IP Library Granted Patent US 12678822
Granted Patent B2
US 12678822 · App. 18/608,317 · Granted Jul 14, 2026

Methods and systems for substrate functionalization

Inventors: William Schulkins (Campbell, CA); Angela Stern (Palo Alto, CA); Florian Oberstrass (Menlo Park, CA)
Assignee: Ultima Genomics, Inc.
B05D1/60B05D1/32B05D1/322C23C16/402C23C16/56
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Quick Facts
Patent No.
US 12678822
App. No.
18/608,317
Granted
Jul 14, 2026
Kind
B2
Abstract

Provided herein are systems and methods for functionalizing a substrate. The method may comprise providing a substrate surface, wherein the substrate surface comprises a plurality of individually addressable locations, and exposing the substrate surface to a dose of organosilane vapor to generate a plurality of organosilane-functionalized locations on the substrate surface, wherein the plurality of organosilane-functionalized locations corresponds to at least a subset of the plurality of individually addressable locations. The dose of organosilane vapor may be provided at relatively low dose, in an example, at most about 1×10 24 molecules per m 2 .

Claims (17)

1 . A method of generating an organosilane-functionalized substrate, comprising:

(a) providing a substrate; and

(b) exposing said substrate to a plurality of doses of organosilane vapor to generate said organosilane-functionalized substrate, wherein a dose of said plurality of doses is at most 1×10 24 molecules per square meter (m 2 ) of a surface of said substrate wherein exposing said substrate to said plurality of doses of organosilane vapor provide a layer of organosilane functionalization with an average thickness of at least about 1.2 nanometers and a standard deviation of thickness measurements of at most about 1.0 nanometers.

2 . The method of claim 1 , wherein said plurality of doses comprises at most five doses.

3 . The method of claim 1 , wherein said plurality of doses comprises at least four doses.

4 . The method of claim 1 , wherein said dose of said plurality of doses is at least 1×10 20 molecules per m 2 of said surface of said substrate.

5 . The method of claim 1 , further comprising, (i) prior to (a) depositing a resist on said substrate; and (ii) subsequent to (b), removing said resist from said substrate to generate a patterned organosilane-functionalized substrate.

6 . The method of claim 1 , wherein in (b), said exposing is performed at a predetermined atmospheric pressure from about 5 millitorr (mTorr) to about 50 mTorr.

7 . The method of claim 6 , wherein said predetermined atmospheric pressure is about 25 mTorr.

8 . The method of claim 1 , further comprising immobilizing a bead comprising a nucleic acid molecule adjacent to said organosilane-functionalized substrate, wherein said nucleic acid molecule is coupled to the bead.

9 . The method of claim 8 , wherein said bead is immobilized to said organosilane-functionalized substrate via an electrostatic interaction between a positive charge of said organosilane-functionalized substrate and a negative charge of said bead or a constituent thereof.

10 . The method of claim 8 , further comprising immobilizing a plurality of beads to said organo-functionalized substrate, wherein an average bead diameter of said plurality of beads is at least about 0.5 microns.

11 . The method of claim 1 , wherein said organosilane-functionalized substrate comprises aminopropyltrimethoxysilane (APTMS).

12 . The method of claim 1 , wherein each dose of said plurality of doses is at most 1×10 24 molecules per m 2 of said surface of said substrate.

13 . The method of claim 1 , wherein said organosilane-functionalized substrate is patterned.

14 . The method of claim 1 , further comprising indexing a plurality of locations on said organosilane-functionalized substrate.

15 . The method of claim 14 , wherein said indexing comprises immobilizing a plurality of beads at said plurality of locations.