IP Library Granted Patent US 12,680,762
Granted Patent B2
US 12,680,762 · App. 18/229,986 · Granted Jul 14, 2026

Vapor chamber supporting capillary structure

Inventors: Abbas Ali (New Taipei City, TW); Jheng-Yan Wang (New Taipei City, TW); Shao-Chien Lu (New Taipei City, TW)
Assignee: NIDEC CHAUN-CHOUNG TECHNOLOGY CORPORATION
F28D15/04
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,680,762
App. No.
18/229,986
Granted
Jul 14, 2026
Kind
B2
Abstract

A vapor chamber supporting capillary structure includes a first plate, a second plate and a capillary layer. The capillary layer is clamped between the first plate and the second plate and includes a first capillary portion and a second capillary portion. The second capillary portion is connected to the first capillary portion and extends outward, and a notch is formed at any one side of the second capillary portion. The notch is formed along an extension direction of the second capillary portion. Furthermore, the first plate includes a plurality of capillary supporting structures and a plurality of plate supporting structures formed thereon, and the capillary supporting structures are corresponding to the first capillary portion and the second capillary portion, and the plate supporting structures are corresponding to the notch. Accordingly, a greater steam space may be obtained.

Claims (12)

1 . A vapor chamber supporting capillary structure, comprising:

a first plate, comprising a first inner surface and a first sealing edge surrounding the first inner surface;

a second plate, comprising a second inner surface facing the first inner surface and a second sealing edge surrounding the second inner surface, covering the first plate with each other, and a chamber defined between the first plate and the second plate, wherein the first sealing edge and the second sealing edge are attached to each other to seal the chamber, and the first sealing edge or the second sealing edge has a filling slot in order to facilitate filling of welding material during a manufacturing process of welding; and

a capillary layer, clamped between the first plate and the second plate to be located inside the chamber, at least comprising a first capillary portion and a second capillary portion, the second capillary portion connected to the first capillary portion and extended outward, a notch defined at any one side of the second capillary portion, and the notch defined along an extension direction of the second capillary portion;

wherein the first plate comprises a plurality of capillary supporting structures and a plurality of plate supporting structures disposed on the first inner surface, the plurality capillary supporting structures are at least corresponding to the first capillary portion and the second capillary portion, and the plurality of plate supporting structures are corresponding to the notch of the capillary layer;

wherein the capillary layer further comprises a third capillary portion, and the second capillary portion is connected between the first capillary portion and the third capillary portion, wherein the second capillary portion is bent to cause the first capillary portion and the third capillary portion at both ends of the second capillary portion to be arranged in a staggered manner;

wherein the first plate and the second plate comprise a bending area corresponding to the second capillary portion, the plurality of capillary supporting structures and the plurality of plate supporting structures are protrusions with a column shape, wherein the shape and pattern of the plurality of capillary supporting structures and the plurality of plate supporting structures disposed in the bending area are same as the shape and pattern of the plurality of capillary supporting structures and the plurality of plate supporting structures disposed outside the bending area.

2 . The vapor chamber supporting capillary structure according to claim 1 , wherein the first inner surface of the first plate and the second inner surface of the second plate are respectively in a recessed shape to jointly define the chamber.

3 . The vapor chamber supporting capillary structure according to claim 1 , wherein the second plate comprises a plurality of attachment supporting structures disposed on the second inner surface, and the plurality of attachment supporting structures are protrusions with a column shape and abut against the plurality of plate supporting structures.

4 . The vapor chamber supporting capillary structure according to claim 1 , wherein a width of the second capillary portion is smaller than a width of the first capillary portion.

5 . The vapor chamber supporting capillary structure according to claim 1 , wherein the first capillary portion and the third capillary portion are respectively located at two distal ends away from each other inside the chamber.

6 . The vapor chamber supporting capillary structure according to claim 1 , wherein a width of the second capillary portion is smaller than a width of the first capillary portion and a width of the third capillary portion.