Template as well as manufacturing method and use, intermediate structure and lithium secondary battery electrode

1 . A manufacturing method for an intermediate structure of a lithium secondary battery electrode, the manufacturing method for the intermediate structure comprising the following steps:

synthesizing a template: bonding a film material onto a substrate through an adhesive layer, and allowing both the film material and the adhesive layer to be formed with through holes, central axes of the through holes being perpendicular to a plane where the substrate is located; wherein the substrate is a conductive substrate, and the film material is a flexible polymer thin film, the polymer thin film is at least one of a poly tetra fluoroethylene (PTFE) thin film, a polyethylene glycol terephthalate (PET) thin film, a polypropylene (PP) thin film, a polycarbonate (PC) thin film or a polyimide (PI) thin film, a hole spacing between adjacent through holes is 5 μm to 20 μm, a ratio of a thickness of the film material to a hole diameter of the through holes is 1:3 to 3:1, the thickness of the film material is 2 μm to 50 μm, wherein the template is used for preparing the lithium secondary battery electrode on one surface or two surfaces of the template;

growing a conductive material in through holes such that one-dimensional columnar structures perpendicular to the substrate are formed in the through holes; and removing the film material in the template to obtain the intermediate structure, the one-dimensional columnar structures is used for coating an active material layer on an outer surface of the one-dimensional columnar structures, and an electrode active material of the active material layer includes at least one of silicon and silicide.

2 . The manufacturing method for the intermediate structure according to claim 1 , wherein the manufacturing method for the template comprises the following steps:

treating the film material by ion track etching to obtain the through holes, and printing or spraying the adhesive layer on the film material having the through holes; and

bonding the film material formed with the adhesive layer to the substrate through the adhesive layer by hot pressing to obtain the template;

or,

the manufacturing method for the template comprises the following steps:

applying the adhesive layer to the film material not formed with the through holes, and treating the film material with the adhesive layer by ion track etching such that both the adhesive layer and the film material are formed with the through holes; and

bonding the film material formed with the through holes to the substrate through the adhesive layer formed with the through holes by hot pressing to obtain the template;

or,

the manufacturing method for the template comprises the following steps:

applying the adhesive layer to the film material not formed with the through holes;

bonding the film material formed with the adhesive layer to the substrate through the adhesive layer by hot pressing; and

treating the film material bonded to the substrate and the adhesive layer by ion track etching such that the film material and the adhesive layer are formed with the through holes.

3 . The manufacturing method for the intermediate structure according to claim 2 , wherein conditions of the ion track etching comprise: using heavy ion bombardment, irradiation being carried out under an irradiation power of 2000 KW to 10000 KW for 0.5 s to 200 s; and/or

the conditions of the ion track etching comprise: an etching solution being an alkaline solution, and an etching time being 5 min to 30 min; and/or

the adhesive layer being at least one of polyvinylidene difluoride (PVDF) or a conductive adhesive.

4 . The manufacturing method for the intermediate structure according to claim 1 , wherein the hole diameter of the through holes is 10 nm to 50 μm, and/or

a hole density of the through holes is 10 5 /cm 2 to 10 8 /cm 2 .

5 . The manufacturing method for the intermediate structure according to claim 4 , wherein the hole diameter of the through holes is 5 μm to 30 μm, and/or

the hole density of the through holes is 0.4 million/cm 2 to 2 million/cm 2 , and/or

the thickness of the film material is 15 μm to 50 μm, and/or

the ratio of the thickness of the film material to the hole diameter of the through holes is 1:1 to 3:1.

6 . The manufacturing method for the intermediate structure according to claim 1 , wherein the conductive material is grown in the through holes by one of physical vapor deposition, electroplating, chemical plating or chemical vapor deposition; and/or

the conductive material is at least one of copper, nickel or carbon; and/or

the film material is removed by one of mechanical stripping, chemical etching or vacuum sintering.

7 . The manufacturing method for the lithium secondary battery electrode, comprising the following steps:

the intermediate structure is prepared by the manufacturing method for the intermediate structure according to claim 1 ;

covering the outer surface of each of the one-dimensional columnar structures with the electrode active material to form the active material layer; and

covering an outer surface of the active material layer with a protective layer to obtain the lithium secondary battery electrode.

8 . The manufacturing method for the lithium secondary battery electrode according to claim 7 , wherein

a material of the protective layer is carbon or metal oxide; and/or

the outer surface of each of the one-dimensional columnar structures is covered with the electrode active material by chemical vapor deposition, physical vapor deposition or electroplating; and/or

the outer surface of the active material layer is covered with the protective layer by a hydrothermal process, physical vapor deposition or chemical vapor deposition.