Laminate and method of manufacturing laminate
A laminate has a layer A on at least one side of a base material, in which the layer A contains at least aluminum (Al) and oxygen (O), and when a site corresponding to 5.0 to 25.0%, a site corresponding to 40.0 to 60.0%, and a site corresponding to 75.0 to 95.0%, in terms of length in a depth direction in the layer A, are defined as an X portion, a Y portion, and a Z portion, respectively, there are sites having a different composition ratio O/Al of aluminum (Al) and oxygen (O). There are provided a laminate that exhibits high productivity and less variation in gas barrier properties even with a thin film configuration, and a method for manufacturing a laminate.
1 . A laminate having a layer A on at least one side of a base material, wherein
the layer A contains at least aluminum (Al) and oxygen (O), and
when a site corresponding to 5.0 to 25.0%, a site corresponding to 40.0 to 60.0%, and a site corresponding to 75.0 to 95.0%, in terms of length in a depth direction in the layer A, are defined as an X portion, a Y portion, and a Z portion, respectively, there are sites having a different composition ratio O/Al of aluminum (Al) and oxygen (O);
wherein I X (530)/I X (540)≤0.15 and/or I Z (530)/I Z (540)≤0.25 is satisfied in the X portion and the Z portion in the layer A.
2 . The laminate according to claim 1 , wherein hydrogen is further contained in the layer A, and when peak intensities in a vicinity of 530 eV of an oxygen K-edge spectrum of an electron energy loss spectroscopy (EELS) analysis in each of the X portion, the Y portion, and the Z portion are defined as I X (530), I Y (530), and I Z (530), and peak intensities in a vicinity of 540 eV of the oxygen K-edge spectrum of the EELS analysis in each of the X portion, the Y portion, and the Z portion in the layer A are defined as I X (540), I Y (540), and I Z (540), I Y (530)/I Y (540)>I X (530)/I X (540) and/or Iv (530)/I Y (540)>I Z (530)/I Z (540) is satisfied.
3 . A laminate having a layer A on at least one side of a base material, wherein the layer A contains at least aluminum (Al) and oxygen (O), and when a peak intensity in a vicinity of 530 eV of an oxygen K-edge spectrum in EELS analysis in the layer A is defined as I(530), and a peak intensity in a vicinity of 540 eV is defined as I(540), I(530)/I(540)≤1.50 is satisfied.
4 . The laminate according to claim 3 , wherein when a thickness of the layer A is X(nm) and a water vapor permeability is Y (g/m 2 /day), X×Y≤20.0.
5 . The laminate according to claim 1 , wherein a total light transmittance of the laminate is 85.0% or more.
6 . The laminate according to claim 1 , wherein with respect to an average composition of the layer A, a composition ratio O/Al of aluminum (Al) and oxygen (O) is 1.20≤O/Al≤2.20.
7 . The laminate according to claim 1 , wherein a thickness of the layer A is 15.0 nm or less.
8 . The laminate according to claim 1 , wherein the layer A contains hydrogen (H), and with respect to the average composition of the layer A, aluminum (Al) atomic concentration:oxygen (O) atomic concentration:hydrogen (H) atomic concentration is 15.0 to 40.0:40.0 to 55.0:10.0 to 35.0 (atm %).
9 . A method of manufacturing the laminate according to claim 1 , wherein a vapor deposition layer is formed on at least one surface of the base material by evaporating aluminum by a vacuum vapor deposition method and introducing oxygen into aluminum vapor.
10 . The method according to claim 9 , wherein oxygen is introduced from an upstream side and/or a downstream side of the base material.
11 . The method according to claim 9 , wherein oxygen is introduced from immediately above an evaporation source.