Bonded substrate
Electrical insulating properties between adjacent copper plates are improved while a defect of a bonded substrate which is caused by concentration of stress to end portions of the copper plates is prevented. A bonded substrate includes a silicon nitride ceramic substrate, a copper plate, and a bonding layer. The copper plate and the bonding layer are disposed on the silicon nitride ceramic substrate. The bonding layer bonds the copper plate to the silicon nitride ceramic substrate. The bonding layer includes: an interplate portion between the silicon nitride ceramic substrate and the copper plate; and a protruding portion protruding from between the silicon nitride ceramic substrate and the copper plate. Exposure of the silicon nitride ceramic substrate is prevented at a position where the protruding portion is disposed.
1 . A bonded substrate, comprising:
a silicon nitride ceramic substrate;
a copper plate disposed on the silicon nitride ceramic substrate; and
a bonding layer having a thickness greater than or equal to 0.1 μm and less than or equal to 3 μm disposed on the silicon nitride ceramic substrate, bonding the copper plate to the silicon nitride ceramic substrate,
the bonding layer including:
an interplate portion between the silicon nitride ceramic substrate and the copper plate; and
a protruding portion protruding from between the silicon nitride ceramic substrate and the copper plate,
wherein
the bonding layer covers the silicon nitride ceramic substrate to prevent exposure of the silicon nitride ceramic substrate at a position where the protruding portion is disposed,
an upper surface of the bonding layer has an arithmetic average roughness Ra less than or equal to 0.7 μm, and a maximum height Rz less than 5 μm, and
the protruding portion contains at least one of titanium and zirconium, does not contain silver, and does not contain copper.
2 . The bonded substrate according to claim 1 ,
wherein the protruding portion includes no hole exposing the silicon nitride ceramic substrate.