Liquid precursor recovery module
Vapor deposition precursor recovery systems and methods are provided. Methods and systems include a precursor container housing a precursor material and a carrier gas container housing a carrier gas. Systems and methods include a condenser assembly having a condenser in fluid connection with an exhaust line, a recycled precursor container, and a cooling circuit. Systems and methods include a vaporizer having one or more inlets in fluid connection with the precursor container and the carrier gas container, and an outlet in fluid connection with a gas distributor and the condenser assembly. Systems and methods include where the condenser is maintained at an internal temperature of greater than or about 10° C. below a boiling point of the precursor material and greater than or about 10° C. above a boiling point of the carrier gas.
1 . A vapor deposition precursor recovery system, comprising:
a precursor container comprising a precursor material;
a carrier gas container comprising a carrier gas;
a condenser assembly comprising a condenser in fluid connection with an exhaust line, a recycled precursor container, and a cooling circuit;
a vaporizer having one or more inlets in fluid connection with the precursor container and the carrier gas container, and an outlet in fluid connection with a gas distributor and the condenser assembly; and
a system line disposed between the outlet of the vaporizer and the gas distributor, and between the outlet of the vaporizer and the condenser assembly, the system line comprising a split, a first end of the split connected to the condenser and a second end of the split connected to the gas distributor;
wherein the condenser is maintained at an internal temperature of greater than or about 10° C. below a boiling point of the precursor material and greater than or about 10° C. above a boiling point of the carrier gas.
2 . The recovery system of claim 1 , wherein an exhaust line inlet is disposed vertically above an outlet fluidly connected to the recycled precursor container.
3 . The recovery system of claim 1 , wherein the carrier gas comprises an inert gas having a boiling point of less than or about 0° C.
4 . The recovery system of claim 1 , wherein the condenser is maintained at an internal temperature of less than or about 50% of a boiling point of the precursor material.
5 . The recovery system of claim 1 , wherein the condenser comprises an internal pressure and the exhaust line comprises an internal pressure, wherein a ratio of the condenser internal pressure and the exhaust line internal pressure is greater than or about 1.1.
6 . A vapor deposition precursor recovery system, comprising:
a precursor container comprising a precursor material;
a carrier gas container comprising a carrier gas;
a vaporizer having one or more inlets in fluid connection with the precursor container and the carrier gas container, and an outlet in fluid connection with a gas distributor and a condenser assembly;
the condenser assembly comprising a condenser disposed between an exhaust line and the gas distributor, wherein the condenser is in fluid connection with a recycled precursor container, and a cooling circuit; and
a system line disposed between the outlet of the vaporizer and the gas distributor, and between the outlet of the vaporizer and the condenser assembly, the system line comprising a split, a first end of the split connected to the condenser and a second end of the split connected to the gas distributor;
wherein the condenser comprises an internal pressure and the exhaust line comprises an internal pressure, wherein a ratio of the condenser internal pressure and the exhaust line internal pressure is greater than or about 1.1.
7 . The recovery system of claim 6 , wherein a fluid flow path is defined from the vaporizer to the recycled precursor container, and wherein the fluid flow path does not enter the exhaust line.
8 . The recovery system of claim 6 , wherein the condenser is maintained at an internal temperature of greater than or about 10° C. below a boiling point of the precursor material and greater than or about 10° C. above a boiling point of the carrier gas.
9 . A method for recycling a vapor deposition precursor, comprising:
vaporizing a precursor material a vaporizer;
flowing the vaporized precursor material and a carrier gas to a process chamber by a system line;
diverting the vaporized precursor material and the carrier gas to a condenser after a preselected period of time by the system line, wherein the system line comprises a split, a first end of the split connected to the condenser and a second end of the split connected to the process chamber;
condensing the precursor material;
exhausting the carrier gas; and
collecting the condensed precursor material in a recycled precursor container.
10 . The method of claim 9 , wherein the preselected period of time is less than or about 5 seconds.
11 . The method of claim 9 , wherein the flowing and the diverting are repeated for greater than or about two cycles.
12 . The method of claim 9 , further comprising re-filling the precursor material with the condensed precursor material after collection.
13 . The method of claim 9 , further comprising flowing a coolant and/or a process cooling water into the condenser.
14 . The method of claim 13 , wherein the coolant and/or process cooling water is recirculated between a cooling chamber and the condenser.
15 . The method of claim 13 , where the coolant and/or process cooling water comprises a temperature of greater than or about 10° C. below a boiling point of the precursor material and greater than or about 10° C. above a boiling point of the carrier gas.
16 . The method of claim 9 , wherein the condenser is directly connected to the vaporizer.
17 . The method of claim 9 , wherein exhausting the carrier gas comprises connecting an exhaust line to a vacuum.
18 . The method of claim 9 , further comprising reducing a pressure in the condenser to a pressure less than atmospheric pressure.
19 . The method of claim 18 , wherein the pressure is greater than a pressure in the exhaust line.