Al-rich AlTiN-based films

1 . A coating comprising at least one AlTiN-based film deposited using a PVD process, wherein the at least one AlTiN-based film deposited comprises an Al-content—in relation to a Ti-content—in atomic percentage 76% or higher, and wherein the AlTiN-based film exhibits solely a crystallographic cubic phase and internal compressive stresses,

wherein said at least one AlTiN-based film has a chemical composition in atomic percentage corresponding to the formula (Al a Ti b )(N c Ar d ) y with 0<d<0.02, 1≥c>0.98, a+b=1, c+d=1 and a>0.75, where a, b, c and d are an atomic fraction of a concentration of aluminum, titanium, nitrogen and argon, respectively, and 0.8≤y≤1.2,

the content of argon in the at least one AlTiN-based film corresponds to d>0,

said at least one AlTiN-based film exhibits internal compressive stresses in a range between 1 GPa and 6 GPa, and

said at least one AlTiN-based film shows higher elastic modulus of over 400 GPa, and a hardness is—at least essentially—44 GPa.

2 . The coating according to claim 1 , wherein the at least one AlTiN-based film exhibits a Young's modulus E>350 GPa.

3 . The coating according to claim 1 , wherein the crystallographic cubic structure of the at least one AlTiN-based coating deposited comprises crystallite grains with coarse grain size, corresponding to an average grain size of more than 15 nm.

4 . The coating according to claim 1 , wherein the at least one AlTiN-based film exhibits a very smooth surface characterized by Rz<1 μm.

5 . The coating according to claim 1 , wherein the AlTiN-based film is deposited on top of a cubic template layer TiN with a thickness about 50 nm.