Cleaning device for cleaning a nozzle applicator and corresponding cleaning method

1 . A cleaning device for cleaning a nozzle applicator, the cleaning device comprising:

a rinsing agent valve connected to a rinsing agent supply,

a compressed air valve connected to a compressed air supply,

a docking interface for docking the nozzle applicator to be cleaned to the cleaning device, and

a control unit which controls the rinsing agent valve and the compressed air valve of the cleaning device,

wherein the docking interface is connected to the rinsing agent valve and the compressed air valve, and is positionable relative to the nozzle applicator to flush a rinsing agent from the rinsing agent supply into the nozzle applicator through one or more application nozzles of the nozzle applicator against a normal application direction and through a return valve of the nozzle applicator, and

wherein the control unit switches between a first cleaning mode with a rinsing of the application nozzles against the normal application direction wherein the rinsing agent valve is opened and a second cleaning mode with a rinsing of the application nozzles in the normal application direction wherein the rinsing agent valve is closed.

2 . A cleaning device according to claim 1 , wherein

a) the docking interface includes a seal that seals off a nozzle region of the nozzle applicator in a fluid-tight and pressure-tight manner in a docked state, in order to be able to flush the rinsing agent into the nozzle applicator through the application nozzles counter to the normal application direction,

b) the seal is annular and surrounds the nozzle region of the nozzle applicator,

c) in the docked state, the cleaning device and the nozzle applicator enclose between them a flushing-in space which is sealed off from a surrounding environment by the seal.

3 . A cleaning device according to claim 2 , wherein

the cleaning device has a return system for discharging residues of a coating agent, and

a return valve is arranged in the return system of the cleaning device and controls a material flow into the return system of the cleaning device,

the return system and the rinsing agent supply of the cleaning device open into the flushing-in space between the cleaning device and the nozzle applicator.

4 . A nozzle applicator system, comprising:

a nozzle applicator, including:

a nozzle applicator rinsing agent valve connected to a rinsing agent supply,

a return system for discharging residues of a coating agent,

a nozzle applicator return valve arranged in the return system of the nozzle applicator to control a material flow into the return system of the nozzle applicator, and

at least one main valve which controls the coating agent delivery, and

a cleaning device, including:

a cleaning device rinsing agent valve connected to the rinsing agent supply,

a cleaning device return valve arranged in a return system of the cleaning device, and

a docking interface for docking the nozzle applicator to the cleaning device,

wherein the docking interface is positioned to flush a rinsing agent from the rinsing agent supply into the nozzle applicator through one or more application nozzles of the nozzle applicator against a normal application direction.

5 . A system according to claim 4 , further comprising a control unit which controls the following valves:

a) the cleaning device rinsing agent valve of the cleaning device,

b) the cleaning device return valve of the cleaning device,

c) the nozzle applicator rinsing agent valve of the nozzle applicator,

d) the nozzle applicator return valve of the nozzle applicator, and

e) the at least one main valve of the nozzle applicator.

6 . A system according to claim 5 , wherein the control unit in a first cleaning mode controls the cleaning device rinsing agent valve, the cleaning device return valve, the nozzle applicator rinsing agent valve, and the nozzle applicator return valve as follows:

a) the cleaning device rinsing agent valve of the cleaning device is opened continuously or pulsatingly,

b) the cleaning device return valve of the cleaning device is closed,

c) the nozzle applicator rinsing agent valve of the nozzle applicator is closed,

d) the nozzle applicator return valve of the nozzle applicator is opened.

7 . A system according to claim 5 , wherein the control unit in a second cleaning mode controls the cleaning device rinsing agent valve, the cleaning device return valve, the nozzle applicator rinsing agent valve, and the nozzle applicator return valve as follows:

a) the cleaning device rinsing agent valve of the cleaning device is closed,

b) the cleaning device return valve of the cleaning device is opened,

c) the nozzle applicator rinsing agent valve of the nozzle applicator is opened continuously or pulsatingly,

d) the nozzle applicator return valve of the nozzle applicator is closed.

8 . A system according to claim 5 , wherein in a third cleaning mode the control unit controls the cleaning device rinsing agent valve, the cleaning device return valve, the nozzle applicator rinsing agent valve, and the nozzle applicator return valve as follows:

a) the cleaning device rinsing agent valve of the cleaning device is closed,

b) the cleaning device return valve of the cleaning device is closed,

c) the nozzle applicator rinsing agent valve of the nozzle applicator is opened continuously or pulsatingly,

d) the nozzle applicator return valve of the nozzle applicator is opened.

9 . A system according to claim 5 , wherein the control unit in a fourth cleaning mode controls the cleaning device rinsing agent valve, the cleaning device return valve, the nozzle applicator rinsing agent valve, and the nozzle applicator return valve as follows:

a) the cleaning device rinsing agent valve of the cleaning device is opened continuously or pulsatingly,

b) the cleaning device return valve of the cleaning device is opened,

c) the nozzle applicator rinsing agent valve of the nozzle applicator is closed,

d) the nozzle applicator return valve of the nozzle applicator is closed.

10 . A system according to claim 5 , wherein in a fifth cleaning mode the control unit controls the cleaning device rinsing agent valve, the cleaning device return valve, the nozzle applicator rinsing agent valve, and the nozzle applicator return valve as follows:

a) the cleaning device rinsing agent valve of the cleaning device is closed,

b) the cleaning device return valve of the cleaning device is closed,

c) the nozzle applicator rinsing agent valve of the nozzle applicator is closed,

d) the nozzle applicator return valve of the nozzle applicator is opened.

11 . A system according to claim 5 , wherein the control unit in a sixth cleaning mode controls the cleaning device rinsing agent valve, the cleaning device return valve, the nozzle applicator rinsing agent valve, and the nozzle applicator return valve as follows:

a) the cleaning device rinsing agent valve of the cleaning device is closed,

b) the cleaning device return valve of the cleaning device is closed,

c) the nozzle applicator rinsing agent valve of the nozzle applicator is closed,

d) the nozzle applicator return valve of the nozzle applicator is closed.

12 . A system according to claim 5 , wherein the control unit switches between a first cleaning mode with a rinsing of the application nozzles against the normal application direction and a second cleaning mode with a rinsing of the application nozzles in the normal application direction.