Semiconductor device

1 . A semiconductor device, comprising:

a first conductive layer and a second conductive layer that are insulated from each other;

a resistive element mounted on the first conductive layer; and

a semiconductor element mounted on the second conductive layer,

wherein the resistive element includes:

a substrate mounted on the first conductive layer;

an insulation layer formed on the substrate;

a thin film resistive layer formed on the insulation layer;

a head surface; and

electrodes formed on the head surface,

wherein the electrodes are formed on the head surface separated from each other and electrically connected to the thin film resistive layer.

2 . The semiconductor device according to claim 1 , wherein insulation layers are stacked in a thickness direction of the substrate.

3 . The semiconductor device according to claim 2 , wherein each of the insulation layers includes a first insulation layer including SiN, SiC, or SiCN and a second insulation layer formed on the first insulation layer and including SiO 2 .

4 . The semiconductor device according to claim 3 , wherein the thin film resistive layer is formed on the second insulation layer.

5 . The semiconductor device according to claim 1 , wherein the electrodes are disposed at positions overlapping the thin film resistive layer as viewed in a thickness direction of the substrate.

6 . The semiconductor device according to claim 1 , wherein:

the electrodes include a first input electrode and a second input electrode;

thin film resistive layers are arranged; and

the thin film resistive layers are electrically connected in series between the first input electrode and the second input electrode.

7 . The semiconductor device according to claim 6 , wherein the thin film resistive layers are disposed separated from each other in a direction orthogonal to a thickness direction of the substrate in a state located at the same position in the thickness direction of the substrate.

8 . The semiconductor device according to claim 7 , wherein:

the resistive element is rectangular, includes a long side and a short side as viewed in the thickness direction of the substrate, and is mounted on the first conductive layer so that the short side extends in a first direction that is an arrangement direction of the first conductive layer and the second conductive layer;

the thin film resistive layers extend in the first direction; and

the thin film resistive layers are disposed separated from each other in a second direction that is orthogonal to the first direction as viewed in the thickness direction of the substrate.

9 . The semiconductor device according to claim 8 , wherein:

the thin film resistive layers include a first thin film resistive layer, a second thin film resistive layer, and a third film resistive layer that are adjacent to one another in the second direction;

the first thin film resistive layer, the second thin film resistive layer, and the third film resistive layer each include two ends in the first direction, the end closer to the second conductive layer being a first end, and the end farther from the second conductive layer being a second end;

the first end of the first thin film resistive layer is electrically connected to the first end of the second thin film resistive layer; and

the second end of the second thin film resistive layer is electrically connected to the second end of the third thin film resistive layer.

10 . The semiconductor device according to claim 6 , wherein the thin film resistive layers are disposed separated from each other in a thickness direction of the substrate.

11 . The semiconductor device according to claim 6 , comprising:

a first input terminal and a second input terminal;

a first wire connecting the first input electrode and the first input terminal; and

a second wire connecting the second input electrode and the second input terminal.

12 . The semiconductor device according to claim 11 , wherein:

an arrangement direction of the first conductive layer and the second conductive layer as viewed in a thickness direction of the substrate is defined as a first direction, and a direction orthogonal to the first direction is defined as a second direction;

the first input terminal and the second input terminal are disposed at two ends of the first conductive layer in the second direction;

the first input terminal is disposed separated from the first conductive layer;

the second input terminal is integrated with the first conductive layer; and

the resistive element is disposed on the first conductive layer toward the second input terminal in the second direction.

13 . The semiconductor device according to claim 11 , wherein:

an arrangement direction of the first conductive layer and the second conductive layer as viewed in a thickness direction of the substrate is defined as a first direction, and a direction orthogonal to the first direction is defined as a second direction; and

the first input terminal is insulated from the second input terminal in the second direction.

14 . The semiconductor device according to claim 11 , further comprising three or more output terminals electrically connected to the semiconductor element.

15 . The semiconductor device according to claim 11 , wherein:

the resistive element includes a reference electrode that outputs divisional voltage from the resistive element, a first detection electrode, and a second detection; and

the semiconductor element includes a first element electrode, a second element electrode, and a third element electrode,

the semiconductor device further comprising:

a third wire connecting the reference electrode to the first element electrode;

a fourth wire connecting the first detection electrode to the second element electrode; and

a fifth wire connecting the second detection electrode to the third element electrode.

16 . The semiconductor device according to claim 1 , wherein the thin film resistive layer includes CrSi.

17 . The semiconductor device according to claim 1 , wherein the first conducive layer differs in area from the second conductive layer as viewed in a thickness direction of the substrate.

18 . The semiconductor device according to claim 1 , further comprising an encapsulation resin that encapsulates the first conductive layer, the second conductive layer, the resistive element, and the semiconductor element.