Substrate support assemblies having internal shaft areas with isolated environments that mitigate oxidation

1 . A substrate support assembly comprising:

a shaft body;

a plate attached to an upper portion of the shaft body;

a plug or cap brazed or welded to a lower portion of the shaft body;

at least one component coupled to the plate and formed through the plug or cap; and

at least one flexible connection that receives the at least one component;

wherein the at least one flexible connection is a spring-like object that enables an adjustable length by expanding or contracting with respect to motion of the substrate support assembly;

wherein the shaft body, the plate and the plug or cap define an internal shaft area having an isolated environment; and

wherein the isolated environment is a vacuum environment.

2 . The substrate support assembly of claim 1 , wherein the plate is an electrostatic chuck.

3 . The substrate support assembly of claim 1 , wherein the plate is a heater plate.

4 . The substrate support assembly of claim 1 , wherein the plate comprises at least one of a metal material or a ceramic material.

5 . The substrate support assembly of claim 1 , wherein the at least one component comprises:

an electrical connector brazed to the plate; and

a thermal couple brazed to the plate; and

wherein the isolated environment reduces braze oxidation.

6 . The substrate support assembly of claim 1 , wherein the internal shaft area is hermetically sealed to maintain the vacuum environment.

7 . The substrate support assembly of claim 1 , wherein the internal shaft area is configured to be connected to a vacuum pump to maintain the vacuum environment.

8 . A substrate support assembly comprising:

a shaft body;

a plate attached to an upper portion of the shaft body;

a plug or cap brazed or welded to a lower portion of the shaft body;

at least one component coupled to the plate and formed through the plug or cap; and

at least one flexible connection that receives the at least one component;

wherein the at least one flexible connection is a spring-like object that enables an adjustable length by expanding or contracting with respect to motion of the substrate support assembly; and

wherein the shaft body, the plate and the plug or cap define an internal shaft area having an isolated environment.

9 . The substrate support assembly of claim 8 , wherein the plate is an electrostatic chuck.

10 . The substrate support assembly of claim 8 , wherein the plate is a heater plate.

11 . The substrate support assembly of claim 8 , wherein the plate comprises at least one of a metal material or a ceramic material.

12 . The substrate support assembly of claim 8 , wherein the internal shaft area is hermetically sealed.

13 . The substrate support assembly of claim 8 , wherein the at least one component comprises:

an electrical connector brazed to the plate; and

a thermal couple brazed to the plate; and

wherein the isolated environment reduces braze oxidation.

14 . The substrate support assembly of claim 13 , further comprising:

a first connection within the internal shaft area connected to the electrical connector; and

a second connection within the internal shaft area connected to the thermal couple.

15 . A processing chamber comprising:

a substrate support assembly, the substrate support assembly comprising:

a shaft body;

a plate attached to an upper portion of the shaft body;

a plug or cap brazed or welded to a lower portion of the shaft body;

at least one component coupled to the plate and formed through the plug or cap; and

at least one flexible connection that receives the at least one component;

wherein the at least one flexible connection is a spring-like object that enables an adjustable length by expanding or contracting with respect to motion of the substrate support assembly;

wherein the shaft body, the plate and the plug or cap define an internal shaft area having an isolated environment; and

wherein the isolated environment is a vacuum environment.

16 . The processing chamber of claim 15 , wherein the plate is an electrostatic chuck.

17 . The processing chamber of claim 15 , wherein the plate comprises at least one of a metal material or a ceramic material.

18 . The processing chamber of claim 15 , wherein the at least one component comprises:

an electrical connector brazed to the plate; and

a thermal couple brazed to the plate; and

wherein the isolated environment reduces braze oxidation.

19 . The processing chamber of claim 15 , wherein the internal shaft area is hermetically sealed to maintain the vacuum environment.

20 . The processing chamber of claim 15 , further comprising:

a vacuum pump operatively coupled to the substrate support assembly; and

a pressure sensor operatively coupled to the vacuum pump and the substrate support assembly, wherein the pressure sensor is to:

obtain a pressure measurement within the internal shaft area;

determine whether the pressure measurement exceeds a threshold pressure measurement; and

in response to determining that the pressure measurement exceeds the threshold pressure measurement, trigger the vacuum pump to pump air out of the internal shaft area.