IP Library Granted Patent US 12672509
Granted Patent B2
US 12672509 · App. 18/361,719 · Granted Jun 30, 2026

Method of monitoring tool

Inventors: Hom-Chung Lin (Taichung City, TW); Chi-Ying Chang (Taichung City, TW); Jih-Churng Twu (Hsinchu County, TW); Chin-Yun Chen (Taipei City, TW); Yi-Ting Chang (Tainan City, TW); Feng-Yu Chen (Taichung City, TW)
Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
H10P72/0606H10P72/34
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Quick Facts
Patent No.
US 12672509
App. No.
18/361,719
Granted
Jun 30, 2026
Kind
B2
Abstract

A method includes transferring a tool monitoring device over a load port of a tool. A bottom of the tool monitoring device has a plurality of holes, and the load port comprises a plurality of pins at a top surface of the load port. The tool monitoring device is placed on the top surface of the load port. The pins at the top surface of the load port are plugged into the holes of the tool monitoring device. Heights of the pins are sensed to identifying a type of the load port after the tool monitoring device is placed on the top surface of the load port. An environment around the load port is monitored by using the tool monitoring device.

Claims (47)

1 . A method comprising:

transferring a tool monitoring device over a load port of a tool, wherein a bottom of the tool monitoring device has a plurality of holes, and the load port comprises a plurality of pins at a top surface of the load port;

placing the tool monitoring device on the top surface of the load port, wherein the pins at the top surface of the load port are plugged into the holes of the tool monitoring device;

after placing the tool monitoring device on the top surface of the load port, sensing heights of the pins to identifying a type of the load port; and

monitoring, by using the tool monitoring device, an environment around the load port.

2 . The method of claim 1 , further comprising:

transferring a wafer pod over the load port of the tool; and

determining whether the wafer pod is placed on the top surface of the load port according to a monitoring result of monitoring the environment around the load port.

3 . The method of claim 1 , wherein monitoring the environment around the load port comprises:

monitoring a leveling state of the load port.

4 . The method of claim 1 , wherein monitoring the environment around the load port comprises:

monitoring a contamination level of the load port.

5 . The method of claim 1 , wherein monitoring the environment around the load port comprises:

monitoring a temperature around the load port.

6 . The method of claim 1 , wherein monitoring the environment around the load port comprises:

monitoring an amount of bio-hazardous particles of the load port.

7 . The method of claim 1 , wherein monitoring the environment around the load port comprises:

observing the environment around the load port using at least one charge-coupled device (CCD) arranged on the tool monitoring device.

8 . A method comprising:

transferring a tool monitoring device over a load port of a tool, wherein a bottom of the tool monitoring device has a hole, and the load port comprises a pin at a top surface of the load port;

lowering the tool monitoring device to the load port until the pin at the top surface of the load port is inserted into the hole of the tool monitoring device;

after the pin at the top surface of the load port is inserted into the hole of the tool monitoring device, monitoring, by using the tool monitoring device, an amount of contaminant particles on the pin; and

determining whether an environmental parameter of the load port complies with a predetermined standard according to the amount of the contaminant particles on the pin.

9 . The method of claim 8 , wherein a door of the tool facing the load port is kept closed when the tool monitoring device is disposed on the load port.

10 . The method of claim 8 , further comprising:

transferring a wafer pod over the tool.

11 . The method of claim 10 , further comprising:

placing the wafer pod on the top surface of the load port when the amount of the contaminant particles is lower than a predetermined number of the predetermined standard.

12 . The method of claim 10 , further comprising:

opening a door of the tool facing the load port after placing the wafer pod on the top surface of the load port.

13 . The method of claim 10 , wherein the wafer pod comprises wafers therein.

14 . The method of claim 8 , wherein the tool monitoring device is free of wafers therein.

15 . A method comprising:

placing a tool monitoring device on a load port of a tool;

monitoring an environmental parameter of the load port by the tool monitoring device;

after monitoring the environmental parameter of the load port, transferring the tool monitoring device to a charging station;

charging the tool monitoring device by the charging station; and

outputting a monitor result of the tool monitoring device to a user interface of the charging station.

16 . The method of claim 15 , further comprising:

cleaning the charging station prior to charging the tool monitoring device.

17 . The method of claim 15 , further comprising:

transmitting the monitor result of the tool monitoring device to a computer of the charging station.

18 . The method of claim 15 , wherein the environmental parameter comprises a contamination level, and monitoring the contamination level is performed by mounting a particle counter on a pin arranged on the load port.

19 . The method of claim 15 , further comprising:

transferring a wafer pod to the load port after transferring the tool monitoring device to the charging station.

20 . The method of claim 15 , further comprising:

keeping a door of the tool facing the load port closed during monitoring the environmental parameter of the load port.