IP Library › Granted Patent US 12,672,518
Granted Patent B2
US 12,672,518 · App. 17/836,554 · Granted Jun 30, 2026

Heat treatment susceptor and heat treatment apparatus

Inventor: Hiroyasu Takehara (Kyoto, JP)
Assignee: SCREEN Holdings Co., Ltd.
H10P72/7624H05B3/0047H10P72/0436H10P72/7614
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Quick Facts
Patent No.
US 12,672,518
App. No.
17/836,554
Granted
Jun 30, 2026
Kind
B2
Abstract

A heat treatment susceptor holds a substrate when the substrate is irradiated with a flash of light from flash lamps to perform a heat treatment on the substrate. The heat treatment susceptor includes: a holding plate having a planar holding surface; and a plurality of substrate support bodies mounted upright on the holding surface, wherein a slit is formed around a position where at least one of the substrate support bodies is mounted upright in the holding plate, and the slit includes at least one bending portion or a corner portion.

Claims (18)

1 . A heat treatment susceptor holding a substrate when the substrate is irradiated with a flash of light from flash lamps to perform a heat treatment on the substrate, the heat treatment susceptor comprising:

a holding plate having a planar holding surface; and

a plurality of substrate support bodies mounted upright on the holding surface, wherein

at least one slit is formed around a position where at least one of the substrate support bodies is mounted upright in the holding plate, and

the slit includes at least one bending portion or one corner portion surrounding at least one of the substrate support bodies,

the plurality of substrate support bodies are mounted upright on a first circumference and a second circumference having a larger diameter than a diameter of the first circumference,

the slit having a U-like shape or a V-like shape with an opening portion directed to the central portion of the holding plate is formed around a position where each of the substrate support bodies are mounted upright on the first circumference, and

the slit having a U-like shape or a V-like shape with an opening portion directed to an end portion of the holding plate is formed around a position where each of the substrate support bodies are mounted upright on the second circumference.

2 . The heat treatment susceptor according to claim 1 , wherein

the slits are formed around all of positions where the plurality of substrate support bodies are mounted upright.

3 . The heat treatment susceptor according to claim 1 , wherein

a maximum deflection amount in a portion surrounded by the slit occurring when the substrate presses the slit via each of the substrate support bodies at a time of deformation of the substrate due to flash irradiation from the flash lamps is smaller than a height of each of the substrate support bodies mounted upright.

4 . The heat treatment susceptor according to claim 1 , wherein

a position where each of the substrate support bodies is mounted upright surrounded by the slit is deflected to be rotated when the substrate is deformed by flash irradiation from the flash lamps.

5 . A heat treatment apparatus heating a substrate by irradiating the substrate with a flash of light, the heat treatment apparatus comprising:

a chamber housing the substrate;

the heat treatment susceptor according to claim 1 disposed inside the chamber, and

flash lamps irradiating the substrate held by the heat treatment susceptor with the flash of light.