Semiconductor process equipment

1 . A substrate processing system, comprising:

at least one processing line comprising:

a first station, a second station, a third station, and a fourth station that each include a first magnetic levitation assembly configured to change an axial direction of travel of a substrate carrier between a first axial direction of travel and a second axial direction of travel,

wherein the first magnetic levitation assembly includes a magnet track segment configured to convey the substrate carrier in the first axial direction of travel and movable to convey the substrate carrier in the second axial direction of travel,

wherein the magnetic track segment includes:

a pair of first rails, wherein each of the pair of first rails is attached to a first actuator that is configured to move the corresponding first rail between a first upper position and a second lower position; and

a pair of second rails, wherein each of the pair of second rails is attached to a second actuator that is configured to move the corresponding second rail between a second upper position and a second lower position; and

at least one substrate process station positioned between the second station and the third station, wherein the at least one substrate process station comprises a second magnetic levitation assembly configured to move the substrate carrier along the first axial direction of travel, and wherein the second station, third station, and at least one substrate process station are arranged so that a substrate is configured to move from the second station, directly into the at least one substrate process station, and then directly into the third station along the first axial direction of travel.

2 . The substrate processing system of claim 1 , wherein the at least one processing line comprises two processing lines.

3 . The substrate processing system of claim 2 , wherein both processing lines share the first station and the fourth station.

4 . The substrate processing system of claim 1 , wherein the first station and the fourth station are load lock stations and the second station and the third station are process stations.

5 . The substrate processing system of claim 1 , wherein the first station is a load lock station and wherein the second station, the third station, and the fourth station are process stations.

6 . The substrate processing system of claim 1 , wherein:

the first station is a first routing station;

the second station is a load lock;

the third station is a second routing station; and

the fourth station is a third routing station.

7 . The substrate processing system of claim 1 , wherein:

the first station is a load lock;

the second station is a buffer station;

the third station is a first routing station; and

the fourth station is a second routing station including a plurality of shutter disks disposed therein.

8 . The substrate processing system of claim 1 ,

wherein each first rail includes a plurality of first electromagnets configured to convey the substrate carrier in the first axial direction of travel and a plurality of first permanent magnets configured to levitate the substrate carrier; and

wherein each second rail includes a plurality of second electromagnets configured to convey the substrate carrier in the second axial direction of travel and a plurality of second permanent magnets configured to levitate the substrate carrier.

9 . The substrate processing system of claim 1 , wherein the at least one processing line includes a conveyance station disposed between the first station and the fourth station, and wherein the substrate carrier is conveyed from the fourth station to the first station though the conveyance station by use of magnetic rails disposed within the conveyance station.

10 . The substrate processing system of claim 1 , wherein the first station, the second station, the third station, and the fourth station are routing stations.

11 . A substrate processing system, comprising:

a first processing line including a first process station arrangement including a plurality of first process stations including magnetic rails configured to move a first carrier in a first axial direction through and between each of the plurality of first process stations;

a second processing line including a second process station arrangement including a plurality of second process stations including second magnetic rails configured to move a second carrier in the first axial direction through and between each of the plurality of second process stations; and

a central arrangement of stations shared by the first processing line and the second processing line and disposed between the first process station arrangement and the second process station arrangement, wherein the central arrangement of stations includes:

a plurality of stations, each of the plurality of stations including a magnetic levitation assembly configured to move the first carrier and the second carrier in the first axial direction and configured to move the first carrier and the second carrier in a second axial direction,

wherein:

the first processing line includes a first lift station at each end configured to selectively move the first carrier between a first conveyance plane and a second conveyance plane, wherein a first conveyance station is located at the second conveyance plane and configured to convey the first carrier in the second axial direction; and

the second processing line includes a second lift station at each end configured to selectively move the second carrier between the first conveyance plane and the second conveyance plane, wherein a second conveyance station is located at the second conveyance plane and configured to convey the second carrier in the second axial direction.

12 . The substrate processing system of claim 11 , wherein the magnetic levitation assembly in each of the plurality of stations of the central arrangement of stations includes a pair of rails that are rotatable by an actuator to rotate the pair of rails between a first position and a second position, wherein:

the first carrier and the second carrier are moveable in the first axial direction when the pair of rails are in the first position; and

the first carrier and the second carrier are moveable in the second axial direction when the pair of rails are in the second position.

13 . The substrate processing system of claim 11 , wherein the magnetic levitation assembly includes a pair of rails including a plurality of electromagnets configured to convey the first carrier and the second carrier and a plurality of permanent magnets that are configured to levitate the first carrier and the second carrier.

14 . A substrate processing system, comprising:

a first processing line including a first process station arrangement including a plurality of first process stations including magnetic rails configured to move a first carrier in a first axial direction through and between each of the plurality of first process stations;

a second processing line including a second process station arrangement including a plurality of second process stations including second magnetic rails configured to move a second carrier in the first axial direction through and between each of the plurality of second process stations; and

a central arrangement of stations shared by the first processing line and the second processing line and disposed between the first process station arrangement and the second process station arrangement, wherein the central arrangement of stations includes:

a plurality of stations, each of the plurality of stations including a magnetic levitation assembly configured to move the first carrier and the second carrier in the first axial direction and configured to move the first carrier and the second carrier in a second axial direction;

a first lift station at a first end of the central arrangement of stations, wherein the first lift station is configured to selectively lift the first carrier and the second carrier from a first conveyance plane to a conveyance station located at a second conveyance plane above the central arrangement of stations; and

a second lift station at a second end of the central arrangement of stations, wherein the second lift station is configured to selectively lower the first carrier and the second carrier from the second conveyance plane to the first conveyance plane,

wherein the conveyance station is configured to convey the first carrier and the second carrier in the second axial direction.

15 . The substrate processing system of claim 14 , wherein the magnetic levitation assembly includes a pair of rails including a plurality of electromagnets configured to convey the first carrier and the second carrier and a plurality of permanent magnets that are configured to levitate the first carrier and the second carrier.

16 . A substrate processing system, comprising:

a plurality of stations in a linear arrangement, wherein a substrate carrier is conveyable through and between the plurality of stations in a first linear direction of travel along a first conveyance plane along a plurality of magnetic rails, and wherein the substrate carrier is moveable between positions along the first linear direction of travel within each of the plurality of stations by the plurality of magnetic rails, wherein at least one of the plurality of stations comprises:

a housing including a transport region and a process region, wherein at least two of the plurality of magnetic rails are disposed in the transport region and are configured to levitate and propel the substrate carrier; and

a pedestal assembly comprising a pedestal disposed within the housing, wherein the pedestal is moveable between a substrate loading position and a process position,

wherein the plurality of stations includes a lift station at each end configured to selectively move the substrate carrier between the first conveyance plane and a second conveyance plane, wherein the substrate carrier is conveyable along the second conveyance plane in a second linear direction of travel between the lift stations within at least one station disposed above the plurality of stations.

17 . The substrate processing system of claim 16 , wherein the substrate carrier is moveable between a carrier transfer position and a carrier park position in each of the plurality of stations along the first linear direction.

18 . The substrate processing system of claim 16 , wherein each the plurality of magnetic rails includes a plurality of electromagnets configured to convey the substrate carrier in the first linear direction of travel and a plurality of permanent magnets configured to levitate the substrate carrier.