IP Library Granted Patent US 12678971
Granted Patent B2
US 12678971 · App. 18/377,297 · Granted Jul 14, 2026

System and method for transferring substrate

Inventor: Myeong Gyu Shin (Cheonan-si, KR)
Assignee: SEMES CO., LTD.
B25J11/0095B25J15/0004
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Quick Facts
Patent No.
US 12678971
App. No.
18/377,297
Granted
Jul 14, 2026
Kind
B2
Abstract

The present invention relates to a substrate transfer system and method enabling a direction of a substrate or the order of substrates to be maintained even when the substrate is swing-moved and transferred by a robot transportation device, in particularly, the substrate transfer system may include: a robot transportation device that transfers at least one substrate using at least one swing-movable transport arm; and a compensatory rotation device that is mounted on the transport arm of the robot transportation device and selectively supports the substrate to thus enable compensatory rotation thereof so that, even when the transport arm has a swing motion while the substrate is transferred by the robot transportation device, a direction of the substrate or the order of the substrates can be maintained.

Claims (83)

1 . A substrate transfer system, comprising:

a robot transportation device that transfers at least one substrate using at least one swing-movable transport arm; and

a compensatory rotation device that is mounted on the at least one swing-movable transport arm of the robot transportation device and is positioned at selectively one of a non-supporting state in which the compensatory rotation device does not contact the at least one substrate and a supporting state in which the compensatory rotation device contacts the at least one substrate,

wherein in the supporting state, the compensatory rotation device supports the at least one substrate to thus enable compensatory rotation thereof so that, even when the at least one swing-movable transport arm has a swing motion while the at least one substrate is transferred by the robot transportation device, a direction of the at least one substrate or an order of the at least one substrate is maintained.

2 . The system according to claim 1 ,

wherein the compensatory rotation device includes:

a rotational swing deck that supports the at least one substrate and is rotatably mounted in the supporting state;

a swing deck lifting device that moves up and down the rotational swing deck such that the swing deck lifting device places the rotational swing deck at a first height lower than the at least one swing-movable transport arm in the non-supporting state, and places the rotational swing deck at a second height higher than the at least one swing-movable transport arm in the supporting state; and

a swing deck rotating device that rotates the rotational swing deck lifted to the second height.

3 . The system according to claim 2 ,

wherein the rotational swing deck includes:

a main body connected to the swing deck lifting device or the swing deck rotating device;

an extending part installed to be extendable from the main body; and

an extension device to extend the extending part.

4 . The system according to claim 3 ,

wherein the extending part is a foldable rotary arm to be folded to and unfolded from the main body.

5 . The system according to claim 4 ,

wherein the foldable rotary arm includes:

a first rotating arm to be unfolded in a first direction based on the main body; and

a second rotating arm to be unfolded in a second direction, opposite to the first direction, based on the main body.

6 . The system according to claim 5 ,

wherein a first support pin is formed on the main body to support the at least one substrate at three points or more;

a second support pin is formed on the first rotating arm; and

a third support pin is formed on the second rotating arm.

7 . The system according to claim 1 , further comprising:

a control unit that applies a swing motion control signal to the robot transportation device and a compensatory rotation control signal to the compensatory rotation device,

wherein, when the robot transportation device is in the swing motion, the control unit controls a compensatory rotation rate of the compensatory rotation device based on a swing motion rate of the robot transportation device so as to constantly maintain the direction of the at least one substrate, thereby preventing rotational shock applied to the at least one substrate.

8 . The system according to claim 7 ,

wherein, when the robot transportation device is in the swing motion, the control unit enables the compensatory rotation device to reversely rotate the at least one substrate by a first angle if the at least one substrate normally rotates at the first angle by the robot transportation device.

9 . The system according to claim 1 ,

wherein the compensatory rotation device includes:

a roll wheel which is mounted on the at least one swing-movable transport arm of the robot transportation device, and is in rolling contact with a bottom surface of the at least one substrate; and

a wheel rotating device which rotates the roll wheel such that the roll wheel can rotate the at least one substrate in a self-rotational direction of the at least one substrate.

10 . The system according to claim 9 ,

wherein at least three or more roll wheels are arranged at equal angles based on a center of the at least one substrate.

11 . The system according to claim 3 ,

wherein the extending part is a sliding type forward/backward arm that is stored in and then protrudes from the main body.

12 . The system according to claim 11 ,

wherein the sliding type forward/backward arm includes:

a first forward/backward arm to contract and stretch in a first direction based on the main body; and

a second forward/backward arm to contact and stretch in a second direction, opposite to the first direction, based on the main body.

13 . A substrate transfer method, comprising:

(a) transferring at least one substrate using at least one swing-movable transport arm by a robot transportation device; and

(b) during a time when the at least one substrate is transferred by the robot transportation device, selectively positioning a compensatory rotation device in one of a non-supporting state in which the compensatory rotation device does not contact the at least one substrate and a supporting state in which the compensatory rotation device contacts the at least one substrate, wherein in the supporting state, the compensatory rotation device supports the at least one substrate and enables compensatory rotation thereof so that, even when the at least one swing-movable transport arm is in a swing motion, a direction of the at least one substrate or an order of the at least one substrates is maintained.

14 . The method according to claim 13 , wherein the step (b) includes:

(b-1) moving the compensatory rotation device upward from a first height lower than the at least one swing-movable transport arm to a second height higher than the at least one swing-movable transport arm to thus support the at least one substrate;

(b-2) rotating the at least one substrate by the compensatory rotation device; and

(b-3) moving the compensatory rotation device downward from the second height higher than the at least one swing-movable transport arm to the first height lower than the at least one swing-movable transport arm to thus be spaced from the at least one substrate.

15 . The method according to claim 14 ,

wherein, before the step (b-1), the step (b) further includes (b-4) extending an extending part from a main body by the compensatory rotation device.

16 . The method according to claim 13 ,

wherein, in the step (b),

when the robot transportation device is in the swing motion, a compensatory rotation rate of the compensatory rotation device is controlled based on a swing motion rate of the robot transportation device so as to maintain the direction of the at least one substrate, thereby preventing rotational shock applied to the at least one substrate.

17 . The method according to claim 16 ,

wherein, in the step (b),

when the robot transportation device is in the swing motion, the compensatory rotation device reversely rotates the at least one substrate by a first angle if the at least one substrate normally rotates at the first angle by the robot transportation device.

18 . The method according to claim 13 ,

wherein, in the step (b),

the compensatory rotation device rotates a roll wheel in rolling contact with a bottom surface of the at least one substrate to a self-rotational direction of the at least one substrate, thereby enabling compensatory rotation of the at least one substrate.

19 . The method according to claim 13 , further comprising:

(c) transferring the compensation-rotated substrate to other apparatus by the robot transportation device while maintaining the direction of the at least one substrate or an order of the at least one substrates.

20 . A substrate transfer system, comprising:

a robot transportation device that transfers at least one substrate using at least one swing-movable transport arm;

a compensatory rotation device that is mounted on the at least one swing-movable transport arm of the robot transportation device, and selectively supports the at least one substrate and enables compensatory rotation thereof so that, even when the at least one swing-movable transport arm is in a swing motion while the at least one substrate is transferred by the robot transportation device, a direction of the at least one substrate or an order of the at least one substrate is maintained; and

a control unit that applies a swing motion control signal to the robot transportation device and also a compensatory rotation control signal to the compensatory rotation device,

wherein the compensatory rotation device includes:

a rotational swing deck that supports the at least one substrate and is rotatably mounted;

a swing deck lifting device that moves up and down the rotational swing deck from a first height lower than the at least one swing-movable transport arm to a second height higher than the at least one swing-movable transport arm;

a swing deck rotating device that rotates the rotational swing deck lifted to the second height;

a roll wheel that is mounted on the at least one swing-movable transport arm of the robot transportation device and is in rolling contact with a bottom surface of the at least one substrate; and

a wheel rotating device that rotates the roll wheel so that the roll wheel can rotate the at least one substrate in a self-rotational direction of the at least one substrate,

wherein the rotational swing deck includes:

a main body connected to the swing deck lifting device or the swing deck rotating device;

an extending part mounted to be extendable from the main body; and

an extension device to extend the extending part,

wherein the extending part is a foldable rotary arm to be folded to and then unfolded from the main body,

wherein the foldable rotary arm includes:

a first rotating arm that is unfolded in a first direction based on the main body; and

a second rotating arm that is unfolded to a second direction, opposite to the first direction, based on the main body,

wherein a first support pin is formed on the main body,

a second support pin is formed on the first rotating arm,

a third support pin is formed on the second rotating arm, so as to support the at least one substrate at three points or more, and

wherein the control unit controls a compensatory rotation rate of the compensatory rotation device based on a swing motion rate of the robot transportation device so that, when the robot transportation device is in the swing motion, the direction of the at least one substrate is constantly maintained to thus prevent rotational shock applied to the at least one substrate.