Treatment chamber with modular microwave power delivery
Embodiments disclosed herein include a source array. In an example, a source array includes a dielectric plate having a surface. A plurality of resonators is on the surface of the dielectric plate. The source array also includes a plurality of power amplifiers. Each one of the plurality of power amplifiers is coupled to a corresponding one of the plurality of resonators.
1 . A source array, comprising:
a dielectric plate having a surface;
a plurality of resonators on the surface of the dielectric plate; and
a plurality of power amplifiers, each one of the plurality of power amplifiers coupled to a corresponding one of the plurality of resonators, wherein each one of the power amplifiers overlaps the corresponding one of the plurality of resonators in a plan view perspective, and wherein a first portion of the plurality of power amplifiers is oriented along a first direction, and a second portion of the plurality of power amplifiers is oriented along a second direction orthogonal to the first direction.
2 . The source array of claim 1 , wherein each one of the plurality of power amplifiers is coupled to the corresponding one of the plurality of resonators by a bracket or a clamp.
3 . The source array of claim 1 , wherein the source array does not include a coaxial cable coupled to the plurality of resonators.
4 . The source array of claim 1 , wherein each one of the plurality of power amplifiers provides a power level in a range of 100 W to 550 W for the source array.
5 . The source array of claim 1 , wherein the plurality of resonators is arranged in a concentric circle pattern on the surface of the dielectric plate.
6 . The source array of claim 1 , wherein the plurality of resonators is arranged in a pattern having three inner resonators and eight outer resonators on the surface of the dielectric plate.
7 . The source array of claim 1 , wherein the plurality of resonators is arranged in a pattern having four inner resonators and seven outer resonators on the surface of the dielectric plate.
8 . The source array of claim 1 , wherein the plurality of resonators is arranged in a pattern having four inner resonators and six outer resonators on the surface of the dielectric plate.
9 . The source array of claim 1 , wherein the plurality of resonators is arranged in a pattern having three inner resonators and six outer resonators on the surface of the dielectric plate.
10 . A processing tool, comprising:
a treatment chamber;
a substrate or wafer processing region within the treatment chamber; and
a source array above the substrate or wafer processing region, the source array comprising:
a dielectric plate having a surface;
a plurality of resonators on the surface of the dielectric plate; and
a plurality of power amplifiers, each one of the plurality of power amplifiers coupled to a corresponding one of the plurality of resonators, wherein each one of the power amplifiers overlaps the corresponding one of the plurality of resonators in a plan view perspective, and wherein a first portion of the plurality of power amplifiers is oriented along a first direction, and a second portion of the plurality of power amplifiers is oriented along a second direction orthogonal to the first direction.
11 . The processing tool of claim 10 , wherein each one of the plurality of power amplifiers of the source array is coupled to the corresponding one of the plurality of resonators by a bracket or a clamp.
12 . The processing tool of claim 10 , wherein the source array does not include a coaxial cable coupled to the plurality of resonators.
13 . The processing tool of claim 10 , wherein each one of the plurality of power amplifiers of the source array provides a power level in a range of 100 W to 550 W for the source array.
14 . The processing tool of claim 10 , wherein the plurality of resonators of the source array is arranged in a concentric circle pattern on the surface of the dielectric plate.
15 . The processing tool of claim 10 , wherein the plurality of resonators of the source array is arranged in a pattern having three inner resonators and eight outer resonators on the surface of the dielectric plate.
16 . The processing tool of claim 10 , wherein the plurality of resonators of the source array is arranged in a pattern having four inner resonators and seven outer resonators on the surface of the dielectric plate.
17 . The processing tool of claim 10 , wherein the plurality of resonators of the source array is arranged in a pattern having four inner resonators and six outer resonators on the surface of the dielectric plate.
18 . The processing tool of claim 10 , wherein the plurality of resonators of the source array is arranged in a pattern having three inner resonators and six outer resonators on the surface of the dielectric plate.
19 . A method of operating a source array, the method comprising:
providing power to a plurality of power amplifiers, each one of the plurality of power amplifiers coupled to a corresponding one of a plurality of resonators, wherein the plurality of resonators are on the surface of a dielectric plate, wherein each one of the power amplifiers overlaps the corresponding one of the plurality of resonators in a plan view perspective, and wherein a first portion of the plurality of power amplifiers is oriented along a first direction, and a second portion of the plurality of power amplifiers is oriented along a second direction orthogonal to the first direction.
20 . The method of claim 19 , wherein each one of the plurality of power amplifiers provides a power level in a range of 100 W to 550 W for the source array.