Information processing system and phase analysis system

1 . An information processing system comprising:

an input unit that receives a structure distribution of a sample and a first phase distribution of an electron beam, X-ray, light or neutron beam transmitted through the sample;

a processing unit that computes a second phase distribution based on the structure distribution and computes an electromagnetic field component of the sample based on the first phase distribution and the second phase distribution; and

an output unit that outputs the electromagnetic field component.

2 . The information processing system according to claim 1 , wherein

the processing unit

computes a phase change due to a mean inner potential of the sample derived from the structure distribution as the second phase distribution, and

computes a third phase distribution, which is a phase change due to a potential distribution of the sample, as the electromagnetic field component.

3 . The information processing system according to claim 2 , wherein

the processing unit

computes the third phase distribution by subtracting the second phase distribution from the first phase distribution.

4 . The information processing system according to claim 3 , wherein

the processing unit

computes a first differential value of the first phase distribution and a second differential value of the second phase distribution,

computes a third differential value of the third phase distribution based on the first differential value and the second differential value, and

computes the electromagnetic field component of the sample based on the third differential value.

5 . The information processing system according to claim 1 , wherein

the structure distribution of the sample

includes distributions relating to composition, thickness or density of the sample.

6 . A phase analysis system including an electron microscope and a control device for controlling the electron microscope, wherein

the electron microscope includes

an electron source that irradiates a sample with an electron beam, and

an annular detector that detects scattered electrons scattered by the sample and outputs ADF data, and

a detector that detects an electron beam transmitted through the sample and outputs DPC data, and

the control device

computes a structural phase distribution of the sample based on the ADF data,

computes a structural phase differential value based on the structural phase distribution, and

performs a computation of removing the structural phase differential value from the DPC data to compute a differential value of an electromagnetic field phase distribution.

7 . The phase analysis system according to claim 6 , wherein

the control device

generates a phase image or a differential phase difference image based on the differential value of the electromagnetic field phase distribution.

8 . The phase analysis system according to claim 6 , wherein

detection conditions of the electron beam by the detector and the annular detector is made to be changeable.

9 . The phase analysis system according to claim 6 , wherein

the structural phase distribution of the sample is obtained using a signal obtained by the annular detector.

10 . The phase analysis system according to claim 6 , wherein

the structural phase distribution of the sample

includes distributions relating to composition, thickness or density of the sample.

11 . The phase analysis system according to claim 6 , further comprising:

a display device including a display screen, wherein

the display device displays, on the display screen,

selection buttons for respectively executing selection of the DPC data and the ADF data,

a computation r executing a computation of the structural phase differential value,

a removal execution button for executing removal of the structural phase differential, and

display buttons for respectively displaying the structural phase differential value and the differential value of the electromagnetic field phase distribution, and

the control device

computes the structural phase distribution, the structural phase differential value, and the differential value of the electromagnetic field phase distribution in response to an operation of the selection buttons, the computation execution button, the removal execution button, and the display buttons, respectively.

12 . A phase analysis system including an electron microscope and a control device for controlling the electron microscope, wherein

the electron microscope includes

an electron source that irradiates a sample with an electron beam,

an energy dispersive X-ray spectrometer that outputs EDX data, and

a detector that detects an electron beam transmitted through the sample and outputs DPC data, and

the control device

computes a structural phase distribution of the sample based on the EDX data,

computes a structural phase differential value based on the structural phase distribution, and

performs a computation of removing the structural phase differential value from the DPC data to compute a differential value of a potential distribution.

13 . The phase analysis system according to claim 12 , wherein

the control device

generates a phase image or a differential phase difference image based on the differential value of the potential distribution.

14 . The phase analysis system according to claim 12 , wherein

the structural phase distribution of the sample is obtained using a signal obtained by the energy dispersive X-ray spectrometer.

15 . The phase analysis system according to claim 12 , wherein

the structural phase distribution of the sample

includes distributions relating to composition, thickness or density of the sample.