Photodetector and beating spectroscopy device
A photodetector includes: a semiconductor substrate; a mesa portion formed on a major surface of the semiconductor substrate to extend along an optical waveguide direction; a first contact layer; a second contact layer; a first electrode; and an air bridge wiring electrically connected to the first contact layer and the first electrode. When viewed in a direction perpendicular to the major surface of the semiconductor substrate, a length of the mesa portion in the optical waveguide direction is longer than a length of the mesa portion in a direction perpendicular to the optical waveguide direction. The air bridge wiring is led out from the first contact layer to one side in the direction perpendicular to the optical waveguide direction, and is bridged between the first contact layer and the first electrode.
1 . A photodetector comprising:
a semiconductor substrate including a major surface;
a mesa portion that includes an active layer in which absorption regions that absorb detection light through intersubband absorption and transport regions that transport electrons excited by the intersubband absorption are alternately stacked, and that is formed on the major surface of the semiconductor substrate to extend along an optical waveguide direction;
a first contact layer formed on a surface of the mesa portion on a side opposite to the semiconductor substrate;
a second contact layer formed between the major surface of the semiconductor substrate and the mesa portion;
a first electrode formed on the major surface of the semiconductor substrate; and
an air bridge wiring electrically connected to the first contact layer and the first electrode,
wherein when viewed in a direction perpendicular to the major surface of the semiconductor substrate, a length of the mesa portion in the optical waveguide direction is longer than a length of the mesa portion in a direction perpendicular to the optical waveguide direction,
the air bridge wiring is led out from the first contact layer to one side in the direction perpendicular to the optical waveguide direction, and is bridged between the first contact layer and the first electrode,
the air bridge wiring includes a bridge portion extending only in air, and
a length of the bridge portion in the optical waveguide direction is longer than a length of the bridge portion in the direction perpendicular to the optical waveguide direction and parallel to the major surface of the semiconductor substrate.
2 . The photodetector according to claim 1 ,
wherein the first electrode includes a connection portion located on the one side in the direction perpendicular to the optical waveguide direction with respect to the mesa portion, and
the air bridge wiring is led out from the first contact layer to the one side in the direction perpendicular to the optical waveguide direction, and connected to the connection portion of the first electrode.
3 . The photodetector according to claim 1 ,
wherein each of the length of the mesa portion in the optical waveguide direction and a length of the bridge portion in the optical waveguide direction is 50 μm or more.
4 . The photodetector according to claim 1 ,
wherein a ratio of the length of the mesa portion in the optical waveguide direction to the length of the mesa portion in the direction perpendicular to the optical waveguide direction is greater than 1 and less than 100.
5 . The photodetector according to claim 1 ,
wherein a ratio of a length of the bridge portion in the optical waveguide direction to a length of the bridge portion in the direction perpendicular to the optical waveguide direction is greater than 1 and less than 50.
6 . The photodetector according to claim 1 ,
wherein a thickness of the bridge portion is equal to or more than 1 μm and equal to or less than 10 μm.
7 . The photodetector according to claim 1 ,
wherein one end surface of the mesa portion in the optical waveguide direction is an incident surface of the detection light.
8 . The photodetector according to claim 1 ,
wherein one end surface of the mesa portion in the optical waveguide direction is flush with one end surface of the semiconductor substrate.
9 . The photodetector according to claim 7 , further comprising a lens that is disposed to face the end surface of the mesa portion, and that converges the detection light toward the end surface of the mesa portion.
10 . The photodetector according to claim 1 ,
wherein both side surfaces of the mesa portion in the direction perpendicular to the optical waveguide direction are exposed.
11 . The photodetector according to claim 1 ,
wherein when viewed in the direction perpendicular to the major surface of the semiconductor substrate, the second contact layer includes a first portion located between the major surface of the semiconductor substrate and the mesa portion, and a second portion located outside the mesa portion, and
a second electrode is formed on the second portion of the second contact layer.
12 . A beating spectroscopy device comprising:
a fixed wavelength light source;
a variable wavelength light source; and
the photodetector according to claim 1 that detects light from the fixed wavelength light source and light from the variable wavelength light source as the detection light, wherein the light from the fixed wavelength light source and the light from the variable wavelength light source are detected by the photodetector while a wavelength of the light from the variable wavelength light source is changed to scan a frequency of a beating signal having a frequency in accordance with a wavelength difference between the light from the fixed wavelength light source and the light from the variable wavelength light source.