Method for manufacturing rare earth magnet
According to the present invention, a method for manufacturing a rare earth magnet that is capable of manufacturing a high-performance rare earth magnet with stable quality in large amount by the grain boundary diffusion method utilizing a film formed by the physical vapor phase deposition method is provided.
1 . A method for manufacturing a rare earth magnet, comprising a grain boundary diffusion process, the method comprising:
forming at least one kind of a film selected from an R 2 film, an R 2 -M alloy film, and a multilayer film of R 2 and M by a physical vapor phase deposition method, on plural sintered articles each having a first surface and a second surface on an opposite side to the first surface, each comprising an R 1 —Fe—B based composition; and then allowing R 2 or R 2 and M to be absorbed by the sintered articles through a heat treatment,
wherein:
the plural sintered articles are disposed side by side with a jig in such a manner that the first surfaces of the plural sintered articles are along a plane in parallel to a vertical direction or a horizontal direction,
R 2 represents at least one kind of an element selected from rare earth elements, and is required to be one kind or two kinds of Tb and Dy, M represents at least one kind of an element selected from the group consisting of Cu, Al, Co, Fe, Mn, Ni, Sn, and Si, and R 1 represents at least one kind of an element selected from rare earth elements, and is required to be one kind or two kinds of Pr and Nd,
the grain boundary diffusion process comprises:
a first forming of the film on the first surface of the plural sintered articles disposed side by side with the jig in an inert gas atmosphere, in a first film forming treatment chamber having provided therein a target containing R 2 provided by disposing on a side of the first surfaces of the plural sintered articles;
a second forming of the film on the second surface of the plural sintered articles disposed side by side with the jig in an inert gas atmosphere, without reversing the plural sintered articles, in a second film forming treatment chamber, which is juxtaposed with the first film forming treatment chamber, having provided therein a target containing R 2 provided by disposing on a side of the second surfaces of the plural sintered articles; and
a moving of the plural sintered articles disposed side by side with the jig in a horizontal direction or a vertical direction between the first film forming treatment chamber and the second film forming treatment chamber,
the jig contains at least one kind of a material selected from the group consisting of aluminum, an aluminum alloy, copper, a copper alloy, iron, an iron alloy, titanium, a titanium alloy, niobium, a niobium alloy, tungsten, a tungsten alloy, molybdenum, and a molybdenum alloy;
the jig has a holding part formed to have points, between which the sintered article is held;
the jig contains plural lateral frames;
the sintered article is disposed between the adjacent lateral frames;
the holding part comprises a beam;
the beam is elastically deformed in such a manner that one point of the points is moved upward, whereas the other point of the points is moved downward, with the lateral frame as the center;
the lateral frames can be elastically deformed; and
the points of the holding part each have a moving distance within elastic limit that is twice or more a dimensional tolerance range of a dimension of the sintered article in a holding direction.
2 . The method for manufacturing a rare earth magnet according to claim 1 , wherein the plural first film forming treatment chambers and the plural second film forming treatment chambers each are disposed in series, and the film is continuously formed in an inert gas atmosphere without exposing the plural sintered articles to the air.
3 . A method for manufacturing a rare earth magnet, comprising a grain boundary diffusion process, the method comprising:
forming at least one kind of a film selected from an R 2 film, an R 2 -M alloy film, and a multilayer film of R 2 and M by a physical vapor phase deposition method, on plural sintered articles each having a first surface and a second surface on an opposite side to the first surface, each containing an R 1 —Fe—B based composition; and then allowing R 2 or R 2 and M to be absorbed by the sintered articles through a heat treatment,
wherein:
the plural sintered articles are disposed side by side with a jig in such a manner that the first surfaces of the plural sintered articles are along a plane in parallel to a vertical direction or a horizontal direction,
R 2 represents at least one kind of an element selected from rare earth elements, and is required to be one kind or two kinds of Tb and Dy, M represents at least one kind of an element selected from the group consisting of Cu, Al, Co, Fe, Mn, Ni, Sn, and Si, and R 1 represents at least one kind of an element selected from rare earth elements, and is required to be one kind or two kinds of Pr and Nd,
the grain boundary diffusion process comprises:
forming the film simultaneously on the first surface and the second surface of the plural sintered articles disposed side by side with the jig in an inert gas atmosphere, in a duplex film forming treatment chamber having provided therein a target containing R 2 provided by disposing on a side of the first surfaces of the plural sintered articles and a target containing R 2 provided by disposing on a side of the second surfaces of the plural sintered articles,
the jig contains at least one kind of a material selected from the group consisting of aluminum, an aluminum alloy, copper, a copper alloy, iron, an iron alloy, titanium, a titanium alloy, niobium, a niobium alloy, tungsten, a tungsten alloy, molybdenum, and a molybdenum alloy;
the jig has a holding part formed to have points, between which the sintered article is held;
the jig contains plural lateral frames;
the sintered article is disposed between the adjacent lateral frames;
the holding part comprises a beam;
the beam is elastically deformed in such a manner that one point of the points is moved upward, whereas the other point of the points is moved downward, with the lateral frame as the center;
the lateral frames can be elastically deformed; and
the points of the holding part each have a moving distance within elastic limit that is twice or more a dimensional tolerance range of a dimension of the sintered article in a holding direction.
4 . The method for manufacturing a rare earth magnet according to claim 3 , wherein plural duplex film forming treatment chambers are disposed in series, and the film is continuously formed in an inert gas atmosphere without exposing the plural sintered articles to the air.
5 . The method for manufacturing a rare earth magnet according to claim 1 , wherein the holding part is coated with at least one kind of a material selected from an organic material and ceramics, except for a contact point to the sintered article and an electric connecting point for grounding.
6 . The method for manufacturing a rare earth magnet according to claim 1 , wherein
the grain boundary diffusion process comprises at least one selected from the group consisting of:
vacuuming an atmosphere of the plural sintered articles in a preparation chamber, before placing the plural sintered articles in the film forming treatment chamber;
eliminating an adsorbed gas from the plural sintered articles in a baking treatment chamber, before placing the plural sintered articles in the film forming treatment chamber;
cleaning the surfaces of the plural sintered articles in a reverse sputtering chamber, before placing the plural sintered articles in the film forming treatment chamber;
heat-treating the plural sintered articles in a heat treatment chamber, after forming the film on the surfaces of the plural sintered articles;
cooling the plural sintered articles in a cooling chamber after the heat treatment; and
an air release of allowing an atmosphere of the plural sintered articles to be an atmospheric pressure, for releasing the plural sintered articles to air in a delivery chamber,
wherein the film forming treatment chamber is continuously connected to one or two or more of a chamber selected from the group consisting of the preparation chamber, the baking treatment chamber, the heat treatment chamber, the cooling chamber, and the delivery chamber.
7 . The method for manufacturing a rare earth magnet according to claim 1 , wherein
the grain boundary diffusion process further comprises, after forming the film and before the heat treatment, a weld suppressing of forming a film of at least one kind of a compound selected from an oxide, a fluoride, and a oxyfluoride of R 3 by a physical vapor phase deposition method, on one surface or both surfaces of the first surface and the second surface of the plural sintered articles disposed side by side with the jig,
the weld suppressing forming a film of the compound on one surface or both surfaces of the first surface and the second surface of the plural sintered articles disposed side by side with the jig in at least one kind of a gas atmosphere selected from the group consisting of argon, oxygen, and nitrogen, in a weld suppressing treatment chamber having provided therein one target or both targets of a target containing at least one kind of a material selected from the group consisting of a metal of the R 3 , an alloy of the R 3 , an oxide of the R 3 , a fluoride of the R 3 , and an oxyfluoride of the R 3 , disposed on a side of the first surfaces of the plural sintered articles, and a target containing at least one kind of a material selected from the group consisting of a metal of the R 3 , an alloy of the R 3 , an oxide of the R 3 , a fluoride of the R 3 , and an oxyfluoride of the R 3 , disposed on a side of the second surfaces of the plural sintered articles, and
R 3 represents one kind or two or more kinds of an element selected from rare earth elements.
8 . The method for manufacturing a rare earth magnet according to claim 7 , wherein the weld suppressing comprises a first weld suppressing of forming a film of the compound by a physical vapor phase deposition method, on the first surface of the plural sintered articles disposed side by side with the jig, in a first weld suppressing treatment chamber having provided therein the target disposed on a side of the first surfaces of the plural sintered articles, and a second weld suppressing of forming a film of the compound by a physical vapor phase deposition method, on the second surface of the plural sintered articles disposed side by side with the jig, in a second weld suppressing treatment chamber having provided therein the target disposed on a side of the second surfaces of the plural sintered articles.
9 . The method for manufacturing a rare earth magnet according to claim 7 , wherein the weld suppressing comprises forming a film of the compound by a physical vapor phase deposition method, simultaneously on the first surface and the second surface of the plural sintered articles disposed side by side with the jig, in a duplex weld suppressing treatment chamber having provided therein the target disposed on a side of the first surfaces of the plural sintered articles and the target disposed on a side of the second surfaces of the plural sintered articles.
10 . The method for manufacturing a rare earth magnet according to claim 1 , wherein the physical vapor phase deposition method is a sputtering method.
11 . The method for manufacturing a rare earth magnet according to claim 7 , wherein the physical vapor phase deposition method in the weld suppressing is an RF sputtering method.