IP Library Granted Patent US 12677692
Granted Patent B2
US 12677692 · App. 18/362,128 · Granted Jul 7, 2026

Insulation layer for a semiconductor package

Inventors: Shaopeng Dong (Shanghai, CN); Fen Yu (Shanghai, CN); Weng Khoon Mong (Penang, MY)
Assignee: Sandisk Technologies, Inc.
H10W74/121H10B80/00H10W42/20H10W74/01H10W90/00H10W74/10H10W90/752H10W90/754
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Quick Facts
Patent No.
US 12677692
App. No.
18/362,128
Granted
Jul 7, 2026
Kind
B2
Abstract

A semiconductor package includes an insulation layer provided between a molding compound and an electromagnetic interface (EMI) layer. The insulation layer covers an exposed portion of a bond wire that extends beyond a top surface of the molding compound due to a Z-height reduction of the molding compound. The insulation layer prevents a short from occurring between the bond wire and the EMI layer.

Claims (33)

1 . A semiconductor package, comprising:

a substrate;

a molding compound covering a memory device communicatively coupled to the substrate by a bond wire, at least a portion of the bond wire extending past a top surface of the molding compound;

an insulation layer provided above the molding compound and covering the at least the portion of the bond wire that extends past the top surface of the molding compound; and

an electromagnetic interference (EMI) layer at least partially surrounding the substrate, the molding compound, and the insulation layer.

2 . The semiconductor package of claim 1 , wherein the insulation layer is approximately five micrometers (μm) thick.

3 . The semiconductor package of claim 1 , wherein the insulation layer is provided on an entire top surface of the molding compound.

4 . The semiconductor package of claim 1 , wherein the insulation layer is comprised of ink.

5 . The semiconductor package of claim 1 , wherein the insulation layer prevents a short from occurring between the EMI layer and the at least the portion of the bond wire that extends past the top surface of the molding compound.

6 . The semiconductor package of claim 1 , wherein the insulation layer enables a Z-height of the molding compound to be reduced by approximately forty-five micrometers (μm) or more.

7 . The semiconductor package of claim 1 , wherein the memory device is a NAND die stack.

8 . The semiconductor package of claim 1 , wherein the insulation layer comprises at least one of polyimide, parylene, silicon dioxide, and a polymer.

9 . A method for fabricating a semiconductor package, comprising:

coupling a NAND die stack and an associated bond wire to a surface of a substrate;

covering the NAND die stack and a first portion of the bond wire with a molding compound;

providing an insulation layer on a second portion of the bond wire, the second portion of the bond wire extending above a top surface of the molding compound; and

forming an electromagnetic interference (EMI) layer around at least a portion of the substrate, the insulation layer and the molding compound.

10 . The method of claim 9 , wherein the insulation layer is provided on the second portion of the bond wire using a one or more of a spraying process, a printing process and a sputtering process.

11 . The method of claim 9 , wherein the insulation layer is approximately five micrometers (μm) thick.

12 . The method of claim 9 , wherein the insulation layer is provided on an entire top surface of the molding compound.

13 . The method of claim 9 , wherein the insulation layer is comprised of ink.

14 . The method of claim 9 , wherein the insulation layer prevents a short from occurring between the EMI layer and the second portion of the bond wire.

15 . The method of claim 9 , wherein providing the insulation layer on the second portion of the bond wire comprises forming the insulation layer when the EMI layer is formed.

16 . A semiconductor package, comprising:

a substrate;

a memory device communicatively coupled to the substrate by a communication means;

a molding means covering the memory device and at least a first portion of the communication means;

an insulation means covering a second portion of the communication means that extends above a top surface of the molding means; and

an enclosure means at least partially surrounding the substrate, the molding means, and the insulation means.

17 . The semiconductor package of claim 16 , wherein the memory device is a NAND die stack.

18 . The semiconductor package of claim 16 , wherein the insulation means is approximately five micrometers (μm) thick.

19 . The semiconductor package of claim 16 , wherein the insulation means prevents a short from occurring between the enclosure means and the second portion of the communication means.

20 . The semiconductor package of claim 16 , wherein the insulation means is provided on an entire top surface of the molding means.