Apparatus and method of treating substrate
Provided is an apparatus for treating a substrate, the apparatus including: an index module; and a treating module disposed adjacent to the index module and treating a substrate, in which the treating module includes: one or a plurality of process chambers; a transfer chamber provided with a main transfer robot for transferring a substrate to the process chamber; and a cleaning unit for cleaning a hand of the main transfer robot.
1 . An apparatus for treating a substrate, the apparatus comprising:
an index module; and
a treating module disposed adjacent to the index module and treating the substrate,
wherein the treating module includes:
one or a plurality of process chambers;
a transfer chamber provided with a main transfer robot for transferring the substrate to the process chamber; and
a cleaning unit for cleaning a hand of the main transfer robot, the cleaning unit including a housing, and a liquid receiving plate disposed below a purge nozzle,
wherein the cleaning unit further includes an exhaust member for exhausting an inside of the housing,
when viewed from the top, an exhaust pipe of the exhaust member is coupled to the housing at a position lower than the liquid receiving plate so as to overlap the liquid receiving plate,
wherein an upper surface of the liquid receiving plate is concave to stably retain liquid dripping from the hand of the main transfer robot during cleaning thereof, such that the liquid is held on the upper surface of the liquid receiving plate during cleaning of the hand, and
wherein the liquid receiving plate prevents the liquid falling from the hand from flowing into an exhaust port of the exhaust pipe during cleaning of the hand.
2 . The apparatus of claim 1 , wherein the purge nozzle is disposed in the housing and cleans the hand of the main transfer robot loaded into the housing.
3 . The apparatus of claim 2 , wherein the purge nozzle for discharging purge gas to an upper surface of the hand of the main transfer robot loaded into the housing.
4 . The apparatus of claim 2 , wherein the purge nozzle has a plurality of discharge ports for discharging purge gas in a downward direction, and
the hand of the main transfer robot includes:
a base plate; and
a guide on which the substrate is placed and which is disposed so as to protrude from the base plate in an upper direction, and
when the hand of the main transfer robot is loaded into and unloaded from the housing by forward and backward movement, a longitudinal direction of the purge nozzle is provided in a direction perpendicular to the forward and backward movement direction of the hand when viewed from the top.
5 . The apparatus of claim 4 , wherein the base plate includes:
a body; and
a pair of fingers extending from the body,
the guide includes:
a first guide installed at a front end of each of the pair of fingers; and
a second guide installed at a rear end of each of the pair of fingers; and
the plurality of discharge ports includes a plurality of first holes disposed in a first region opposite to the finger in a state in which the hand of the main transfer robot is loaded into the housing when viewed from above.
6 . The apparatus of claim 5 , wherein the plurality of discharge ports further includes a plurality of second holes disposed in a second region opposite to a space between the fingers in a state in which the hand of the main transfer robot is loaded into the housing when viewed from above, and
the first holes in the first region are formed at a higher density than the second holes in the second region.
7 . The apparatus of claim 4 , wherein the cleaning member further includes an auxiliary nozzle provided with a second plurality of discharge ports for discharging purge gas, and
a longitudinal direction of the auxiliary nozzle is provided in a vertical direction,
wherein a lower end of the auxiliary nozzle is positioned lower than the hand, and an upper end of the auxiliary nozzle is positioned higher than the hand.
8 . The apparatus of claim 7 , wherein the second plurality of discharge ports are configured to discharge the purge gas in a lateral direction.
9 . The apparatus of claim 2 , wherein the cleaning unit is installed adjacent to the transfer chamber.
10 . The apparatus of claim 2 , wherein the cleaning unit is positioned between the index module and the transfer chamber.
11 . The apparatus of claim 2 , wherein the treating module further includes a buffer module disposed between the index module and the transfer chamber to temporarily store the substrate transferred between the index module and the transfer chamber, and the cleaning unit is installed to be stacked with the buffer module.
12 . The apparatus of claim 1 , wherein the liquid receiving plate is disposed at a position lower than the hand of the main transfer robot and higher than a bottom surface of the housing, and wherein the liquid receiving plate is spaced apart from the bottom surface of the housing by a plurality of support rods.
13 . An apparatus for treating a substrate, the apparatus comprising:
an index module; and
a treating module disposed adjacent to the index module and treating the substrate,
wherein the treating module includes:
one or a plurality of process chambers;
a transfer chamber provided with a main transfer robot for transferring the substrate to the process chamber;
a cleaning unit for cleaning the main transfer robot; and
a buffer module disposed between the index module and the transfer chamber to temporarily store the substrate transferred between the index module and the transfer chamber, and
a hand of the main transfer robot includes:
a base plate; and
a guide on which the substrate is placed and which is disposed so as to protrude from the base plate in an upper direction, and
the cleaning unit is installed to be stacked with the buffer module, and includes:
a housing; and
a cleaning member which is provided in the housing and cleans the hand of the main transfer robot,
the cleaning member is provided to clean foreign substances or moisture scattered from the guide of the hand of the main transfer robot, and
the cleaning unit including a liquid receiving plate disposed below a purge nozzle in the housing for discharging purge gas to an upper surface of the hand of the main transfer robot loaded into the housing,
wherein the cleaning unit further includes an exhaust member for exhausting an inside of the housing,
when viewed from the top, an exhaust pipe of the exhaust member is coupled to the housing at a position lower than the liquid receiving plate so as to overlap the liquid receiving plate,
wherein an upper surface of the liquid receiving plate is concave to stably retain liquid dripping from the hand of the main transfer robot during cleaning of the hand, such that the liquid is held on the upper surface of the liquid receiving plate during cleaning of the hand, and
wherein the liquid receiving plate prevents the liquid falling from the hand from flowing into an exhaust port of the exhaust pipe during cleaning of the hand.