Addition system and method of reducing agent in semiconductor manufacturing process
An addition system of a reducing agent in a semiconductor manufacturing process includes pre-treatment and post-treatment gas concentration detection devices, a process exhaust gas treatment device, a reducing agent supply device, and an addition system control device. The process exhaust gas treatment device purifies exhaust gas of a semiconductor manufacturing process and emits a post-treatment gas. The reducing agent supply device supplies a reducing agent gas into the process exhaust gas treatment device. The post-treatment gas concentration detection device detects a residual concentration of the reducing agent gas in the post-treatment gas. The addition system control device calculates destruction and removal efficiency (DRE) for process gases according to pre-treatment and post-treatment gas concentrations, and, according to the DRE and the residual concentration, sends a signal to the reducing agent supply device to control the amount of the reducing agent gas added.
1 . An addition system of a reducing agent in a semiconductor manufacturing process, adapted to control amount of a reducing agent added for a semiconductor manufacturing process exhaust gas, the addition system comprising:
a pre-treatment gas concentration detection device, detecting a pre-treatment concentration of a plurality of process gases in the semiconductor manufacturing process exhaust gas;
a process exhaust gas treatment device, purifying the semiconductor manufacturing process exhaust gas and emitting a post-treatment gas;
a reducing agent supply device, supplying a reducing agent gas into the process exhaust gas treatment device;
a post-treatment gas concentration detection device, detecting a post-treatment concentration of the plurality of process gases and a residual concentration of the reducing agent gas in the post-treatment gas; and
an addition system control device, calculating destruction and removal efficiency for the plurality of process gases according to the pre-treatment concentration and the post-treatment concentration, and, according to the destruction and removal efficiency and the residual concentration of the reducing agent gas, sending a signal to the reducing agent supply device to control amount of the reducing agent gas added, wherein
the destruction and removal efficiency is expressed by equation (1):
DRE= 1−( C out /C in )( Q out /Q in ) (1)
wherein DRE represents treatment efficiency for a process gas, C out represents the post-treatment concentration, C in represents the pre-treatment concentration, Q out represents an outlet air volume of the process exhaust gas treatment device, and Q in represents an inlet air volume of the process exhaust gas treatment device.
2 . The addition system of a reducing agent in a semiconductor manufacturing process according to claim 1 , wherein,
in response to the residual concentration of the reducing agent gas exceeding a set value, the addition system control device sends the signal to reduce a flow rate of the reducing agent gas to a system set initial value.
3 . The addition system of a reducing agent in a semiconductor manufacturing process according to claim 1 , wherein
each of the plurality of process gases has a set value and a target range for the destruction and removal efficiency, in which the set value is a lower limit of the target range.
4 . The addition system of a reducing agent in a semiconductor manufacturing process according to claim 3 , wherein,
in response to the destruction and removal efficiency for all of the plurality of process gases reaching the set value, and the destruction and removal efficiency for at least one of the plurality of process gases exceeding an upper limit of the target range, the addition system control device sends the signal to reduce a flow rate of the reducing agent gas.
5 . The addition system of a reducing agent in a semiconductor manufacturing process according to claim 3 , wherein,
in response to the destruction and removal efficiency for at least one of the plurality of process gases being less than the set value, the addition system control device sends the signal to increase the amount of the reducing agent gas added.
6 . The addition system of a reducing agent in a semiconductor manufacturing process according to claim 1 , wherein
the addition system control device further comprises a display panel configured to display the pre-treatment concentration, the post-treatment concentration, the residual concentration of the reducing agent gas and the destruction and removal efficiency that vary with time.
7 . The addition system of a reducing agent in a semiconductor manufacturing process according to claim 6 , wherein
the display panel further displays an outlet air volume and an inlet air volume of the process exhaust gas treatment device.
8 . The addition system of a reducing agent in a semiconductor manufacturing process according to claim 7 , wherein
the display panel further displays a target range of the destruction and removal efficiency for the plurality of process gases and a set value of the residual concentration of the reducing agent gas.
9 . The addition system of a reducing agent in a semiconductor manufacturing process according to claim 1 , further comprising:
a system communication module, communicating with the pre-treatment gas concentration detection device, the post-treatment gas concentration detection device and the addition system control device.
10 . An addition method of a reducing agent in a semiconductor manufacturing process, comprising:
detecting a pre-treatment concentration of a plurality of process gases in a semiconductor manufacturing process exhaust gas before entry into a process exhaust gas treatment device;
purifying the semiconductor manufacturing process exhaust gas using the process exhaust gas treatment device, wherein a reducing agent gas is added into the process exhaust gas treatment device;
detecting a post-treatment concentration of the plurality of process gases and a residual concentration of the reducing agent gas in a post-treatment gas emitted from the process exhaust gas treatment device; and
calculating destruction and removal efficiency for the plurality of process gases according to the pre-treatment concentration and the post-treatment concentration, and, according to the destruction and removal efficiency and the residual concentration of the reducing agent gas, determining amount of the reducing agent gas added, wherein
the destruction and removal efficiency is expressed by equation (1):
DRE =1−( C out /C in )( Q out /Q in ) (1)
wherein DRE represents treatment efficiency for a process gas, C out represents the post-treatment concentration, C in represents the pre-treatment concentration, Q out represents an outlet air volume of the process exhaust gas treatment device, and Q in represents an inlet air volume of the process exhaust gas treatment device.
11 . The addition method of a reducing agent in a semiconductor manufacturing process according to claim 10 , further comprising:
in response to the residual concentration of the reducing agent gas exceeding a set value, reducing a flow rate of the reducing agent gas to a system set initial value.
12 . The addition method of a reducing agent in a semiconductor manufacturing process according to claim 10 , wherein
each of the plurality of process gases has a set value and a target range for the destruction and removal efficiency, in which the set value is a lower limit of the target range.
13 . The addition method of a reducing agent in a semiconductor manufacturing process according to claim 12 , further comprising:
in response to the destruction and removal efficiency for all of the plurality of process gases reaching the set value, and the destruction and removal efficiency for at least one of the plurality of process gases exceeding an upper limit of the target range, reducing a flow rate of the reducing agent gas.
14 . The addition method of a reducing agent in a semiconductor manufacturing process according to claim 12 , further comprising:
in response to the destruction and removal efficiency for at least one of the plurality of process gases being less than the set value, increasing the amount of the reducing agent gas added.