Alignment method for image sensor fabrication and associated semiconductor device
View Patent ↗The present disclosure provides an alignment method for image sensor fabrication that involve forming a number of set of alignment marks using key process mask layers to improve alignment registration between process mask layers so as to reduce number of alignment transfer improves alignment accuracy between pixel elements. The present disclosure further provides a semiconductor device that includes such alignment mark structures.
1 . A method for fabricating an image sensor, comprising:
providing a wafer having a front side and a backside opposite to the front side, the wafer including at least an active region and a peripheral region adjacent to the active region;
forming a first set of alignment marks in the peripheral region on the front side of a wafer adjacent to the active region;
forming a plurality of photodiodes in the active region on the front side using a photodiode implant mask layer with alignment reference registered to the first set of alignment marks;
forming a second set of alignment marks in the peripheral region on the front side surface using the photodiode implant mask layer;
forming a plurality of first isolation well regions in the active region between adjacent photodiodes using a first isolation implant mask layer with alignment registered to the second set of alignment marks;
forming a third set of alignment marks in the peripheral region on the front side surface using the first isolation implant mask layer; and
forming a plurality of deep trench isolation in the active region on a backside of the wafer using a deep trench isolation mask layer with alignment registered to third set of alignment marks.
2 . The method according to claim 1 , wherein the plurality of photodiodes are grouped into a plurality of pixel cells, and the process after the formation of third set of alignment marks comprises:
forming a plurality of second isolation well regions in the active region using a second isolation implant mask layer with alignment registered to the third set of alignment marks; and
forming a plurality of transfer gates in the active region using a gate mask layer with alignment registered to the third set of alignment.
3 . The method according to claim 1 , wherein the active region includes a pixel array region and the peripheral region is a scribe line region.
4 . The method according to claim 3 , wherein the peripheral region is between an active region and an edge of the wafer.
5 . The method according to claim 1 , the process of forming first set of alignment marks, comprising:
forming a plurality of first shallow trenches on the front side of the wafer in the active region and in the peripheral region; and
filling the plurality of first shallow trench with a dielectric material to form the plurality of shallow trench isolation structures;
wherein the shallow trench isolation structures in the active region electrically isolates photodiodes from a plurality of pixel transistors, and the shallow trench isolation structures in the peripheral region serve as mask alignment reference.
6 . The method according to claim 5 , prior to the formation of the second set of alignment marks further comprising:
depositing a dielectric material forming a dielectric layer on the front side surface; and
etching the dielectric layer to form a first opening on the dielectric layer in the peripheral region corresponding to the second set of alignment marks and a second opening on the dielectric layer in the peripheral region corresponding to the third set of alignment marks;
wherein the second set of alignment marks is formed within the first opening of the dielectric layer, and the third set of alignment marks is formed within the second opening of the dielectric layer.
7 . The method according to claim 6 , the dielectric layer comprising of oxide-based material.
8 . The method according to claim 6 , the process of forming second set of alignment marks, further comprising:
etching a plurality of second shallow trenches in the peripheral region on the front side of the wafer within the first opening through the photodiode implant mask layer.
9 . The method according to claim 8 , the process of forming second set of alignment marks, further comprising:
depositing a conductive material into the plurality of second shallow trenches in the peripheral region to form a plurality of pad trench structures.
10 . The method according to claim 9 , the process of forming a plurality of first isolation well regions, comprising:
forming the first isolation well implant mask layer having a plurality of patterns corresponding to the third set of alignment marks;
disposing the first isolation well implant mask on the front side of the wafer with alignment registered to the second set of alignment marks; and
wherein the first isolation well implant mask is disposed filling the plurality of second shallow trenches within the first opening in the peripheral region.
11 . The method according to claim 1 , wherein the number of alignment transfer of each of the first set of alignment marks, the second set of alignment marks, and the third set of alignment marks being less or equal to two.