Chip of LED and manufacturing method thereof

1 . A chip of a LED, comprising:

a substrate, and an epitaxial layer, a current blocking layer, a transparent conductive layer and a metal finger electrode grown sequentially on the substrate, wherein

the current blocking layer includes a first current blocking layer grown along a length direction of the epitaxial layer and a second current blocking layers, a number of the second current blocking layers is multiple, the plurality of second current blocking layers are arranged at one end of the first current blocking layer at intervals, and the plurality of second current blocking layers are arranged and grown in a preset shape;

the first current blocking layer gradually widens along a direction away from the second current blocking layers;

the transparent conductive layer includes a first transparent conductive layer and a second transparent conductive layer, the first transparent conductive layer is grown on the current blocking layer and is at least partially overlapped with the second current blocking layers, and the second transparent conductive layer is grown on the epitaxial layer; and

the metal finger electrode is grown on a region of the transparent conductive layer on which the current blocking layer is orthographically projected, the metal finger electrode has a first end of the metal finger electrode and a second end of the metal finger electrode opposite to each other, a width of the metal finger electrode gradually narrows from the first end of the metal finger electrode to the second end of the metal finger electrode, the width of the metal finger electrode is smaller than a width of the first current blocking layer, and the second current blocking layers are distributed around the first end of the metal finger electrode, and

wherein an end point of the second end of the metal finger electrode is provided with an antistatic part which widens a width of the end point of the second end of the metal finger electrode.

2 . The chip of the LED according to claim 1 , wherein an end point of the first end of the metal finger electrode is a P electrode pad, the P electrode pad having a circular or polygonal shape, and a width of a connecting part between the first end of the metal finger electrode and the second end of the metal finger electrode is 2.5˜20 um.

3 . The chip of the LED according to claim 1 , wherein the first transparent conductive layer comprises a hollow conductive ring, and the conductive ring covers part of the second current blocking layers, so that a hollow part of the conductive ring can be orthographically projected onto a region enclosed by the plurality of second current blocking layers.

4 . The chip of the LED according to claim 3 , wherein the conductive ring includes a plurality of inward recesses, so that the first transparent conductive layer has a plurality of protrusions surrounding the conductive ring, and the protrusions are at least partially grown on the second current blocking layers.

5 . The chip of the LED according to claim 4 , wherein the current blocking layer is made of SiO 2 or Si 3 N 4 , and the width of the first current blocking layer is 16.5˜50 um.

6 . The chip of the LED according to claim 1 , wherein a surface of the epitaxial layer includes a first epitaxial layer surface and a second epitaxial layer surface, an N-type electrode exposed part is grown on the first epitaxial layer surface at two adjacent edges of the epitaxial layer, the second transparent conductive layer is grown on the second epitaxial layer surface, and the current blocking layer further includes a third current blocking layer, wherein

the N-type electrode exposed part includes a first N-type electrode exposed part and a second N-type electrode exposed part, the first N-type electrode exposed part is arranged in the length direction of the epitaxial layer, away from an end portion of the epitaxial layer at the first end of the metal finger electrode, and the third current blocking layer is provided at a center of the first N-type electrode exposed part, and

the second N-type electrode exposed part is disposed along a width direction of the epitaxial layer.

7 . The chip of the LED according to claim 1 , further comprising an insulating protection layer, wherein the insulating protection layer is grown on uncovered regions of the epitaxial layer, the current blocking layer, the transparent conductive layer and the metal finger electrode.

8 . The chip of the LED according to claim 1 , wherein the metal finger electrode includes an adhesion layer, a structural layer and a conductive layer arranged in sequence, wherein

the adhesion layer is made of Cr, Ni or Ti;

the structural layer is made of Al, Cr, Ti, Pt or Ni; and

the conductive layer is made of Cu, Au, Sn or AuSn.

9 . A manufacturing method of a chip of a LED, wherein the manufacturing method is applied to the chip of the LED according to claim 1 , and the manufacturing method comprises:

growing the epitaxial layer on the substrate;

growing the current blocking layer on the epitaxial layer;

growing the transparent conductive layer on the current blocking layer; and

growing the metal finger electrode at an orthographical projection position of the current blocking layer on the transparent conductive layer; wherein,

the current blocking layer includes the first current blocking layer and the second current blocking layers, wherein the first current blocking layer is grown along the length direction of the epitaxial layer, and a number of the second current blocking layers is multiple, the plurality of second current blocking layers being arranged at one end of the first current blocking layer at intervals and being arranged and grown in a preset shape;

the first current blocking layer gradually widens along a direction away from the second current blocking layers;

the transparent conductive layer includes the first transparent conductive layer and the second transparent conductive layer, the first transparent conductive layer is grown on the current blocking layer and is at least partially overlapped with the second current blocking layers, and the second transparent conductive layer is grown on the epitaxial layer; and

the metal finger electrode is grown on the region of the transparent conductive layer on which the current blocking layer is orthographically projected, the metal finger electrode has the first end of the metal finger electrode and the second end of the metal finger electrode opposite to each other, the width of the metal finger electrode gradually narrows from the first end of the metal finger electrode to the second end of the metal finger electrode, the width of the metal finger electrode is smaller than the width of the first current blocking layer, and the second current blocking layers are distributed around the first end of the metal finger electrode, and wherein the end point of the second end of the metal finger electrode is provided with the antistatic part which widens the width of the end point of the second end of the metal finger electrode.