IP Library Granted Patent US 12676462
Granted Patent B2
US 12676462 · App. 18/468,071 · Granted Jul 7, 2026

Optical modulation and amplification apparatus, optical module, optical network unit, and optical communication system

Inventors: Guangcan Chen (Wuhan, CN); Yuanbing Cheng (Wuhan, CN); Yanbo Li (Dongguan, CN)
Assignee: Huawei Technologies Co., Ltd.
H01S5/50H01S5/0261H01S5/3407
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12676462
App. No.
18/468,071
Granted
Jul 7, 2026
Kind
B2
Abstract

An optical modulation and amplification apparatus, an optical module, an optical network unit, and an optical communication system are provided. The optical modulation and amplification apparatus includes an electric absorption modulator and a semiconductor optical amplifier. The electric absorption modulator and the semiconductor optical amplifier share a same substrate and a same multi-layer material structure. The multi-layer material structure includes, from bottom to top, at least a first quantum well, an electron blocking layer, a second quantum well, and an upper separate confinement layer. The electric absorption modulator is configured to modulate injection light by using the first quantum well, and the semiconductor optical amplifier is configured to amplify the injection light by using the second quantum well.

Claims (59)

1 . An optical modulation and amplification apparatus comprising:

an electric absorption modulator comprising a first waveguide and a second waveguide that are serially connected in a transmission direction of injection light, wherein the first waveguide and the second waveguide each comprise a ridge waveguide structure; and

a semiconductor optical amplifier electrically isolated from the electric absorption modulator, wherein:

the electric absorption modulator and the semiconductor optical amplifier share a same substrate and use a same multi-layer material structure disposed on the substrate,

the multi-layer material structure comprises, from bottom to top, a first quantum well configured to modulate the injection light, an electron blocking layer, a second quantum well configured to amplify the injection light, and an upper separate confinement layer, wherein the electron blocking layer is configured to block a current applied to the second quantum well from flowing into the first quantum well,

a first difference between an extinction ratio corresponding to a transverse electric (TE) mode and an extinction ratio corresponding to a transverse magnetic (TM) mode in the electric absorption modulator is dependent on a thickness of the upper separate confinement layer and a stress of the first quantum well, and the first difference is less than or equal to a first preset value, and

a second difference between a modal gain corresponding to the TE mode and a modal gain corresponding to the TM mode in the semiconductor optical amplifier is dependent on the thickness of the upper separate confinement layer and a stress of the second quantum well, and the second difference is less than or equal to a second preset value.

2 . The optical modulation and amplification apparatus according to claim 1 , wherein:

a third difference between an optical confinement factor of the TE mode and an optical confinement factor of the TM mode in the first quantum well is dependent on the thickness of the upper separate confinement layer and is less than or equal to a third preset value;

a fourth difference between a material absorption coefficient of the TE mode and a material absorption coefficient of the TM mode in the first quantum well is dependent on the stress of the first quantum well and is less than or equal to a fourth preset value; and

the first difference is dependent on the third difference and the fourth difference.

3 . The optical modulation and amplification apparatus according to claim 1 , wherein:

a fifth difference between an optical confinement factor of the TE mode and an optical confinement factor of the TM mode in the second quantum well is dependent on the thickness of the upper separate confinement layer and is less than or equal to a fifth preset value;

a sixth difference between a material gain of the TE mode and a material gain of the TM mode in the second quantum well is dependent on the stress of the second quantum well and is less than or equal to a sixth preset value; and

the second difference is dependent on the fifth difference and the sixth difference.

4 . The optical modulation and amplification apparatus according to claim 1 , wherein a material refractive index of the first quantum well is greater than a material refractive index of the second quantum well.

5 . The optical modulation and amplification apparatus according to claim 1 , wherein:

the multi-layer material structure comprises a cavity having two sides disposed adjacent to the semiconductor optical amplifier; and

the two sides of the cavity are symmetrical with respect to an axis of the second waveguide.

6 . The optical modulation and amplification apparatus according to claim 1 , wherein:

the multi-layer material structure comprises a cavity disposed on two sides of the electric absorption modulator; and

the cavity is disposed along an axis of the first waveguide.

7 . The optical modulation and amplification apparatus according to claim 6 , wherein the cavity is filled with polyimide or benzocyclobutene.

8 . The optical modulation and amplification apparatus according to claim 1 , wherein a thickness H of the upper separate confinement layer meets 75 nm≤H≤95 nm.

9 . The optical modulation and amplification apparatus according to claim 1 , wherein a length L of the first waveguide meets L≤400 μm.

10 . The optical modulation and amplification apparatus according to claim 1 , wherein widths W of the ridge waveguide structures of both the first waveguide and the second waveguide meet 1.5 μm≤W≤3 μm.

11 . The optical modulation and amplification apparatus according to claim 1 , further comprising:

a controller;

a voltage source having outputs coupled to the electric absorption modulator and a control input coupled to the controller; and

a current source having outputs coupled to the semiconductor optical amplifier and a control input coupled to the controller, wherein the controller is configured to:

modulate the injection light by controlling a voltage provided by the voltage source to the electric absorption modulator, and

modulate the injection light by controlling a current provided by the current source to the semiconductor optical amplifier.

12 . The optical modulation and amplification apparatus according to claim 1 , wherein a groove is disposed between an electrode of the electric absorption modulator and an electrode of the semiconductor optical amplifier to provide electrical isolation between the electric absorption modulator and the semiconductor optical amplifier.

13 . The optical modulation and amplification apparatus according to claim 12 , wherein protons or inert ions are configured to be injected into the groove.

14 . An optical module, comprising:

an electric absorption modulator comprising a first waveguide and a second waveguide that are serially connected in a transmission direction of injection light, wherein the first waveguide and the second waveguide each comprise a ridge waveguide structure;

a semiconductor optical amplifier electrically isolated from the electric absorption modulator, wherein:

the electric absorption modulator and the semiconductor optical amplifier share a same substrate and use a same multi-layer material structure disposed on the substrate,

the multi-layer material structure comprises, from bottom to top, a first quantum well configured to modulate the injection light, an electron blocking layer, a second quantum well configured to amplify the injection light, and an upper separate confinement layer, wherein the electron blocking layer is configured to block a current applied to the second quantum well from flowing into the first quantum well,

a first difference between an extinction ratio corresponding to a transverse electric (TE) mode and an extinction ratio corresponding to a transverse magnetic (TM) mode in the electric absorption modulator is dependent on a thickness of the upper separate confinement layer and a stress of the first quantum well, and the first difference is less than or equal to a first preset value, and

a second difference between a modal gain corresponding to the TE mode and a modal gain corresponding to the TM mode in the semiconductor optical amplifier is dependent on the thickness of the upper separate confinement layer and a stress of the second quantum well, and the second difference is less than or equal to a second preset value; and

a driver configured to drive the electric absorption modulator and the semiconductor optical amplifier to modulate and amplify the injection light.

15 . The optical module according to claim 14 , wherein:

a third difference between an optical confinement factor of the TE mode and an optical confinement factor of the TM mode in the first quantum well is dependent on the thickness of the upper separate confinement layer and is less than or equal to a third preset value;

a fourth difference between a material absorption coefficient of the TE mode and a material absorption coefficient of the TM mode in the first quantum well is dependent on the stress of the first quantum well and is less than or equal to a fourth preset value; and

the first difference is dependent on the third difference and the fourth difference.

16 . The optical module according to claim 14 , wherein:

a fifth difference between an optical confinement factor of the TE mode and an optical confinement factor of the TM mode in the second quantum well is dependent on the thickness of the upper separate confinement layer and is less than or equal to a fifth preset value;

a sixth difference between a material gain of the TE mode and a material gain of the TM mode in the second quantum well is dependent on the stress of the second quantum well and is less than or equal to a sixth preset value; and

the second difference depends on the fifth difference and the sixth difference.

17 . The optical module according to claim 14 , wherein a material refractive index of the first quantum well is greater than a material refractive index of the second quantum well.

18 . The optical module according to claim 14 , wherein:

the multi-layer material structure comprises a cavity having two sides disposed adjacent to the semiconductor optical amplifier; and

the two sides of the cavity are symmetrical with respect to an axis of the second waveguide.

19 . An optical network unit (ONU), wherein the ONU comprises the optical module according to claim 14 and a media access control (MAC) chip, and the optical module is configured to convert an electrical signal output by the MAC chip into an optical signal.

20 . The ONU according to claim 19 , wherein a material refractive index of the first quantum well is greater than a material refractive index of the second quantum well.

21 . A method of operating an optical modulation and amplification apparatus comprising: an electric absorption modulator comprising a first waveguide and a second waveguide that are serially connected in a transmission direction of injection light, wherein the first waveguide and the second waveguide each comprise a ridge waveguide structure; and a semiconductor optical amplifier electrically isolated from the electric absorption modulator, wherein the electric absorption modulator and the semiconductor optical amplifier share a same substrate and use a same multi-layer material structure disposed on the substrate, the multi-layer material structure comprises, from bottom to top, a first quantum well configured to modulate the injection light, an electron blocking layer, a second quantum well configured to amplify the injection light, and an upper separate confinement layer, wherein the electron blocking layer is configured to block a current applied to the second quantum well from flowing into the first quantum well, a first difference between an extinction ratio corresponding to a transverse electric (TE) mode and an extinction ratio corresponding to a transverse magnetic (TM) mode in the electric absorption modulator is dependent on a thickness of the upper separate confinement layer and a stress of the first quantum well, and the first difference is less than or equal to a first preset value, a second difference between a modal gain corresponding to the TE mode and a modal gain corresponding to the TM mode in the semiconductor optical amplifier is dependent on the thickness of the upper separate confinement layer and a stress of the second quantum well, and the second difference is less than or equal to a second preset value, the method comprising:

providing the injection light to the electric absorption modulator; and

amplifying the injection light using the semiconductor optical amplifier.