IP Library › Granted Patent US 12675044
Granted Patent B2
US 12675044 · App. 17/899,156 · Granted Jul 7, 2026

Tin(II) amide/alkoxide precursors for EUV-patternable films

Inventors: David M. Ermert (Danbury, CT); Tom M. Cameron (Newtown, CT)
Assignee: Entegris, Inc.
G03F7/0042G03F7/2004
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Quick Facts
Patent No.
US 12675044
App. No.
17/899,156
Granted
Jul 7, 2026
Kind
B2
Abstract

The invention provides certain mixed Sn (II) amide/alkoxide precursor compounds. These compounds are useful in precursor compositions in the vapor deposition of tin-containing films such as tin oxide films onto a surface of a microelectronic device. These precursor compounds are useful in, for example, extreme ultraviolet light (EUV) lithography techniques used in microelectronic device manufacturing when paired with certain counter-reactants in a vapor deposition process. In this process, the resulting organotin polymeric surface is thus EUV-patternable insofar as when exposed to a patterned beam of EUV light, exposed portions are subjected to further reaction, thus creating regions which are chemically and physically different; this difference enables further processing and lithography of exposed regions and/or non-exposed regions and lithography in pursuit of the ultimate fabricated microelectronic device.

Claims (14)

1 . A precursor composition comprising a compound of Formula (III):

wherein R is C 1 -C 4 alkyl and R 1 is C 1 -C 5 alkyl.

2 . The composition of claim 1 , wherein the composition contains no more than 100 ppm of materials which are other than compounds of Formulae (I), (II), and (III), wherein Formulae (I) and (II) are:

wherein R is C 1 -C 4 alkyl and R 1 is C 1 -C 5 alkyl.

3 . The precursor composition of claim 1 , wherein R is methyl, and R 1 is chosen from methyl, ethyl, isopropyl, t-butyl, and neopentyl.

4 . The precursor composition of claim 1 , wherein R is methyl and R 1 is methyl.

5 . The precursor composition of claim 1 , wherein R is methyl and R 1 is ethyl.

6 . The precursor composition of claim 1 , wherein R is methyl and R 1 is isopropyl.

7 . The precursor composition of claim 1 , wherein R is methyl and R 1 is neopentyl.

8 . The precursor composition of claim 1 , wherein R is methyl and R 1 is tert-butyl.

9 . The precursor composition of claim 1 , wherein the composition further comprises a compound of Formula (I),

wherein R is C 1 -C 4 alkyl and R 1 is C 1 -C 5 alkyl.

10 . The precursor composition of claim 1 , wherein the composition further comprises a compound of Formula (II),

wherein R is C 1 -C 4 alkyl and R 1 is C 1 -C 5 alkyl.