Substrate processing apparatus, operating method thereof, and photo spinner equipment
Disclosure provides a substrate processing apparatus, an operating method thereof, and photo spinner equipment, the substrate processing apparatus being capable of preventing fumes of processing liquid from blocking a duct. The substrate processing apparatus supplying processing liquid to a substrate to perform processing includes a substrate support unit configured to support the substrate, a liquid supply unit configured to supply liquid to the substrate, and a liquid recovery unit configured to recover the liquid from the substrate. The liquid recovery unit includes a recovery cup formed to surround the substrate support unit and an air injection unit configured to inject air to an internal space of the recovery cup.
1 . A substrate processing apparatus configured to supply a processing liquid to a substrate to perform processing, the substrate processing apparatus comprising:
a substrate support unit configured to support the substrate;
a liquid supply unit configured to supply a liquid to the substrate; and
a liquid recovery unit configured to recover the liquid from the substrate,
wherein the liquid recovery unit comprises:
a recovery cup formed to surround the substrate support unit; and
an air injection unit configured to inject air to an internal space of the recovery cup,
wherein the liquid supply unit comprises:
a processing liquid supply nozzle configured to supply the processing liquid for processing of the substrate; and
a cleaning liquid supply nozzle configured to supply a cleaning liquid for cleaning of the recovery cup,
wherein a bottom surface of the recovery cup includes a circular groove for collecting the cleaning liquid, and
wherein the air injection unit comprises a plurality of air nozzles installed on an outer wall of the recovery cup and the air nozzles are directed toward the circular groove and, when viewed in a plan view, each air nozzle is oriented obliquely with respect to the circular groove so as to inject the air in a direction inclined with respect to the outer wall of the recovery cup, wherein the injected air causes the cleaning liquid collected in the recovery cup to flow in a circumferential direction along the circular groove.
2 . The substrate processing apparatus of claim 1 , further comprising:
a jig including a body with a rebound groove formed therein,
wherein the substrate support unit is configured to selectively support the substrate for the processing of the substrate and the jig for the cleaning of the recovery cup, and
wherein the rebound groove of the jig is configured to cause the cleaning liquid supplied from the cleaning liquid supply nozzle to splash toward an inner wall of the recovery cup.
3 . The substrate processing apparatus of claim 2 ,
wherein a discharge port through which the cleaning liquid is discharged is formed at a part of the circular groove,
whether or not the discharge port is opened is controlled by an opening and closing valve,
the cleaning liquid is discharged outwards through the discharge port, and
volatile elements of the cleaning liquid are discharged outwards through an inner exhaust port located in the recovery cup.
4 . The substrate processing apparatus of claim 1 ,
wherein an internal space in which processing with respect to the substrate is performed is sealed by a housing and a cover, the cover being coupled to an upper surface of the housing,
the cover is formed to be inclined from the upper surface of the housing toward a center portion of the cover, and
the center portion of the cover comprises an air flow provision unit generating a downward air flow.
5 . An operating method of the substrate processing apparatus of claim 1 , the operating method comprising:
supplying a processing liquid from the liquid supply unit to the substrate seated on the substrate support unit;
recovering the processing liquid splattering from the substrate by using the liquid recovery unit; and
cleaning the liquid recovery unit,
wherein the cleaning of the liquid recovery unit comprises:
positioning a jig at the substrate support unit;
supplying the cleaning liquid to the jig to clean the liquid recovery unit; and
circulating the cleaning liquid by injecting air to the internal space of the recovery cup surrounding the substrate support unit; and
discharging the cleaning liquid.
6 . The operating method of claim 5 ,
wherein an internal space in which processing with respect to the substrate is performed is sealed by a housing and a cover, the cover being coupled to an upper surface of the housing,
the cover is formed to be inclined from the upper surface of the housing toward a center portion of the cover, and
the center portion of the cover comprises an air flow provision unit generating a downward air flow.
7 . The operating method of claim 5 , wherein a discharge port through which the cleaning liquid is discharged is formed at a part of the circular groove, and whether or not the discharge port is opened is controlled by an opening and closing valve.
8 . The operating method of claim 7 , the cleaning liquid is discharged outwards through the discharge port, and
volatile elements of the cleaning liquid are discharged outwards through an inner exhaust port located in the recovery cup.
9 . Photo spinner equipment comprising:
an index module configured to transfer a substrate from a container in which the substrate is received;
a processing module configured to perform a coating process and a developing process with respect to the substrate, and comprising a substrate processing apparatus configured to perform liquid processing on the substrate; and
an interface module connecting the processing module to external light exposure equipment,
wherein the substrate processing apparatus comprises:
a substrate support unit configured to support the substrate;
a liquid supply unit configured to supply a processing liquid to the substrate; and
a liquid recovery unit configured to recover the processing liquid from the substrate,
wherein the liquid recovery unit comprises:
a recovery cup formed to surround the substrate support unit; and
an air injection unit configured to inject air to an internal space of the recovery cup,
wherein the liquid supply unit comprises:
a processing liquid supply nozzle configured to supply the processing liquid for processing of the substrate; and
a cleaning liquid supply nozzle configured to supply a cleaning liquid for cleaning of the recovery cup,
wherein a bottom surface of the recovery cup includes a circular groove for collecting the cleaning liquid, and
wherein the air injection unit comprises a plurality of air nozzles installed on an outer wall of the recovery cup and the air nozzles are directed toward the circular groove and, when viewed in a plan view, each air nozzle is oriented obliquely with respect to the circular groove so as to inject the air in a direction inclined with respect to the outer wall of the recovery cup, wherein the injected air causes the cleaning liquid collected in the recovery cup to flow in a circumferential direction along the circular groove.
10 . The photo spinner equipment of claim 9 ,
wherein the substrate processing apparatus further comprises:
a jig including a body with a rebound groove formed therein,
wherein the substrate support unit is configured to selectively support the substrate for the processing of the substrate and the jig for the cleaning of the recovery cup, and
wherein the rebound groove of the jig is configured to cause the cleaning liquid supplied from the cleaning liquid supply nozzle to splash toward an inner wall of the recovery cup.
11 . The photo spinner equipment of claim 10 ,
wherein a discharge port through which the cleaning liquid is discharged is formed at a part of the circular groove,
whether or not the discharge port is opened is controlled by an opening and closing valve,
the cleaning liquid is discharged outwards through the discharge port, and
volatile elements of the cleaning liquid are discharged outwards through an inner exhaust port located in the recovery cup.
12 . The photo spinner equipment of claim 9 ,
wherein an internal space in which processing with respect to the substrate is performed is sealed by a housing and a cover, the cover being coupled to an upper surface of the housing,
the cover is formed to be inclined from the upper surface of the housing toward a center portion of the cover, and
the center portion of the cover comprises an air flow provision unit generating a downward air flow.