Semiconductor device and manufacturing method thereof
A semiconductor device and a forming method thereof are provided. The semiconductor device includes an integrated circuit (IC) die and an encapsulant. The IC die includes a semiconductor substrate and an interconnect structure connected to the semiconductor substrate, the semiconductor substrate includes a first ledge, and the interconnect structure includes a second ledge. The encapsulant extends along the first ledge of the first semiconductor substrate and the second ledge of the first interconnect structure.
1 . A device, comprising:
a first integrated circuit (IC) die comprising:
a first semiconductor substrate comprising a first ledge; and
a first interconnect structure connected to the first semiconductor substrate, the first interconnect structure comprising a second ledge, wherein a dielectric protrusion is disposed on a surface of the second ledge of the first interconnect structure; and
an encapsulant extending along the first ledge of the first semiconductor substrate and the second ledge of the first interconnect structure.
2 . The device of claim 1 , wherein the first ledge of the first semiconductor substrate comprises a first sidewall and a second sidewall laterally offset from the first sidewall, the second ledge of the first interconnect structure comprises a third sidewall and a fourth sidewall laterally offset from the third sidewall, the second sidewall of the first semiconductor substrate is connected to and substantially aligned with the fourth sidewall of the first interconnect structure.
3 . The device of claim 2 , wherein the first ledge of the first semiconductor substrate further comprises a curved surface connected to the first sidewall and the second sidewall.
4 . The device of claim 1 , wherein the first ledge of the first semiconductor substrate comprises a first sidewall and a second sidewall laterally offset from the first sidewall, the second ledge of the first interconnect structure comprises a third sidewall and a fourth sidewall laterally offset from the third sidewall, the first sidewall of the first semiconductor substrate is connected to and substantially aligned with the fourth sidewall of the first interconnect structure.
5 . The device of claim 4 , wherein a surface roughness of the third sidewall of the first interconnect structure is less than that of the fourth sidewall of the first interconnect structure.
6 . The device of claim 1 , wherein the first ledge of the first semiconductor substrate comprises a sidewall and a curved surface connected to the sidewall, and the curved surface is smoother than the sidewall.
7 . The device of claim 1 , further comprising:
a second IC die connected to an active surface of the first IC die, wherein the encapsulant is disposed on the second IC die to laterally cover the first IC die, and an interface of the active surface of the first IC die and the second IC die is substantially flat.
8 . The device of claim 7 , wherein a first conductive feature of the first interconnect structure is bonded to a second conductive feature of the second IC die, and a first bonding dielectric layer of the first interconnect structure laterally covers the first conductive feature and is bonded to a second bonding dielectric layer of the second IC die.
9 . The device of claim 1 , further comprising:
a second IC die comprising an uneven sidewall and laterally spaced apart from the first IC die through the encapsulant.
10 . The device of claim 9 , wherein the second IC die comprises:
a second semiconductor substrate comprising a first sidewall and a second sidewall laterally offset from the first sidewall; and
a second interconnect structure connected to the second semiconductor substrate, the second interconnect structure comprising a third sidewall and a fourth sidewall laterally offset from the third sidewall.
11 . The device of claim 1 , further comprising:
a through insulating via penetrating through the encapsulant and laterally spaced apart from the first IC die through a portion of the encapsulant, wherein the portion of the encapsulant comprises an uneven side connected to the first IC die and a substantially straight side connected to the through insulating via.
12 . A device, comprising:
an IC die comprising a sidewall, the sidewall of the IC die comprising a first sidewall and a second sidewall laterally protruded from the first sidewall, wherein a surface roughness of the first sidewall is less than a surface roughness of the second sidewall; and
an encapsulant connected to the sidewall of the IC die, the encapsulant comprising a first portion, a second portion underlying the first portion and connected to the second sidewall of the sidewall of the IC die, and a third portion underlying the first portion and connected to the first sidewall of the sidewall of the IC die, wherein a width of the second portion is different from widths of the first portion and the third portion.
13 . The device of claim 12 , wherein the width of the second portion is less than the width of the third portion.
14 . The device of claim 13 , wherein the width of the second portion is greater than the width of the first portion.
15 . The device of claim 12 , wherein the IC die further comprises a semiconductor substrate and an interconnect structure, the first sidewall comprises a sidewall of the interconnect structure, and the second sidewall comprises a sidewall of the semiconductor substrate.
16 . A method, comprising: forming a first recess having a first width on a semiconductor wafer; forming a second recess extending from the first recess on the semiconductor wafer, wherein a second width of the second recess is less than the first width of the first recess; forming a third recess connected to the second recess to cut through the semiconductor wafer so as to form an IC die with an uneven sidewall, wherein a third width of the third recess is different from the second width of the second recess; and forming an encapsulant to cover the uneven sidewall of the IC die,
wherein: forming the first recess comprises removing an upper portion of an interconnect structure of the semiconductor wafer within a scribing lane of the semiconductor wafer; and forming the second recess comprises removing a lower portion of the interconnect structure and an upper portion of a semiconductor substrate of the semiconductor wafer underlying the lower portion of the interconnect structure.
17 . The method of claim 16 , wherein forming the third recess comprises:
etching a lower portion of the semiconductor substrate from a front side of the semiconductor wafer on which the interconnect structure is formed.
18 . The method of claim 16 , wherein forming the third recess comprises:
dicing a lower portion of the semiconductor substrate from a front side of the semiconductor wafer on which the interconnect structure is formed, wherein the third width of the third recess is less than the second width of the second recess.
19 . The method of claim 16 , wherein forming the third recess comprises:
dicing a semiconductor substrate of the semiconductor wafer from a rear surface of the semiconductor wafer, wherein the third width of the third recess is greater than the second width of the second recess.
20 . The method of claim 16 , wherein forming the second recess further comprises:
forming a dielectric protrusion on a surface of the lower portion of the interconnect structure.