Convective substrate cooling with minimal pressure change
Embodiments of the present disclosure generally relate to a reflector plate assembly. The reflector plate assembly includes a reflector plate and a baffle. The reflector plate includes a gas conduit, a plurality of gas passages, a plurality of lift pin holes, and a gas inlet. The gas conduit includes a first opening on a front side of the reflector plate and a second opening on a backside of the reflector plate adjacent to the gas conduit. The baffle is attached at a first end to a support base of an edge ring. The baffle is attached at a second end to the backside of the reflector plate. The baffle forms an opening in the backside of the reflector plate to the gas conduit.
1 . A reflector plate assembly, comprising:
a reflector plate, the reflector plate comprising:
a gas conduit;
a plurality of gas passages having a first opening on a front side of the reflector plate and a second opening on a backside of the reflector plate adjacent to the gas conduit; and
a gas inlet; and
a baffle, wherein the baffle is attached at a first end to a support base of an edge ring, and attached at a second end to the backside of the reflector plate and forming an opening in the backside of the reflector plate to the gas conduit.
2 . The reflector plate assembly of claim 1 , wherein the baffle has a first volume greater than or equal to a second volume, the second volume being a distance between from a lift pin to a backside of a substrate multiplied by an area of the backside of the substrate.
3 . The reflector plate assembly of claim 1 , wherein the plurality of gas passages comprise a valve.
4 . The reflector plate assembly of claim 3 , wherein the valve is a needle valve, a dynamic valve, or a mass flow controller (MFC) valve.
5 . The reflector plate assembly of claim 1 , wherein the baffle comprises steel or teflon.
6 . The reflector plate assembly of claim 1 , wherein a gas passage density increases as a distance from a center of the reflector plate increases.
7 . A processing chamber, comprising:
an edge ring for supporting a substrate in the processing chamber, the edge ring comprising a support base;
a heating apparatus spaced apart from a front side of a substrate;
a reflector plate assembly spaced apart from a backside of a substrate, the reflector plate assembly comprising:
a reflector plate, the reflector plate comprising:
a gas conduit;
a plurality of gas passages having a first opening on a front side of the reflector plate and a second opening on a backside of the reflector plate adjacent to the gas conduit; and
a gas inlet; and
a baffle, wherein the baffle is attached at a first end to a support base of an edge ring, and attached at a second end to the backside of the reflector plate and forming an opening in the backside of the reflector plate to the gas conduit.
8 . The reflector plate assembly of claim 7 , wherein the baffle has a first volume greater than or equal to a second volume, the second volume being a distance between from a lift pin to a backside of a substrate multiplied by an area of the backside of the substrate.
9 . The reflector plate assembly of claim 7 , wherein the plurality of gas passages comprise a valve.
10 . The reflector plate assembly of claim 9 , wherein the valve is a needle valve, a dynamic valve, or a mass flow controller (MFC) valve.
11 . The reflector plate assembly of claim 7 , wherein the baffle comprises steel or teflon.
12 . The reflector plate assembly of claim 7 , wherein a gas passage density increases as a distance from a center of the reflector plate increases.
13 . A controller storing instructions that when executed by a computer processor, cause the controller to perform operations of:
actuating components of a processing chamber between a processing position, a post-cooling position, and a transfer position, the processing chamber including:
an edge ring for supporting a substrate in the processing chamber, the edge ring comprising a support base;
a heating apparatus spaced apart from a front side of a substrate;
a reflector plate assembly spaced apart from a backside of a substrate, the reflector plate assembly comprising:
a reflector plate, the reflector plate comprising:
a gas conduit;
a plurality of gas passages having a first opening on a front side of the reflector plate and a second opening on a backside of the reflector plate adjacent to the gas conduit; and
a gas inlet; and
a baffle, wherein the baffle is attached at a first end to a support base of an edge ring, and attached at a second end to the backside of the reflector plate and forming an opening in the backside of the reflector plate to the gas conduit;
adjusting an actuator and gas flow controls based off one or more of sensor reading, a system model, and stored readings and calculations; and
synchronizing a rate of expansion or contraction of the baffle with a flow of gas to or from the baffle.
14 . The controller of claim 13 , wherein the baffle has a first volume greater than or equal to a second volume, the second volume being a distance between from a lift pin to a backside of a substrate multiplied by an area of the backside of the substrate.
15 . The controller of claim 13 , wherein the plurality of gas passages comprise a valve.
16 . The controller of claim 15 , wherein the valve is a needle valve, a dynamic valve, or a mass flow controller (MFC) valve.
17 . The controller of claim 15 , wherein the controller may adjust a flow rate of the valve.
18 . The controller of claim 13 , wherein the baffle comprises steel or teflon.
19 . The controller of claim 13 , wherein a gas passage density increases as a distance from a center of the reflector plate increases.
20 . The controller of claim 13 , wherein the controller may include a machine-learning algorithm.