Solid-state imaging device

1 . A solid-state imaging device, comprising:

a semiconductor support substrate;

a wiring layer formed on the semiconductor support substrate and including a predetermined metal wiring pattern;

a photoelectric conversion layer provided on the wiring layer and including a plurality of photoelectric conversion elements that are formed in an array to generate charges by photoelectric conversion based on light incident on an incident surface; and

a reflective structure disposed corresponding to each of the plurality of photoelectric conversion elements between the predetermined metal wiring pattern and the photoelectric conversion layer, the reflective structure having predetermined electromagnetic characteristics,

wherein the reflective structure includes a plurality of elements,

wherein a first one of the elements is closer to a centerline of the corresponding photoelectric conversion element than any other of the elements,

wherein the first one of the elements is an annular element that encloses an open center area,

wherein the first one of the elements is within an area enclosed by a second one of the elements,

wherein the first one of the elements is spaced apart from the second one of the elements, and

wherein among the light incident on the photoelectric conversion layer, the reflective structure condenses and reflects light transmitted through each photoelectric conversion element of the photoelectric conversion layer at and to the photoelectric conversion element.

2 . The solid-state imaging device according to claim 1 , wherein the reflective structure is a metamaterial structure with a negative effective refractive index.

3 . The solid-state imaging device according to claim 2 , wherein the reflective structure is configured to condense and reflect light at and to a substantially central portion of the photoelectric conversion element.

4 . The solid-state imaging device according to claim 3 , wherein the reflective structure is a collection of meta-atoms.

5 . The solid-state imaging device according to claim 4 , wherein the reflective structure is formed from a metal material and a dielectric material.

6 . The solid-state imaging device according to claim 5 , wherein each of the meta-atoms has a gap surface plasmon (GSP) structure.

7 . The solid-state imaging device according to claim 6 , wherein the metal material is selected from at least one of Ag, Au, Cu, and Al.

8 . The solid-state imaging device according to claim 6 , wherein the dielectric material is selected from at least one of Si, Ge, and SiGe.

9 . The solid-state imaging device according to claim 4 , wherein the reflective structure is configured such that the meta-atoms form a bullseye pattern shape.

10 . The solid-state imaging device according to claim 4 , wherein the reflective structure is configured such that the meta-atoms form an imperfect bullseye pattern shape.

11 . The solid-state imaging device according to claim 10 , wherein the imperfect bullseye pattern shape is a shape, part of which is missing to avoid electromagnetic interference with the predetermined metal wiring pattern in the wiring layer.

12 . The solid-state imaging device according to claim 1 , further comprising a plurality of on-chip lenses provided corresponding to the plurality of photoelectric conversion elements on the incident surface side of the photoelectric conversion layer,

wherein each of the plurality of on-chip lenses is disposed with an offset in a predetermined direction from a center of the photoelectric conversion element depending on a position in an angle of view defined by the plurality of photoelectric conversion elements.

13 . The solid-state imaging device according to claim 12 , wherein the reflective structure is disposed with an offset in a direction opposite to the predetermined direction with respect to the center of the photoelectric conversion element depending on a position of an on-chip lens for the corresponding photoelectric conversion element and included in the plurality of on-chip lenses.

14 . The solid-state imaging device according to claim 13 , wherein the reflective structure is disposed with a larger amount of offset between a center of the reflective structure and the center of the photoelectric conversion element as the corresponding photoelectric conversion element is farther from a center of the angle of view.

15 . An electronic device, comprising:

a solid-state imaging device; and

a control unit that controls the solid-state imaging device,

wherein the solid-state imaging device includes:

a semiconductor support substrate;

a wiring layer formed on the semiconductor support substrate and including a predetermined metal wiring pattern;

a photoelectric conversion layer provided on the wiring layer and including a plurality of photoelectric conversion elements that are formed in an array to generate charges by photoelectric conversion based on light incident on an incident surface; and

a reflective structure disposed corresponding to each of the plurality of photoelectric conversion elements between the predetermined metal wiring pattern and the photoelectric conversion layer, the reflective structure having predetermined electromagnetic characteristics,

wherein the reflective structure includes a plurality of elements,

wherein a first one of the elements is closer to a centerline of the corresponding photoelectric conversion element than any other of the elements,

wherein the first one of the elements is an annular element that encloses an open center area,

wherein the first one of the elements is within an area enclosed by a second one of the elements,

wherein the first one of the elements is spaced apart from the second one of the elements, and

wherein among the light incident on the photoelectric conversion layer, the reflective structure condenses and reflects light transmitted through each photoelectric conversion element of the photoelectric conversion layer at and to the photoelectric conversion element.

16 . The solid-state imaging device according to claim 4 , wherein the reflective structure is formed from at least one of a metal material or a dielectric material.