Substrate having an increased metal trace thickness
A thickness of a signal trace on a printed circuit board (PCB) or a substrate is increased by intentionally forming a solder bridge on a surface of the signal trace during a reflow process in which a flip chip die or other computing component is mounted to the PCB or the substrate. Specifically, adjacent interconnects of the flip chip die are coupled to the same signal trace on the PCB or the substrate. During the reflow process, solder associated with each interconnect flows into a space or area defined by the adjacent interconnects and forms a solder bridge within the space, thereby increasing a thickness of the signal trace.
1 . An integrated circuit, comprising:
a substrate comprising a metal trace having a substantially uniform width along a length of the metal trace, the metal trace having a first thickness;
a computing component comprising:
a first interconnect having a first solder bump and being electrically coupled to the metal trace at a first location on the metal trace;
a second interconnect having a second solder bump and being electrically coupled to the metal trace at a second location on the metal trace; and
a solder bridge formed on a surface of the metal trace between the first solder bump and the second solder bump, the solder bridge increasing the thickness of the metal trace to a second thickness greater than the first thickness in an area defined by the first interconnect and the second interconnect.
2 . The integrated circuit of claim 1 , wherein the first interconnect and the second interconnect are copper pillars.
3 . The integrated circuit of claim 1 , wherein the computing component is a flip chip die.
4 . The integrated circuit of claim 3 , wherein a thickness of a die of the flip chip die is between approximately sixty-five micrometers and approximately seventy-five micrometers.
5 . The integrated circuit of claim 1 , wherein a size of the first solder bump and a size of the second solder bump is approximately seventy micrometers by approximately forty micrometers prior to the solder bridge being formed on the metal trace.
6 . The integrated circuit of claim 1 , wherein the second thickness is approximately thirty percent greater than the first thickness.
7 . The integrated circuit of claim 1 , wherein a distance between the first interconnect and the second interconnect is between approximately thirty-five micrometers and approximately fifty micrometers.
8 . A method for coupling a first computing component to a second computing component, comprising:
coupling a solder bump of a first interconnect of the first computing component and a solder bump of a second interconnect of the first computing component to a metal trace of the second computing component, the metal trace having a uniform width along a length of the metal trace and having a first thickness; and
causing a solder bridge to form on a surface of the metal trace between the solder bump of the first interconnect and the solder bump of the second interconnect during a reflow process, the solder bridge forming on the metal trace in an area defined by the first interconnect and the second interconnect, the solder bridge increasing the thickness of the metal trace to a second thickness greater than the first thickness.
9 . The method of claim 8 , wherein the solder bridge reduces an impedance mismatch between the first computing component and the second computing component.
10 . The method of claim 8 , wherein the second thickness is more than approximately thirty percent greater than the first thickness.
11 . The method of claim 8 , wherein the first computing component is a flip chip die and the second computing component is a substrate.
12 . The method of claim 11 , wherein a thickness of a die of the flip chip die is approximately seventy-five micrometers.
13 . The method of claim 11 , wherein a thickness of a die of the flip chip die is approximately sixty-five micrometers.
14 . The method of claim 8 , wherein a size of the solder bump of the first interconnect and a size of the solder bump of the second interconnect is approximately seventy micrometers by approximately forty micrometers prior to the solder bridge forming on the metal trace.
15 . The method of claim 8 , wherein the first interconnect and the second interconnect are comprised of copper.
16 . The method of claim 8 , wherein a distance between the first interconnect and the second interconnect is between approximately thirty-five micrometers and approximately fifty micrometers.
17 . An integrated circuit, comprising:
a substrate comprising a connection means having a uniform width along a length of the connection means, the connection means having a first thickness;
a computing component comprising:
a first interconnect means having a first attachment means and being electrically coupled to the connection means at a first location on the connection means;
a second interconnect means having a second attachment means and being electrically coupled to the connection means at a second location on the connection means; and
a bridge formed on a surface of the connection means between the first attachment means and the second attachment means, the bridge increasing the thickness of the connection means to a second thickness greater than the first thickness in an area defined by the first interconnect means and the second interconnect means.
18 . The integrated circuit of claim 17 , wherein the first interconnect means is comprised of copper and wherein the first attachment means is comprised of solder.
19 . The integrated circuit of claim 17 , wherein the computing component comprises a die and wherein a thickness of the die is between approximately sixty-five micrometers and approximately seventy-five micrometers.
20 . The integrated circuit of claim 17 , wherein a size of the first attachment means is approximately seventy micrometers by approximately forty micrometers prior to a reflow process.