.
4 . The process kit of claim 1 , wherein the lower shield ring comprises an inner wall ramp connector face extending from the upper inner wall to the ramped lower inner wall.
5 . The process kit of claim 1 , wherein the lower inner wall of the ramped lower inner wall has an inner diameter smaller than an inner diameter of the upper inner wall.
6 . The process kit of claim 1 , wherein the outer ledge lower top face comprises a recess.
7 . The process kit of claim 6 , wherein the bottom face of the ramped lower inner wall comprises a recess.
8 . The process kit of claim 7 , wherein the recess in the outer ledge lower top face of the lower shield is spaced a distance from the lower inner wall so that when the lower inner wall is in contact with the outer ledge intermediate outer wall of the lower shield, the recess in the outer ledge lower top face is aligned with the recess in the bottom face of the ramped lower inner wall of the lower shield ring.
9 . The process kit of claim 1 , wherein the lower shield ring comprises three lower openings extending through the upper inner wall.
10 . The process kit of claim 9 , wherein there are three lower openings extending through the ramped lower inner wall of the lower shield ring.
11 . The process kit of claim 1 , further comprising a support ring having a ring-shaped body with an inner face and an outer face defining a width of the support ring, a top face, a bottom face, an inner top face extending a length from the inner face to an inner sloped face, the inner sloped face connecting the inner top face to the top face so that a thickness of the support ring increases along a length of the inner sloped face from the inner top face to the top face, and an outer sloped face extending from an outer edge of the top face to the outer face so that the thickness of the support ring decreases from the outer edge of the top face to the outer face along the length of the outer sloped face.
12 . The process kit of claim 11 , wherein the bottom face of the ramped lower inner wall contacts the outer ledge lower top face of the lower shield.
13 . The process kit of claim 12 , wherein a gap between the outer ledge lower top face of the outer ledge and the bottom face of the ramped lower inner wall increases with increasing distance from the ramped lower inner wall to the outer ledge outer wall.
14 . The process kit of claim 1 , wherein there is at least one opening extending through the thickness of the lower shield ring from the top face to the bottom face.
15 . The process kit of claim 11 , further comprising an upper shield having a top surface and a bottom surface, an upper shield ring extending from the bottom surface, the upper shield ring having an inside surface and an outside surface defining a thickness of the upper shield ring.
16 . The process kit of claim 15 , wherein the inside surface of the upper shield ring has an inner diameter greater than an outer diameter of the outer wall of the lower shield.
17 . The process kit of claim 15 , wherein the thickness of the upper shield ring is smaller than the gap between the outer wall of the lower shield and the upper inner wall of the lower shield ring.
18 . The process kit of claim 15 , wherein the bottom surface of the upper shield within an inner diameter of the upper shield ring has a contoured shape so that a thickness of the upper shield is greater at a center of the upper shield than at a position in the range of 50% to 90% of the distance between the center of the upper shield and the inner wall of the upper shield ring.
19 . The process kit of claim 15 , further comprising a grounding ring having an inner diameter greater than an outer diameter of the upper shield ring and a top surface configured to connect to the bottom surface of the upper shield ring outside the outer diameter of the upper shield ring.