IP Library Granted Patent US 12666923
Granted Patent B2
US 12666923 · App. 18/354,051 · Granted Jun 23, 2026

Chip treating method

Inventor: Masaru Nakamura (Tokyo, JP)
Assignee: DISCO CORPORATION
H10P72/7402B24B7/228B24B9/065B24B27/06B24B37/00B24B37/02B24B37/04B24B41/06H10P52/00H10P54/00H10P72/7416
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Quick Facts
Patent No.
US 12666923
App. No.
18/354,051
Granted
Jun 23, 2026
Kind
B2
Abstract

A chip treating method includes a first tape affixing step of affixing a first tape to a circular wafer, a ring frame unit forming step of removing a central part of the wafer to form a ring frame unit having an opening, and a chip disposing step of disposing chips on the first tape exposed in the opening.

Claims (16)

1 . A chip treating method of disposing a chip in an opening of a ring frame having the opening in a center of the ring frame, through a tape, the chip treating method comprising:

a first tape affixing step of affixing a first tape to a wafer;

after the first tape affixing step, a ring frame unit forming step of removing a central part of the wafer to form a ring frame unit having the opening and exposing the first tape in the opening; and

a chip disposing step of disposing the chip on the first tape exposed in the opening of the ring frame unit.

2 . The chip treating method according to claim 1 , further comprising:

after the chip disposing step, a second tape affixing step of affixing a second tape on a side where the chip is disposed, in such a manner as to cover the ring frame of the ring frame unit, thereby clamping the ring frame between the first tape and the second tape in a sandwiching manner; and

a chip transferring step of peeling off the first tape to transfer the chip onto the second tape.

3 . The chip treating method according to claim 2 , further comprising:

a processing step of processing the chip, after the chip transferring step.

4 . The chip treating method according to claim 3 , wherein the processing step is a step of carrying out a grinding process of grinding the chip.

5 . The chip treating method according to claim 1 , wherein a blank material of the wafer and a blank material of the chip are the same.

6 . The chip treating method according to claim 1 , wherein, in the ring frame unit forming step, a cutting blade or a laser beam is positioned along an outline of the opening to be formed, and the outline is cut to form the opening.

7 . The chip treating method according to claim 1 , further comprising:

a processing step of processing the chip, after the chip disposing step.

8 . The chip treating method according to claim 7 , wherein the processing step is a step of carrying out a grinding process of grinding the chip.

9 . The chip treating method according to claim 1 , wherein, in the ring frame unit forming step, a part of the first tape corresponding to the central part of the wafer is irradiated with ultraviolet rays.