Panel structure and manufacturing method thereof
A panel structure including a stretchable substrate, a first flexible layer, a circuit layer, multiple light-emitting elements, a filler layer, a second flexible layer, and an element layer is disclosed. The first flexible layer includes multiple pixel islands, and the pixel islands are defined by multiple through holes. Each of the through holes passes through the first flexible layer, the filler layer, and the second flexible layer. The display structure has good continuity in structure, and optical performance of the display structure is good. A manufacturing method of a panel structure is also disclosed.
1 . A manufacturing method of a panel structure, comprising:
forming a lower panel structure, comprising:
disposing a first flexible layer on a first substrate; and
disposing a circuit layer and a plurality of light-emitting elements on the first flexible layer, wherein the light-emitting elements are electrically connected to the circuit layer;
forming an upper panel structure, comprising:
disposing an etching barrier layer on the second substrate;
disposing a second flexible layer on the etching barrier layer; and
disposing an element layer on the second flexible layer;
flipping the second substrate such that the etching barrier layer is located between the second substrate and the first flexible layer, and combining the upper panel structure and the lower panel structure;
disposing a filler layer between the first flexible layer and the second flexible layer;
removing the second substrate;
using the etching barrier layer to form a plurality of through holes simultaneously passing through the first flexible layer, the filler layer, and the second flexible layer; and
replacing the first substrate with a stretchable substrate.
2 . The manufacturing method of the panel structure according to claim 1 , wherein the etching barrier layer comprises one of ITO, IGZO, and ITZO.
3 . The manufacturing method of the panel structure according to claim 1 , further comprising:
removing the etching barrier layer from the second flexible layer.
4 . The manufacturing method of the panel structure according to claim 3 , further comprising:
disposing a stretchable upper cover layer on the second flexible layer.
5 . The manufacturing method of the panel structure according to claim 1 , wherein forming the upper panel structure further comprises:
disposing a sacrificial layer between the second substrate and the etching barrier layer, and
wherein the manufacturing method of the panel structure further comprises:
removing the sacrificial layer.
6 . The manufacturing method of the panel structure according to claim 5 , further comprising:
disposing a photoresist layer on the etching barrier layer; and
etching the etching barrier layer.
7 . The manufacturing method of the panel structure according to claim 1 , further comprising:
filling the through holes with a filling material.
8 . The manufacturing method of the panel structure according to claim 1 , wherein the element layer comprises a touch electrode.
9 . The manufacturing method of the panel structure according to claim 1 , wherein the element layer comprises a color conversion material.
10 . A manufacturing method of a panel structure, comprising:
forming a lower panel structure, comprising:
disposing a first flexible layer on a first substrate; and
disposing a circuit layer and a plurality of light-emitting elements on the first flexible layer, wherein the light-emitting elements are electrically connected to the circuit layer;
forming an upper panel structure, comprising:
disposing a second flexible layer on a second substrate; and
disposing an element layer on the second flexible layer;
flipping the second substrate such that the element layer is located between the second substrate and the first flexible layer, and combining the upper panel structure and the lower panel structure;
disposing a filler layer between the first flexible layer and the second flexible layer;
removing the second substrate;
disposing an etching barrier layer on a side of the second flexible layer away from the element layer;
using the etching barrier layer to form a plurality of through holes passing through the first flexible layer, the filler layer, and the second flexible layer; and
replacing the first substrate with a stretchable substrate.
11 . The manufacturing method of the panel structure according to claim 10 , wherein the etching barrier layer comprises one of ITO, IGZO, and ITZO.
12 . The manufacturing method of the panel structure according to claim 10 , wherein forming the upper panel structure further comprises:
disposing a sacrificial layer between the second substrate and the second flexible layer, and
wherein the manufacturing method of the panel structure further comprises:
removing the sacrificial layer.