IP Library Granted Patent US 12669451
Granted Patent B2
US 12669451 · App. 18/888,206 · Granted Jun 30, 2026

Correction apparatus, correction method, and correction program

Inventor: Takumi Ota (Tokyo, JP)
Assignee: RIGAKU CORPORATION
G01N23/207G01N2223/62
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Quick Facts
Patent No.
US 12669451
App. No.
18/888,206
Granted
Jun 30, 2026
Kind
B2
Abstract

A correction apparatus reduces time and labor, reduces an artificiality, and improves reproducibility of correction by correcting a shift of a profile with an automatically estimated correction amount. A correction apparatus for correcting a profile of X-ray powder diffraction comprises processing circuitry configured to set a reference profile, set an estimation method for estimating a correction amount related to a sample height, estimate the correction amount based on the estimation method, and correct a subject profile based on the correction amount, wherein the correction amount is a value that maximizes a degree of coincidence between the corrected subject profile and the reference profile.

Claims (60)

1 . A correction apparatus for correcting a profile of X-ray powder diffraction, comprising:

processing circuitry configured to

set a reference profile,

set an estimation method for estimating a correction amount related to a sample height,

estimate the correction amount based on the estimation method, and

correct a subject profile based on the correction amount, wherein

the correction amount is a value that maximizes a degree of coincidence between the corrected subject profile and the reference profile.

2 . The correction apparatus according to claim 1 , wherein the processing circuitry is further configured to

correct the subject profile with a temporary correction amount, and

calculate the correction amount by repeating evaluation of a degree of coincidence between the subject profile corrected based on the temporary correction amount and the reference profile.

3 . The correction apparatus according to claim 1 , wherein the processing circuitry is further configured to

set the reference profile based on a profile designated by a user.

4 . The correction apparatus according to claim 1 , wherein the processing circuitry is further configured to

set the reference profile calculated based on a plurality of profiles.

5 . The correction apparatus according to claim 1 , wherein the processing circuitry is further configured to

set a least-square method or a peak-top method as the estimation method.

6 . The correction apparatus according to claim 1 , wherein the processing circuitry is further configured to

set a 2θ angle range in which the degree of coincidence is maximized based on a designation of a user.

7 . The correction apparatus according to claim 1 , wherein the processing circuitry is further configured to

display a profile obtained by correcting the subject profile based on the temporary correction amount or the correction amount.

8 . The correction apparatus according to claim 2 , where the processing circuitry is further configured to

display a profile obtained by correcting the subject profile based on the temporary correction amount.

9 . The correction apparatus according to claim 1 , wherein

the following formula (1) is used based on the goniometer radius R and the correction amount D relating to the sample height when the angle 2θ of the profile is converted into the corrected angle 2θcorr.

2

θ

corr

=

2

θ

-

(

2

D

/

R

)

cos

θ

(

1

)

10 . The correction apparatus according to claim 1 , wherein a target of qualitative analysis is generated by correcting the subject profile based on the correction amount.

11 . The correction apparatus according to claim 1 , wherein a target of component decomposition is generated by correcting the subject profile based on the correction amount.

12 . A correction method for correcting a profile of X-ray powder diffraction, comprising the steps of:

setting a reference profile,

setting an estimation method for estimating a correction amount related to a sample height,

estimating the correction amount based on the estimation method, and correcting a subject profile based on the correction amount, wherein

the correction amount is a value that maximizes a degree of coincidence between the corrected subject profile and the reference profile.

13 . A non-transitory computer-readable recording medium having recorded thereon computer-readable instructions for correcting a profile of X-ray powder diffraction which, when executed by a computer, cause the computer to perform a method, the method comprising:

setting a reference profile,

setting an estimation method for estimating a correction amount related to a sample height,

estimating the correction amount based on the estimation method, and

correcting a subject profile based on the correction amount, wherein

the correction amount is a value that maximizes a degree of coincidence between the corrected subject profile and the reference profile.