IP Library Granted Patent US 12673302
Granted Patent B2
US 12673302 · App. 18/470,552 · Granted Jul 7, 2026

Gas separation membrane and method of producing gas separation membrane

Inventor: Yasutaka Matsumoto (Suwa, JP)
Assignee: SEIKO EPSON CORPORATION
B01D71/70B01D69/1214B01D2323/36
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Quick Facts
Patent No.
US 12673302
App. No.
18/470,552
Granted
Jul 7, 2026
Kind
B2
Abstract

A gas separation membrane includes a resin layer including an organopolysiloxane and a modified layer provided at a surface on one side of the resin layer and including a functional group introduced into the surface on one side. When X-ray photoelectron spectrometry, in which X-rays are irradiated from the front surface side of the modified layer, is performed to generate an XPS spectrum in a range including an Si2p peak and the Si2p peak is subjected to waveform separation, the area ratio of the Si—O peak to the Si2p peak is from 2% to 30%.

Claims (20)

1 . A gas separation membrane comprising:

a resin layer including an organopolysiloxane; and

a modified layer provided at a surface on one side of the resin layer and including a polar group introduced into the surface on the one side, wherein

in an X-ray photoelectron spectrometry process, when X-rays are irradiated from a front surface side of the modified layer, an XPS spectrum in a range including an Si2p peak is generated,

the Si2p peak is subjected to a fitting process to separate an Si—O peak from the Si2p peak, and

a ratio of an area of the Si—O peak in the XPS spectrum to an area of the Si2p peak in the XPS spectrum is from 2% to 30%.

2 . The gas separation membrane according to claim 1 , wherein

the XPS spectrum is a spectrum in a range including the Si2p peak, a C1s peak, and a O1s peak, and

an area ratio of the Si2p peak to a whole of the XPS spectrum is 5% or greater when elemental analysis is performed based on the XPS spectrum.

3 . The gas separation membrane according to claim 1 , wherein

the polar group includes an amino group, a carboxylic acid group, or a phenyl group.

4 . A method of producing a gas separation membrane, the method comprising:

an activation treatment step of subjecting a surface on one side of a resin layer to an activation treatment, the resin layer including an organopolysiloxane; and

a polar group-introducing step of bringing a coupling agent into contact with a surface on the one side subjected to the activation treatment to introduce a polar group into the surface on the one side, the polar group-introducing step being provided after the activation treatment step, wherein

in an X-ray photoelectron spectrometry process, when X-rays are irradiated from the surface on the one side with the polar group introduced, an XPS spectrum in a range including an Si2p peak is generated,

the Si2p peak is subjected to a fitting process to separate an Si—O peak from the Si2p peak, and

a ratio of an area of the Si—O peak in the XPS spectrum to an area of the Si2p peak in the XPS spectrum is from 2% to 30%.

5 . The method of producing the gas separation membrane according to claim 4 , wherein

the coupling agent includes one or two hydrolyzable groups per molecule, and

the hydrolyzable group is an alkoxy group or a carboxylic acid group.