Method of processing substrate
In a method of processing a substrate, a test film having a first area and a second area adjacent to the first area is provided. A first jet value is obtained from a first test pattern formed by jetting a chemical solution through a plurality of nozzles onto the first area of the test film. The chemical solution is jetted onto a first substrate based on the first jet value. A second jet value is obtained from a second test pattern formed by jetting the chemical solution through the plurality of nozzles onto the second area of the test film. The chemical solution is jetted onto a second substrate based on the second jet value.
1 . A method of processing a substrate, comprising:
providing a test film including a first area and a second area adjacent to the first area;
obtaining a first jet value from a first test pattern formed by jetting a chemical solution through a plurality of nozzles onto the first area of the test film;
jetting the chemical solution onto a first substrate based on the first jet value;
obtaining a second jet value from a second test pattern formed by jetting the chemical solution through the plurality of nozzles onto the second area of the test film; and
jetting the chemical solution onto a second substrate based on the second jet value.
2 . The method of claim 1 , wherein the plurality of nozzles comprises first and second sets of jetting nozzles arranged along first and second lines, respectively, parallel to each other.
3 . The method of claim 2 , wherein the first and second sets of jetting nozzles jet the chemical solution in a line on each of the first and second areas, respectively.
4 . The method of claim 1 , wherein each of the first and second jet values is obtained via an area camera or a line scan camera.
5 . The method of claim 1 , further comprising: providing a reference test film including a first reference area and a second reference area adjacent to the first reference area; obtaining first and second reference jet values from first and second reference test patterns formed by jetting the chemical solution onto the first and second reference areas of the reference test film through the plurality of nozzles, respectively; and obtaining a first calibration value by calibrating the second reference jet value based on the first reference jet value.
6 . The method of claim 5 , wherein the jetting of the chemical solution onto the second substrate comprises jetting the chemical solution onto the second substrate based on the second jet value calibrated based on the first calibration value.
7 . The method of claim 5 , wherein the test film and the reference test film are the same single film substrate, and wherein the first and second areas and the first and second reference areas are coplanar with each other.
8 . The method of claim 5 , wherein the first and second reference areas on the reference test film are provided in areas corresponding to the first and second areas on the test film, respectively.
9 . The method of claim 5 , wherein each of the first and second reference areas has a width within a range of 5 mm to 15 mm.
10 . The method of claim 5 , wherein the jetting of the chemical solution onto the first substrate comprises calibrating a jet direction of each of the plurality of nozzles using the first jet value calibrated based on the first reference jet value to jet the chemical solution; and the jetting of the chemical solution onto the second substrate comprises calibrating the jet direction of each of the plurality of nozzles using the second jet value calibrated based on the first calibration value to jet the chemical solution onto the second substrate.
11 . The method of claim 5 , wherein the reference test film further comprises a third reference area adjacent to the second reference area, and the test film further comprises a third area adjacent to the second area.
12 . The method of claim 11 , further comprising: obtaining a third reference jet value from third reference test patterns formed by jetting the chemical solution through the plurality of nozzles onto the third reference area of the reference test film; and obtaining a second calibration value by calibrating the third reference jet value based on the first reference jet value.
13 . The method of claim 12 , further comprising: obtaining a third jet value from a third test pattern formed by jetting the chemical solution through the plurality of nozzles on the third area of the test film; and jetting the chemical solution onto a third substrate using the third jet value calibrated based on the second calibration value.
14 . A method of processing a substrate, comprising:
obtaining a first jet value from a first test pattern formed by jetting a chemical solution through a plurality of nozzles onto the first area of the test film;
jetting the chemical solution onto a first substrate through calibrating a jet direction of the plurality of nozzles based on the first jet value;
obtaining a second jet value from a second test pattern formed by jetting the chemical solution through the plurality of nozzles onto a second area adjacent to the first area of the test film; and
jetting the chemical solution onto a second substrate through calibrating the jet direction of the plurality of nozzles based on the second jet value.
15 . The method of claim 14 , further comprising: obtaining first and second reference jet values from first and second reference test patterns formed by jetting the chemical solution onto first and second reference areas of the reference test film through the plurality of nozzles, respectively; and obtaining a first offset value of the first and second reference jet values.
16 . The method of claim 15 , wherein the jetting of the chemical solution onto the second substrate further comprises calibrating the jet direction of the plurality of nozzles based on the second jet value calibrated on a basis of the first offset value.
17 . The method of claim 14 , wherein the plurality of nozzles comprises first and second sets of jetting nozzles arranged along first and second lines, respectively, parallel to each other.
18 . The method of claim 17 , wherein the first and second sets of jetting nozzles jet the chemical solution in a line on the first and second reference areas and on the first and second areas, respectively.
19 . The method of claim 14 , wherein each of the first and second areas has a width within a range of 5 mm to 15 mm.
20 . A method of processing a substrate, comprising:
providing a first test film including first to third reference areas;
obtaining first to third reference jet values from first to third reference test patterns formed by jetting a chemical solution through a plurality of nozzles onto the first to third reference areas of the first test film, respectively;
calibrating the second and third reference jet values based on the first reference jet value to obtain first and second calibration values, respectively;
providing a second test film including first to third areas;
obtaining a first jet value from a first test pattern formed by jetting the chemical solution through the plurality of nozzles onto the first area of the second test film;
jetting the chemical solution onto a first substrate through calibrating a jet direction of each of the plurality of nozzles using the first jet value calibrated based on the first reference jet value;
obtaining a second jet value from a second test pattern formed by jetting the chemical solution through the plurality of nozzles onto the second area of the second test film;
jetting the chemical solution onto a second substrate through calibrating the jet direction of each of the plurality of nozzles using the second jet value calibrated based on the first calibration value;
obtaining a third jet value from a third test pattern formed by jetting the chemical solution through the plurality of nozzles onto the third area of the second test film; and
jetting the chemical solution onto a third substrate through calibrating the jet direction of each of the plurality of nozzles using the third jet value calibrated based on the second calibration value.