Connecting arrangement
A connecting arrangement is disclosed. The connecting arrangement includes at least a first connecting partner and a second connecting partner, which are connected integrally together using a solidified solder layer, arranged between the connecting partners, with a solder layer thickness. Each connecting partner has a solder connection surface, which are wettable by the solder material in a molten state. The solder connection surfaces are arranged one above the other and face one another so that both are each contacted at least regionally by the solidified solder layer. Each solder connection surface is configured such that a perpendicular projection of both solder connection surfaces onto one another has at least one definable projection area with mutually overlapping solder connection surface parts. The definable projection area has a peripherally closed edge with at least one contained first cohesive projection sub-area, which is directly adjoined by at least one or more further projection sub-areas.
1 . A connecting arrangement, comprising:
a first connecting partner and a second connecting partner, which are connected integrally together using a solidified solder layer, arranged between the connecting partners, with a solder layer thickness, each of the connecting partners has at least one solder connection surface, the solder connection surfaces being wettable by a solder material in a molten state, and being arranged one above the other and are each contacted at least regionally by the solidified solder layer;
wherein the solder connection surfaces are each designed such that a perpendicular projection of both solder connection surfaces onto one another has at least one definable projection area with in each case mutually overlapping solder connection surface parts;
wherein the at least one definable projection area has at least one peripherally closed edge with at least one contained first cohesive projection sub-area, which is directly adjoined by at least one or more further projection sub-areas; and
wherein, to set a defined solder layer thickness, a solder connection surface part respectively corresponding to the one or more further projection sub-areas is configured as an outlet collecting region for excess solder material between the connecting partners in that, within the at least one definable projection area, a structure size that is decisive for the wetting of the solder connection surface parts by the solder material in the molten state is configured to be larger in the at least one first cohesive projection sub-area than in the one or more further projection sub-areas.
2 . The connecting arrangement according to claim 1 , wherein the solder connection surfaces are arranged parallel to one another.
3 . The connecting arrangement according to claim 1 , wherein the at least one first cohesive projection sub-area has a shape of a square, or a rectangle, or a circle, or a circular segment, or an oval, or a trapezoid, or a triangle, or a polygon, or a regular polygon.
4 . The connecting arrangement according to claim 1 , wherein the one or more further projection sub-areas has a shape of a square, or a rectangle, or a trapezoid, or a triangle.
5 . The connecting arrangement according to claim 1 , wherein the at least one definable projection area includes several further projection sub-areas which are arranged spaced apart from one another at least as one cohesive group along at least one edge portion of the at least one first cohesive projection sub-area, in a comb-like manner at equal distances from one another within the at least one cohesive group or all groups.
6 . The connecting arrangement according to claim 5 , wherein the at least one first cohesive projection sub-area includes two mirror-image straight, edge portions, wherein the several further projection sub-areas are arranged exclusively along one edge portion or along the two edge portions opposite or offset from one another in each case.
7 . The connecting arrangement according to claim 5 , wherein the several further projection sub-areas are arranged peripherally to the at least one first cohesive projection sub-area.
8 . The connecting arrangement according to claim 5 , wherein all of the further projection sub-areas have the same design, wherein a width dimension of each of the further projection sub-areas is one or multiple times a dimension of a gap formed between two of the further projection sub-areas.
9 . The connecting arrangement according to claim 1 , wherein the one or more further projection sub-areas correspond to 10-50% of a surface size of the at least one first cohesive projection sub-area.
10 . The connecting arrangement according to claim 1 , wherein the at least one peripherally closed edge of the at least one definable projection area corresponds to at least one peripherally closed edge of one or both of the solder connection surfaces.
11 . The connecting arrangement according to claim 1 , wherein one of the solder connection surfaces is completely overlapped by the other of the solder connection surfaces.
12 . The connecting arrangement according to claim 1 , wherein one edge profile of at least one or more further projection sub-areas corresponds to a partial edge of one of the solder connection surfaces, and another edge profile of at least one or more other further projection sub-areas corresponds to a partial edge of the other solder connection surface.
13 . The connecting arrangement according to claim 1 , wherein the structure size is determined by a first maximum diameter of an incircle within the at least one first cohesive projection sub-area and by a second maximum diameter of an incircle within one of the further projection sub-areas, wherein the first maximum diameter is a multiple of the second maximum diameter.
14 . The connecting arrangement according to claim 1 , wherein the first connecting partner is a ceramic carrier substrate, and the second connecting partner is a flex foil.
15 . The connecting arrangement according to claim 14 , wherein the ceramic carrier substrate is an AMB, or a DBC, or an LTCC, or an HTCC, or an IMS substrate.
16 . A method for forming a connecting arrangement, the connecting arrangement including a first and a second connecting partner, the method comprising the following steps: a) forming a solder connection surface on each of the connecting partners, wherein the solder connection surfaces can be wetted by a solder material in a molten state, wherein the solder connection surfaces are each formed such that, in an arrangement of the two connecting partners according to step b), at least one definable projection area with in each case mutually overlapping solder connection surface parts is defined in a perpendicular projection of both solder connection surfaces onto one another, wherein the at least one definable projection area has at least one peripherally closed edge with at least one contained first cohesive projection sub-area, which is directly adjoined by at least one or more further projection sub-areas; b) arranging the two connecting partners one above the other with the solder connection surfaces facing one another oriented parallel to one another, and at a distance from one another, wherein the solder material is arranged between the solder connection surfaces, wherein a sufficient solder quantity is selected for formation of a solidified solder layer with a defined edge and layer thickness; c) melting the solder material and wetting the solder connection surface parts, wherein all solder connection surface parts within the at least one first cohesive projection sub-area are wetted first and, depending on excess solder material, remaining solder connection surface portions within the at least one or more further projection sub-areas are only subsequently wetted at least regionally; and d) cooling the solder material, wherein, in a region of the at least one first cohesive projection sub-area, the solder layer is formed with an edge corresponding to the at least one first cohesive projection sub-area, and with the defined layer thickness, wherein the excess solder material is buffered in a region of the at least one or more further projection sub-areas.
17 . The connecting arrangement according to claim 1 , wherein:
the two connecting partners are one above the other with the solder connection surfaces (I) facing one another oriented parallel to one another and (II) at a distance from one another; and
the solidified solder layer is formed:
(I) of a solder material arranged between the solder connection surfaces;
(II) with a defined edge; and
(III) by:
(i) a melting of the solder material and wetting of the solder connection surface parts such that all solder connection surface parts within the at least one first cohesive projection sub-area are wetted first and, depending on excess solder material, remaining solder connection surface portions within the one or more further projection sub-areas are only subsequently wetted at least regionally; and
(ii) a cooling of the solder material such that, in a region of the at least one first cohesive projection sub-area, the solder layer is formed with an edge corresponding to the at least one first cohesive projection sub-area, with excess solder material being buffered in a region of the one or more further projection sub-areas.
18 . The connecting arrangement according to claim 1 , wherein:
the first and second connecting partners are arranged parallel to one another at a defined distance corresponding to the solder layer thickness;
the solidified solder layer has a defined peripheral edge corresponding to a boundary of the at least one first cohesive projection sub-area; and
the solder layer is fully formed within the at least one first cohesive projection sub-area and only regionally extending into the one or more further projection sub-areas, with excess solder material being solidified and buffered in a region of the one or more further projection sub-areas.