Substrate treating apparatus and substrate treating method
A substrate treating apparatus is provided to provide heating and plasma treatment of a substrate in a single device, and the substrate treating apparatus includes a treatment container in which a substrate is accommodated, a support member supporting the substrate in the treatment container, a plasma providing unit including an electrode generating plasma within the treatment container, and a microwave introducing unit connected to a microwave generating unit and introducing microwaves into the treatment container.
1 . A substrate treating apparatus comprising:
a treatment container in which a substrate is accommodated;
a support member supporting the substrate in the treatment container;
a plasma providing unit including an electrode generating plasma within the treatment container, and the electrode being an upper electrode that is located above the substrate in the treatment container, is connected to a power source and is transparent; and
a microwave introducing unit connected to a microwave generating unit and introducing microwaves into the treatment container,
wherein:
the microwave introducing unit includes a microwave antenna, a waveguide, and a waveguide shaft connected to the microwave antenna,
the microwave antenna has a disk shape, an outer edge of the microwave antenna in a radial direction is connected to the treatment container to be grounded, and the microwave antenna is disposed to be spaced apart from the upper electrode of the plasma providing unit and is located above the upper electrode, and
a plurality of slots are formed in the microwave antenna,
the substrate treating apparatus further comprising:
an insulator formed of a microwave transmissive material and disposed between the upper electrode and the microwave antenna, and
a transmission window formed of the microwave transmissive material and disposed below the upper electrode, and the upper electrode being seated on the transmission window.
2 . The substrate treating apparatus of claim 1 , wherein a diameter of the microwave antenna is larger than a diameter of the upper electrode.
3 . The substrate treating apparatus of claim 1 , wherein
the treatment container includes an upper surface, a side surface, a baffle, and a support frame protruding inwardly from the side surface, and
the transmission window is at least partially supported on the support frame.
4 . A substrate treating apparatus comprising:
a treatment container in which a substrate is accommodated;
a support member supporting the substrate in the treatment container;
a plasma providing unit including an electrode disposed above the substrate and connected to a power source to form plasma in the treatment container;
a microwave introducing unit connected to a microwave generating unit and including a microwave antenna that introduces microwaves into the treatment container;
a gas supply unit introducing gas into the treatment container;
a discharge unit discharging the gas inside the treatment container; and
an insulator formed of a microwave transmissive material and disposed above the electrode,
wherein:
the treatment container includes an upper surface, a side surface, a baffle, and a support frame protruding inwardly from the side surface,
a transmission window is at least partially supported on the support frame, allows the electrode to be seated on an upper surface of the transmission window, and is formed of the microwave transmissive material,
the microwave antenna is disposed to be spaced apart from the electrode above the substrate and is seated on the insulator above the electrode,
the microwave antenna has a ring shape and includes a plurality of slots, and
the microwave antenna is connected to the microwave generating unit through a waveguide.
5 . The substrate treating apparatus of claim 4 , wherein:
the electrode is a transparent electrode,
the insulator and the transmission window include quartz,
the support frame includes ceramic, and
the support frame and the gas supply unit are connected.
6 . The substrate treating apparatus of claim 4 , wherein the ring shape of the microwave antenna surrounds the transmission window, and a distance from the microwave antenna to the substrate in a first direction, perpendicular to a treatment surface of the substrate, is shorter than a distance from the electrode to the substrate in the first direction.
7 . The substrate treating apparatus of claim 4 , wherein the plurality of slots are formed in a circumferential direction on a lower surface of the microwave antenna.
8 . The substrate treating apparatus of claim 4 , wherein a first distance from the microwave antenna to the substrate in a first direction, perpendicular to a treatment surface of the substrate, is identical to a second distance from the electrode to the substrate in the first direction.
9 . A substrate treating apparatus comprising:
a treatment container in which a substrate is accommodated;
a support member supporting the substrate in the treatment container;
a plasma providing unit including an electrode disposed above the substrate and connected to a power source to form plasma in the treatment container;
a microwave introducing unit connected to a microwave generating unit and including a microwave antenna that introduces microwaves into the treatment container;
a gas supply unit introducing gas into the treatment container;
a discharge unit discharging the gas inside the treatment container; and
an insulator formed of a microwave transmissive material and disposed above the electrode,
wherein:
the treatment container includes an upper surface, a side surface, a baffle, and a support frame protruding inwardly from the side surface,
a transmission window is at least partially supported on the support frame, allows the electrode to be seated on an upper surface of the transmission window, and is formed of the microwave transmissive material,
the microwave antenna is disposed to be spaced apart from the electrode above the substrate and is seated on the insulator above the electrode,
the microwave antenna has a disk shape and includes a plurality of slots, and
an outer edge of the microwave antenna in a radial direction is grounded in contact with the upper surface of the treatment container.