IP Library Granted Patent US 12668873
Granted Patent B2
US 12668873 · App. 18/862,142 · Granted Jun 30, 2026

Gas supply line arrangements

Inventors: Eashan Raju Dhawade (Nagpur, IN); Michael Rumer (Santa Clara, CA); Ravi Vellanki (San Jose, CA)
Assignee: Lam Research Corporation
C23C16/4405C23C16/4408H01J37/32449H01J37/32862
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Quick Facts
Patent No.
US 12668873
App. No.
18/862,142
Granted
Jun 30, 2026
Kind
B2
Abstract

In some examples, a gas supply line arrangement is provided for inhibiting particle contamination in a substrate process chamber. An example gas supply line arrangement comprises a cleaning gas source for a clean cycle of the substrate process chamber, a purge gas source for a purge cycle of the substrate process chamber, and a gas supply line to carry cleaning gas and purge gas towards the substrate process chamber. A three-port valve in the gas supply line arrangement comprises a valve inlet connected to the gas supply line, a first valve outlet in fluid communication with the substrate process chamber, the first valve outlet operable to admit or prevent a passage of cleaning gas to the substrate process chamber, and a second valve outlet connected to a divert line and operable to admit or prevent a passage of particle-containing purge gas to the divert line.

Claims (35)

1 . A gas supply line arrangement for inhibiting particle contamination in a substrate process chamber, the gas supply line arrangement comprising:

a cleaning gas source for a clean cycle of the substrate process chamber;

a purge gas source for a purge cycle of the substrate process chamber;

a gas supply line to carry cleaning gas and purge gas towards the substrate process chamber; and

a three-port valve comprising:

a valve inlet connected to the gas supply line;

a first valve outlet in fluid communication with the substrate process chamber, the first valve outlet operable to admit or prevent a passage of cleaning gas to the substrate process chamber; and

a second valve outlet connected to a divert line and operable to admit or prevent a passage of particle-containing purge gas to the divert line.

2 . The gas supply line arrangement of claim 1 , wherein the second valve outlet is configured only to be opened when the first valve outlet is closed.

3 . The gas supply line arrangement of claim 1 , wherein the first valve outlet defines an internal cleaning gas termination point when closed.

4 . The gas supply line arrangement of claim 3 , wherein the second valve outlet defines an internal purge gas diversion point when opened.

5 . The gas supply line arrangement of claim 4 , wherein the internal purge gas diversion point is upstream of the internal cleaning gas termination point within a body of the three-port valve.

6 . The gas supply line arrangement of claim 5 , wherein a volume of the body of the three-port valve between the purge gas diversion point and the cleaning gas termination point is purgeable of gas and particulate material during the purge cycle.

7 . The gas supply line arrangement of claim 1 , wherein the three-port valve is directly connected to the substrate process chamber or an inlet manifold thereof.

8 . A method of inhibiting particle contamination during a clean or purge cycle of a substrate process chamber, the method comprising:

providing a cleaning gas source for a clean cycle of the substrate process chamber;

providing a purge gas source for a purge cycle of the substrate process chamber;

connecting a gas supply line to carry cleaning gas and purge gas towards the substrate process chamber; and

connecting a three-port valve into a gas supply line arrangement for the substrate process chamber, the three-port valve comprising a valve inlet connectable to the gas supply line; a first valve outlet in fluid communication with the substrate process chamber, the first valve outlet operable to admit or prevent a passage of the cleaning gas to the substrate process chamber, the three-port valve further comprising a second valve outlet connectable to a divert line and operable to admit or prevent a passage of particle-containing purge gas to the divert line;

connecting the three-port valve to the divert line; and

discharging the particle-containing purge gas into the divert line during the purge cycle.

9 . The method of claim 8 , further comprising opening the second valve outlet only when the first valve outlet is closed.

10 . The method of claim 8 , further comprising configuring the first valve outlet to define an internal cleaning gas termination point when closed.

11 . The method of claim 10 , further comprising configuring the second valve outlet to define an internal purge gas diversion point when opened.

12 . The method of claim 11 , further comprising configuring or operating the three-port valve such that the internal purge gas diversion point is upstream of the internal cleaning gas termination point within a body of the three-port valve.

13 . The method of claim 12 , further comprising purging a volume of the body of the three-port valve between the internal purge gas diversion point and the internal cleaning gas termination point of gas and particulate material during the purge cycle.

14 . The method of claim 8 , further comprising connecting the three-port valve directly connected to the substrate process chamber or an inlet manifold thereof.

15 . A tangible machine-readable medium including instructions which, when read by a machine, cause the machine to perform operations in a method of inhibiting particle contamination during a clean or purge cycle of a substrate process chamber, the method comprising:

opening or closing a cleaning gas source for a clean cycle of the process chamber;

opening or closing a purge gas source for a purge cycle of the process chamber;

controlling a connected gas supply line carrying cleaning gas and purge gas towards the substrate process chamber;

controlling actuators of a three-port valve connected to the gas supply line, the three-port valve comprising:

a valve inlet in fluid communication with the gas supply line;

a first valve outlet in fluid communication with the substrate process chamber, the first valve outlet operable to admit or prevent a passage of the cleaning gas to the substrate process chamber, the three-port valve further comprising a second valve outlet connectable to a divert line and operable to admit or prevent a passage of particle-containing purge gas to the divert line; and

sending a signal to one of the actuators of the three-port valve to open the second valve outlet to discharge the particle-containing purge gas into the divert line during the purge cycle.